摘要:
A signal processing portion obtains the reciprocal of a composite impedance of gap static capacitance and a plasma impedance, obtains composite static capacitance which is the sum of the gap static capacitance and a static capacitance component included in the plasma impedance from an imaginary part of the reciprocal, and obtains a resistance component included in the plasma impedance from a real part of the reciprocal. A gap detection device obtains the static capacitance component by using a model representing the characteristics of the reciprocal of the plasma impedance and the resistance component and obtains the gap static capacitance by subtracting the static capacitance component from the composite static capacitance. The gap detection device obtains a gap from the obtained gap static capacitance. Thus provided is a technique to detect a gap between a nozzle of a laser beam machine for outputting a laser beam and an object to be machined with high accuracy.
摘要:
Provided are a wire electric discharge machining method for poorly conductive materials, such as solar cell silicon, and a semiconductor wafer manufacturing method and a solar battery cell manufacturing method based on the wire electric discharge machining method. Electrical discharge machining of a high volume resistivity, hard and brittle materials, having a volume resistivity that is equal to or higher than 0.5 Ω·cm and equal to or lower than 5 Ω·cm is performed by applying a pulse voltage having a pulse width that is equal to or higher than 1 μsec and equal to or lower than 4 μsec and having a peak current at the time of machining a wire electrode that is equal to or higher than 10A and equal to or lower than 50A to a wire electrode and generating a discharge pulse between the wire electrode and a subject to be machined.
摘要:
Provided are a wire electric discharge machining method for poorly conductive materials, such as solar cell silicon, and a semiconductor wafer manufacturing method and a solar battery cell manufacturing method based on the wire electric discharge machining method. Electrical discharge machining of a high volume resistivity, hard and brittle materials, having a volume resistivity that is equal to or higher than 0.5 Ω·cm and equal to or lower than 5 Ω·cm is performed by applying a pulse voltage having a pulse width that is equal to or higher than 1 μsec and equal to or lower than 4 μsec and having a peak current at the time of machining a wire electrode that is equal to or higher than 10A and equal to or lower than 50A to a wire electrode and generating a discharge pulse between the wire electrode and a subject to be machined.
摘要:
A detection unit (8) is disposed for detecting the magnitudes of f1 and f2 frequency components of a composite signal which is passed through a center electrode cable (4). A detecting signal generating unit (9) generates a detecting signal corresponding to a gap between a nozzle (5) and a workpiece (6) from the magnitudes of the f1 and f2 frequency components of the composite signal, which are detected by the detection unit (8). As a result, even if plasma occurs in the gap between the nozzle (5) and the workpiece (6), the gap can be detected with a high degree of precision.
摘要:
A detection unit (8) is disposed for detecting the magnitudes of f1 and f2 frequency components of a composite signal which is passed through a center electrode cable (4). A detecting signal generating unit (9) generates a detecting signal corresponding to a gap between a nozzle (5) and a workpiece (6) from the magnitudes of the f1 and f2 frequency components of the composite signal, which are detected by the detection unit (8). As a result, even if plasma occurs in the gap between the nozzle (5) and the workpiece (6), the gap can be detected with a high degree of precision.
摘要:
To provide a method of manufacturing a field emission display having an improved electron emission effect by means of laser irradiation and accordingly mitigating a luminance fluctuation among pixels, and other such techniques. Provided is a method of manufacturing a field emission display which includes a cathode substrate and a fluorescent screen glass opposed to the cathode substrate and emits light when an electron emitted from a carbon nanotube printed layer (7) containing a carbon nanotube of the cathode electrode enters a fluorescent material of the fluorescent screen glass, the method including a laser beam irradiation step of irradiating a surface of the carbon nanotube printed layer (7) with a laser beam having its energy density to be spatially modulated to expose and raise the carbon nanotube of the carbon nanotube printed layer so as to form a laser irradiation part (B) and a non-laser irradiation part (C).
摘要:
To provide a method of manufacturing a field emission display having an improved electron emission effect by means of laser irradiation and accordingly mitigating a luminance fluctuation among pixels, and other such techniques. Provided is a method of manufacturing a field emission display which includes a cathode substrate and a fluorescent screen glass opposed to the cathode substrate and emits light when an electron emitted from a carbon nanotube printed layer (7) containing a carbon nanotube of the cathode electrode enters a fluorescent material of the fluorescent screen glass, the method including a laser beam irradiation step of irradiating a surface of the carbon nanotube printed layer (7) with a laser beam having its energy density to be spatially modulated to expose and raise the carbon nanotube of the carbon nanotube printed layer so as to form a laser irradiation part (B) and a non-laser irradiation part (C).
摘要:
A scanning candidate route extracting unit which extracts plural candidates of scanning routes in which each of the scanning routes connects all spot positions in one layer is provided, in an evaluation function using necessary scanning time Tk and weight coefficient wk for a kth partial route among partial routes which are routes between the spot positons which are adjacent on one of the plural candidates of scanning routes, and number n of spot in the layer, wk with respect to a partial route which passes through affected tissue is set to be 1, wk with respect to a partial route which passes through normal tissue is set to be bigger than 1, and wk with respect to a partial route which passes through an important internal organ is set to be bigger than wk with respect to a partial route which passes through normal tissue.
摘要:
In order to obtain a particle beam irradiation apparatus that enlarges the dose distribution of beam spots while suppressing a decrease of the maximum available range of a charged particle beam, the particle beam irradiation apparatus includes a particle beam acceleration means; particle beam transport means; scanning apparatus that includes first scanning means and second scanning means, and two-dimensionally scans the beam; and irradiation control means that controls the scanning apparatus so as to irradiate the beam onto a target region including a plurality of small regions. The irradiation control means controls the first scanning means so as to scan the beam over a small region serving as an irradiation subject among the plurality of the small regions, and controls the second scanning means so as to change the small region serving as the irradiation subject to be a different small region among the plurality of the small regions.
摘要:
There are provided with a respiration induction apparatus that induces respiration, based on a desired respiration waveform; a switching device that switches the orbit of a particle beam; and an irradiation apparatus that controls irradiation, in synchronization with the desired respiration waveform. A controller, which performs synchronization control of the switching device and the respiration induction apparatuses in a plurality of treatment rooms, adjusts the periods and the phases of the desired respiration waveforms of the respiration induction apparatuses in the treatment rooms so that the irradiation times synchronized with the desired respiration waveforms in the treatment rooms do not overlap with one another, and controls the switching device so as to switch the orbits of the particle beam, in accordance with the respective irradiation times of the treatment rooms.