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公开(公告)号:US20230364550A1
公开(公告)日:2023-11-16
申请号:US17745585
申请日:2022-05-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chih-Ming TSAO
CPC classification number: B01D53/1487 , H01L21/67017 , B01D53/1456 , B01D53/18
Abstract: Systems and methods for removing impurities from exhaust gases produced by semiconductor processing tools, e.g., such as a wet bench, utilize cooled scrubbing fluids and non-random structured packing materials to achieve and enhance removal of acid or alkaline components in the exhaust gas along with an enhanced removal of volatile organic components in the exhaust gas. Removal efficiencies of the acid or alkaline components of greater than 90% and removal efficiencies of the volatile organic components of greater than 70% are described.
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公开(公告)号:US20150251132A1
公开(公告)日:2015-09-10
申请号:US14199746
申请日:2014-03-06
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chih-Ming TSAO
IPC: B01D53/18
CPC classification number: B01D47/06 , B01D46/0071 , B01D46/0082 , B01D46/125 , B01D47/028 , B01D50/006 , B01D53/18 , B01D53/78 , B01D2258/0216
Abstract: An air washer includes a contamination removal membrane and a nozzle rack. The contamination removal membrane purifies an outdoor air for a clean room. The nozzle rack sprays water on the contamination removal membrane. The nozzle rack includes a supply pipe, a plurality of spray pipes connecting to the supply pipe and a plurality of nozzles fixed on the spray pipes to spray the water on the contamination removal membrane. The contamination removal membrane is a cellulose paper sheet, an agglomeration ceramic pad, a stainless steel filter or the combination thereof. In addition, a make-up air unit having the air washer is also disclosed therein.
Abstract translation: 空气清洗机包括污染物去除膜和喷嘴架。 污染物去除膜净化洁净室的室外空气。 喷嘴架喷洒污水清除膜上的水。 喷嘴架包括供给管,连接到供应管的多个喷射管和固定在喷射管上的多个喷嘴,以将污染物去除膜上的水喷射。 污染物去除膜是纤维素纸片,聚集陶瓷垫,不锈钢过滤器或其组合。 此外,还公开了具有空气洗衣机的补充空气单元。
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公开(公告)号:US20250108417A1
公开(公告)日:2025-04-03
申请号:US18980249
申请日:2024-12-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chih-Ming TSAO , Tzu-Sou CHUANG , Chwen YU
IPC: B08B15/00 , B01D46/44 , G05B15/02 , G06V10/75 , G06V20/00 , H01J49/00 , H01J49/40 , H01L21/67 , H01L21/677
Abstract: A method includes: generating a contaminant distribution map by sampling an environment of a cleanroom; selecting a first fabrication tool of the cleanroom by comparing the contaminant distribution map with at least one diffusion image in a first database; comparing parameters of the first fabrication tool against process utility information in a second database; and when the parameters are consistent with the process utility information, taking at least one action. The one action may include moving a cleaning tool to a location associated with a contaminant concentration of the contaminant distribution map; turning on a fan of the cleaning tool; stopping pod transit to the first fabrication tool; or halting production by the first fabrication tool.
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公开(公告)号:US20220297170A1
公开(公告)日:2022-09-22
申请号:US17477453
申请日:2021-09-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chih-Ming TSAO , Tzu-Sou CHUANG , Chwen YU
Abstract: A method includes: generating a contaminant distribution map by sampling an environment of a cleanroom; selecting a first fabrication tool of the cleanroom by comparing the contaminant distribution map with at least one diffusion image in a first database; comparing parameters of the first fabrication tool against process utility information in a second database; and when the parameters are consistent with the process utility information, taking at least one action. The one action may include moving a cleaning tool to a location associated with a contaminant concentration of the contaminant distribution map; turning on a fan of the cleaning tool; stopping pod transit to the first fabrication tool; or halting production by the first fabrication tool.
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公开(公告)号:US20170229278A1
公开(公告)日:2017-08-10
申请号:US15017559
申请日:2016-02-05
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chwen YU , Chih-Ming TSAO
CPC classification number: H05K9/00 , G12B17/00 , G12B17/02 , H01J37/09 , H01J37/3002 , H01J2237/0264 , H05K9/0001 , H05K9/0003
Abstract: A board includes a first magnetic conductive plate and a second magnetic conductive plate. The first magnetic conductive plate has a first magnetic conductive direction. The second magnetic conductive plate overlaps with the first magnetic conductive plate. The second magnetic conductive plate has a second magnetic conductive direction. The first magnetic conductive direction and the second magnetic conductive direction cross.
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