METHOD FOR CLEANING LOAD PORT OF WAFER PROCESSING APPARATUS
    2.
    发明申请
    METHOD FOR CLEANING LOAD PORT OF WAFER PROCESSING APPARATUS 审中-公开
    清洗加工装置加载端口的方法

    公开(公告)号:US20170049284A1

    公开(公告)日:2017-02-23

    申请号:US14832173

    申请日:2015-08-21

    Abstract: A cleaning module adapted for cleaning a load port of a processing apparatus in semiconductor fabrication is provided. The cleaning module includes a housing having at least one opening formed on a bottom wall panel of the housing. The cleaning module further includes a filter unit positioned in the housing. The leaning module also includes a driving assembly. The driving assembly is arranged to correspond to the opening and positioned in the housing. The driving assembly is used to create an air flow from outside of the housing via the opening to the filter unit. The filter unit is used to separate particles or contaminants from the air flow.

    Abstract translation: 提供了一种用于清洁半导体制造中的处理装置的负载端口的清洁模块。 清洁模块包括具有形成在壳体的底壁面板上的至少一个开口的壳体。 清洁模块还包括定位在壳体中的过滤器单元。 倾斜模块还包括驱动组件。 驱动组件布置成对应于开口并且定位在壳体中。 驱动组件用于从壳体的外部经由开口到过滤器单元产生空气流。 过滤器单元用于从空气流中分离颗粒或污染物。

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