公开(公告)号：US20130273732A1

公开(公告)日：2013-10-17

申请号：US13915287

申请日：2013-06-11

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Chung-Chi KO ,  Chia Cheng CHOU ,  Keng-Chu LIN ,  Joung-Wei LIOU ,  Shwang-Ming JENG ,  Mei-Ling CHEN

IPC分类号： H01L21/768 ,  H01L21/70

CPC分类号： H01L21/768 ,  H01L21/02126 ,  H01L21/02134 ,  H01L21/02137 ,  H01L21/02203 ,  H01L21/3105 ,  H01L21/70 ,  H01L21/76811 ,  H01L21/76813 ,  H01L21/76814 ,  H01L21/76825 ,  H01L21/76828

摘要： An Active Energy Assist (AEA) baking chamber includes an AEA light source assembly and a heater pedestal. The AEA baking chamber further includes a controller for controlling a power input to the AEA light source assembly and a power input to the heater pedestal. A method of forming interconnects on a substrate includes etching a substrate and wet cleaning the etched substrate. The method further includes active energy assist (AEA) baking the substrate after the wet-cleaning. The AEA baking includes placing the substrate on a heater pedestal in an AEA chamber, exposing the substrate to light having a wavelength equal to or greater than 400 nm, wherein said light is emitted by a light source and controlling the light source and the heater pedestal using a controller.

摘要翻译： 主动能量辅助（AEA）烘烤室包括AEA光源组件和加热器底座。 AEA烘烤室还包括控制器，用于控制输入到AEA光源组件的功率和对加热器基座的功率输入。 在衬底上形成互连的方法包括蚀刻衬底并湿式清洗蚀刻的衬底。 该方法还包括在湿清洗之后对基材进行活性能量助剂（AEA）的烘烤。 AEA烘烤包括将基板放置在AEA室中的加热器基座上，将基板暴露于等于或大于400nm的波长的光，其中所述光由光源发射并控制光源和加热器基座 使用控制器。