中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

26 records (took 0.017 seconds)

    Methods for cleaning lithography mask
    1.
    发明授权
    Methods for cleaning lithography mask 有权

    公开(公告)号：US12276906B2

    公开(公告)日：2025-04-15

    申请号：US17690150

    申请日：2022-03-09

    Applicant: Taiwan Semiconductor Manufacturing Company, LTD.

    Inventor： I-Hsiung Huang ,  Yung-Cheng Chen ,  Chi-Lun Lu

    IPC: G03F1/82 ,  G03F1/22 ,  G03F1/26 ,  G03F1/62

    Abstract: Methods for removing haze defects from a photomask or reticle are disclosed. The photomask is placed into a chamber which includes a hydrogen atmosphere. The photomask is then exposed to radiation. The energy from the radiation, together with the hydrogen, causes decomposition of the haze defects. The methods can be practiced on-site and quickly, without the need for wet chemicals or the need to remove the pellicle before cleaning of the photomask. A device for conducting the methods is also disclosed herein.

    Particle removal system and method thereof
    3.
    发明授权
    Particle removal system and method thereof 有权

    公开(公告)号：US10067418B2

    公开(公告)日：2018-09-04

    申请号：US14275601

    申请日：2014-05-12

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Shu-Hao Chang ,  Chi-Lun Lu ,  Shang-Chieh Chien ,  Ming-Chin Chien ,  Jui-Ching Wu ,  Jeng-Horng Chen ,  Chieh-Jen Cheng ,  Chia-Chen Chen

    IPC: B08B7/00 ,  G03F1/82

    Abstract: A method of removing particles from a surface of a reticle is disclosed. The reticle is placed in a carrier, a source gas is flowed into the carrier, and a plasma is generated within the carrier. Particles are then removed from a surface of the reticle using the generated plasma. A system of removing particles from a surface includes a carrier configured to house a reticle, a reticle stocker including the carrier, a power supply configured to apply a potential between an inner cover and an inner baseplate of the carrier, and a gas source configured to flow a gas into the carrier. A plasma may be generated within the carrier, and particles can be removed from a surface of the reticle using the generated plasma. An acoustic energy source configured to agitate at least one of the source gas and the generated plasma may be provided to facilitate particle removal using an agitated plasma.

    Systems and methods of EUV mask cleaning
    5.
    发明授权
    Systems and methods of EUV mask cleaning 有权

    公开(公告)号：US10156784B2

    公开(公告)日：2018-12-18

    申请号：US15888421

    申请日：2018-02-05

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Ching-Wei Shen ,  Chi-Lun Lu ,  Kuan-Wen Lin

    IPC: G03F1/82 ,  B08B3/12

    Abstract: A method includes directing an acoustically agitated fluid stream at a first surface of a substrate to cause the substrate to vibrate mechanically thereby dislodging contaminant particles on the substrate. The first surface of the substrate is opposite a second surface of the substrate. The second surface of the substrate includes a pattern. An amplitude of the acoustically agitated fluid stream is configured to produce an acoustic response along an entirety of the second surface.

    Systems and methods of EUV mask cleaning
    6.
    发明授权
    Systems and methods of EUV mask cleaning 有权

    公开(公告)号：US09885952B2

    公开(公告)日：2018-02-06

    申请号：US14811919

    申请日：2015-07-29

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Ching-Wei Shen ,  Chi-Lun Lu ,  Kuan-Wen Lin

    IPC: B08B3/12 ,  G03F1/82

    CPC classification number: G03F1/82 ,  B08B3/12

    Abstract: A system includes a bracket that is configured to support a photomask and is located at a first side of the photomask; an acoustic energy generator configured to generate acoustic energy, wherein the acoustic energy includes mechanical vibrations of a megasonic frequency and wavelength; and a fluid dispenser coupled to the acoustic energy generator such that the acoustic energy generated by the acoustic energy generator is received by the fluid dispenser to generate an acoustically agitated fluid stream directed at a second side of the photomask, wherein the first side of the photomask is opposite a second side of the photomask, and wherein the first side includes a pattern.

    Systems and Methods of EUV Mask Cleaning
    7.
    发明申请
    Systems and Methods of EUV Mask Cleaning 有权
    EUV面膜清洁系统和方法

    公开(公告)号：US20170031241A1

    公开(公告)日：2017-02-02

    申请号：US14811919

    申请日：2015-07-29

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Ching-Wei Shen ,  Chi-Lun Lu ,  Kuan-Wen Lin

    IPC: G03F1/82 ,  B08B3/12

    CPC classification number: G03F1/82 ,  B08B3/12

    Abstract: A system includes a bracket that is configured to support a photomask and is located at a first side of the photomask; an acoustic energy generator configured to generate acoustic energy, wherein the acoustic energy includes mechanical vibrations of a megasonic frequency and wavelength; and a fluid dispenser coupled to the acoustic energy generator such that the acoustic energy generated by the acoustic energy generator is received by the fluid dispenser to generate an acoustically agitated fluid stream directed at a second side of the photomask, wherein the first side of the photomask is opposite a second side of the photomask, and wherein the first side includes a pattern.

    Abstract translation: 一种系统包括支架，其被配置为支撑光掩模并位于光掩模的第一侧; 声能发生器，其被配置为产生声能，其中所述声能包括兆声波频率和波长的机械振动; 以及流体分配器，其耦合到所述声能发生器，使得由所述声能发生器产生的声能被所述流体分配器接收以产生指向所述光掩模的第二侧的声学搅动的流体流，其中所述光掩模的第一侧 与光掩模的第二侧相对，并且其中第一侧包括图案。

    DEVICE MANUFACTURING AND CLEANING METHOD
    8.
    发明申请
    DEVICE MANUFACTURING AND CLEANING METHOD 审中-公开
    装置制造和清洁方法

    公开(公告)号：US20140051252A1

    公开(公告)日：2014-02-20

    申请号：US14066171

    申请日：2013-10-29

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

    Inventor： Chi-Lun Lu ,  Kuan-Wen Lin ,  Ching-Wei Shen ,  Ting-Hao Hsu ,  Sheng-Chi Chin

    IPC: H01L21/311

    CPC classification number: H01L21/311 ,  G03F1/00 ,  G03F7/42 ,  G03F7/423 ,  G03F7/425 ,  H01L21/02057

    Abstract: A method of manufacturing is disclosed. An exemplary method includes providing a substrate and forming one or more layers over the substrate. The method further includes forming a surface layer over the one or more layers. The method further includes performing a patterning process on the surface layer thereby forming a pattern on the surface layer. The method further includes performing a cleaning process using a cleaning solution to clean a top surface of the substrate. The cleaning solution includes tetra methyl ammonium hydroxide (TMAH), hydrogen peroxide (H2O2) and water (H2O).

    Abstract translation: 公开了一种制造方法。 一种示例性方法包括提供衬底并在衬底上形成一个或多个层。 该方法还包括在一个或多个层上形成表面层。 该方法还包括在表面层上进行图案化处理，从而在表面层上形成图案。 该方法还包括使用清洁溶液进行清洁处理以清洁基板的顶表面。 清洗溶液包括四甲基氢氧化铵（TMAH），过氧化氢（H 2 O 2）和水（H 2 O）。

Patent Agency Ranking