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公开(公告)号：US11134558B2
公开(公告)日：2021-09-28
申请号：US16508596
申请日：2019-07-11
发明人： Shih-Yu Tu , Yu-Kuang Sun , Shao-Hua Wang , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Wei-Shin Cheng , Ming-Hsun Tsai , Yen-Hsun Chen
IPC分类号： H05G2/00
摘要： A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.
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公开(公告)号：US11470710B2
公开(公告)日：2022-10-11
申请号：US17135768
申请日：2020-12-28
发明人： Wei-Shin Cheng , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng , Hsiao-Lun Chang
摘要： A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.
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公开(公告)号：US11809083B2
公开(公告)日：2023-11-07
申请号：US17494558
申请日：2021-10-05
发明人： Cheng-Hao Lai , Ming-Hsun Tsai , Hsin-Feng Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Shih-Yu Tu , Jou-Hsuan Lu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC分类号： G03F7/70033
摘要： Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
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公开(公告)号：US11442365B1
公开(公告)日：2022-09-13
申请号：US17459836
申请日：2021-08-27
发明人： Yu-Kuang Sun , Ming-Hsun Tsai , Yu-Huan Chen , Wei-Shin Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Chiao-Hua Cheng , Cheng-Hsuan Wu , Yu-Fa Lo , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
摘要： A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system isolates a source of droplets from oxidants to prevent the oxidation of the nozzle or the formation of metal oxides on the nozzle, both of which can adversely affect an ability of the nozzle to generate a sufficient amount of droplets and/or direct the droplets in a desired direction.
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公开(公告)号：US12063734B2
公开(公告)日：2024-08-13
申请号：US17483298
申请日：2021-09-23
发明人： Yu-Kuang Sun , Ming-Hsun Tsai , Wei-Shin Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Chiao-Hua Cheng , Cheng-Hsuan Wu , Yu-Fa Lo , Jou-Hsuan Lu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC分类号： H05G2/006 , G03F7/70033 , G05D23/19 , H05G2/005
摘要： The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20230375940A1
公开(公告)日：2023-11-23
申请号：US17747939
申请日：2022-05-18
发明人： Shang-Chieh Chien , Hung-Wen Cho , Wei-Shin Cheng , Ming-Hsun Tsai , Jyun-Yan Chuang , Li-Jui Chen , Heng-Hsin Liu
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/702 , H01L21/027
摘要： A method includes: depositing a mask layer over a substrate; directing radiation reflected from a collector of a lithography system toward the mask layer according to a pattern; blocking a portion of the radiation by a blocking structure, the blocking structure being attached to a reflector of the lithography system; forming openings in the mask layer by removing regions of the mask layer exposed to the radiation; and removing material of a layer underlying the mask layer exposed by the openings.
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公开(公告)号：US10670970B1
公开(公告)日：2020-06-02
申请号：US16257232
申请日：2019-01-25
发明人： Wei-Shin Cheng , Hsin-Feng Chen , Cheng-Hao Lai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng
摘要： A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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公开(公告)号：US11528797B2
公开(公告)日：2022-12-13
申请号：US17233220
申请日：2021-04-16
发明人： Yu-Kuang Sun , Cheng-Hao Lai , Yu-Huan Chen , Wei-Shin Cheng , Ming-Hsun Tsai , Hsin-Feng Chen , Chiao-Hua Cheng , Cheng-Hsuan Wu , Yu-Fa Lo , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
摘要： An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US11086225B2
公开(公告)日：2021-08-10
申请号：US16887245
申请日：2020-05-29
发明人： Wei-Shin Cheng , Hsin-Feng Chen , Cheng-Hao Lai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng
摘要： A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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