公开(公告)号：US20210042460A1

公开(公告)日：2021-02-11

申请号：US16734487

申请日：2020-01-06

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Chin-Shen LIN ,  Ming-Hsien LIN ,  Wan-Yu LO ,  Meng-Xiang LEE

IPC分类号： G06F30/3308 ,  G06F30/392

摘要： Methods for analyzing electromigration (EM) in an integrated circuit (IC) are provided. The layout of the IC is obtained. A metal segment is selected from the layout according to the current simulation result of the IC. It is determined whether to relax the EM rule on the metal segment according to the number of vias over the metal segment in the layout. The vias are in contact with the metal segment.

公开(公告)号：US20150363540A1

公开(公告)日：2015-12-17

申请号：US14833260

申请日：2015-08-24

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Meng-Xiang LEE ,  Li-Chung HSU ,  Shih-Hsien YANG ,  Ho Che YU ,  King-Ho TAM ,  Chung-Hsing WANG

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F17/5031 ,  G06F2217/02 ,  G06F2217/78 ,  G06F2217/84

摘要： A method comprises providing a non-transitory, machine-readable storage medium storing a partial netlist of at least a portion of a previously taped-out integrated circuit (IC) layout, representing a set of photomasks for fabricating an IC having the IC layout such that the IC meets a first specification value. A computer identities a proper subset of a plurality of first devices in the IC layout, such that replacement of the proper subset of the first devices by second devices in a revised IC layout satisfies a second specification value different from the first specification value. At least one layout mask is generated and stored in at least one non-transitory machine readable storage medium, accessible by a tool for forming at least one additional photomask, such that the set of photomasks and the at least one additional photomask are usable to fabricate an IC according to the revised IC layout.

摘要翻译： 一种方法包括提供一种非暂时的机器可读存储介质，其存储至少部分先前采集的集成电路（IC）布局的部分网表，其表示用于制造具有IC布局的IC的一组光掩模， 该IC满足第一规格值。 计算机识别IC布局中的多个第一设备的正确子集，使得经修改的IC布局中的第二设备的第一设备的适当子集的替换满足与第一规范值不同的第二规范值。 至少一个布局掩模被生成并存储在至少一个非暂时机器可读存储介质中，可由用于形成至少一个附加光掩模的工具访问，使得该组光掩模和至少一个附加光掩模可用于制造 一个IC根据修订的IC布局。

公开(公告)号：US20140351784A1

公开(公告)日：2014-11-27

申请号：US14449211

申请日：2014-08-01

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Meng-Xiang LEE ,  Li-Chung HSU ,  Shih-Hsien YANG ,  Ho Che YU ,  King-Ho TAM ,  Chung-Hsing WANG

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F17/5031 ,  G06F2217/02 ,  G06F2217/78 ,  G06F2217/84

摘要： A method comprises providing a non-transitory, machine-readable storage medium storing a partial netlist of at least a portion of a previously taped-out integrated circuit (IC) layout, representing a set of photomasks for fabricating an IC having the IC layout such that the IC meets a first specification value. A computer identifies a proper subset of a plurality of first devices in the IC layout, such that replacement of the proper subset of the first devices by second devices in a revised IC layout satisfies a second specification value different from the first specification value. At least one layout mask is generated and stored in at least one non-transitory machine readable storage medium, accessible by a tool for forming at least one additional photomask, such that the set of photomasks and the at least one additional photomask are usable to fabricate an IC according to the revised IC layout.

摘要翻译： 一种方法包括提供一种非暂时的机器可读存储介质，其存储至少部分先前采集的集成电路（IC）布局的部分网表，其表示用于制造具有IC布局的IC的一组光掩模， 该IC满足第一规格值。 计算机识别IC布局中的多个第一设备的正确子集，使得经修订的IC布局中的第二设备对第一设备的正确子集的替换满足与第一规范值不同的第二规范值。 至少一个布局掩模被生成并存储在至少一个非暂时机器可读存储介质中，可由用于形成至少一个附加光掩模的工具访问，使得该组光掩模和至少一个附加光掩模可用于制造 一个IC根据修订的IC布局。