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公开(公告)号：US08206509B2
公开(公告)日：2012-06-26
申请号：US12958295
申请日：2010-12-01
申请人： Takahiro Eto , Takuya Ohhashi , Masaru Takahama , Daijiro Mori , Akira Kumazawa
发明人： Takahiro Eto , Takuya Ohhashi , Masaru Takahama , Daijiro Mori , Akira Kumazawa
CPC分类号： H01L21/02063 , G03F7/425 , H01L21/31133
摘要： Provided are a cleaning liquid for lithography that exhibits excellent corrosion suppression performance in relation to tungsten, and excellent removal performance in relation to a resist film or the like, and a method for forming a wiring using the cleaning liquid for lithography. The cleaning liquid for lithography according to the present invention includes a quaternary ammonium hydroxide, a water-soluble organic solvent, water, an inorganic salt and an anti-corrosion agent represented by a general formula (1) below. In the general formula (1), R1 represents an alkyl group or an aryl group having 1-17 carbon atoms, and R2 represents an alkyl group having 1-13 carbon atoms.
摘要翻译： 本发明提供了一种用于光刻的清洗液，其与钨相比具有优异的防腐蚀性能，并且与抗蚀剂膜等相比具有优异的去除性能，以及使用光刻用清洁液形成布线的方法。 本发明的光刻用清洗液含有下述通式（1）表示的季铵氢氧化物，水溶性有机溶剂，水，无机盐和防腐蚀剂。 在通式（1）中，R 1表示烷基或具有1-17个碳原子的芳基，R 2表示具有1-13个碳原子的烷基。
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2.发明授权公开(公告)号：US08623236B2
公开(公告)日：2014-01-07
申请号：US12171198
申请日：2008-07-10
申请人： Akira Kumazawa , Takahiro Eto , Takayuki Haraguchi
发明人： Akira Kumazawa , Takahiro Eto , Takayuki Haraguchi
CPC分类号： C09K13/08 , H01L21/32134
摘要： A titanium nitride-stripping liquid for stripping a titanium nitride coating film, the titanium nitride-stripping liquid being capable of stripping a titanium nitride coating film even in a semiconductor multilayer laminate having particularly a layer that includes tungsten or a tungsten alloy, without corrosion of this layer is provided, and furthermore, a titanium nitride-stripping liquid which can strip a titanium nitride coating film without affecting an insulating layer is provided. A titanium nitride-stripping liquid including hydrofluoric acid, hydrogen peroxide and water, and further including an inorganic acid other than hydrofluoric acid. According to the present invention, since the titanium nitride-stripping liquid includes an inorganic acid other than hydrofluoric acid, a titanium nitride coating film can be stripped even in the case in which a semiconductor multilayer laminate has a layer that includes tungsten or a tungsten alloy, without corrosion of the layer by the titanium nitride-stripping liquid.
摘要翻译： 一种用于剥离氮化钛涂层的氮化钛剥离液，即使在特别是包含钨或钨合金的层的半导体多层叠层中，氮化钛剥离液也能够剥离氮化钛涂膜，而不会腐蚀 提供该层，此外，提供可以不影响绝缘层而剥离氮化钛涂膜的氮化钛剥离液。 包含氢氟酸，过氧化氢和水的氮化钛剥离液，还包含氢氟酸以外的无机酸。 根据本发明，由于氮化钛剥离液含有氢氟酸以外的无机酸，所以即使在半导体多层层叠体具有包含钨或钨合金的层的情况下也可以剥离氮化钛被膜 ，不会被氮化钛剥离液体腐蚀。
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3.发明申请公开(公告)号：US20090017636A1
公开(公告)日：2009-01-15
申请号：US12171198
申请日：2008-07-10
申请人： Akira Kumazawa , Takahiro Eto , Takayuki Haraguchi
发明人： Akira Kumazawa , Takahiro Eto , Takayuki Haraguchi
IPC分类号： H01L21/306 , C09K13/08
CPC分类号： C09K13/08 , H01L21/32134
摘要： A titanium nitride-stripping liquid for stripping a titanium nitride coating film, the titanium nitride-stripping liquid being capable of stripping a titanium nitride coating film even in a semiconductor multilayer laminate having particularly a layer that includes tungsten or a tungsten alloy, without corrosion of this layer is provided, and furthermore, a titanium nitride-stripping liquid which can strip a titanium nitride coating film without affecting an insulating layer is provided. A titanium nitride-stripping liquid including hydrofluoric acid, hydrogen peroxide and water, and further including an inorganic acid other than hydrofluoric acid. According to the present invention, since the titanium nitride-stripping liquid includes an inorganic acid other than hydrofluoric acid, a titanium nitride coating film can be stripped even in the case in which a semiconductor multilayer laminate has a layer that includes tungsten or a tungsten alloy, without corrosion of the layer by the titanium nitride-stripping liquid.
摘要翻译： 一种用于剥离氮化钛涂层的氮化钛剥离液，即使在特别是包含钨或钨合金的层的半导体多层叠层中，氮化钛剥离液也能够剥离氮化钛涂膜，而不会腐蚀 提供该层，此外，提供可以不影响绝缘层而剥离氮化钛涂膜的氮化钛剥离液。 包含氢氟酸，过氧化氢和水的氮化钛剥离液，还包含氢氟酸以外的无机酸。 根据本发明，由于氮化钛剥离液含有氢氟酸以外的无机酸，所以即使在半导体多层层叠体具有包含钨或钨合金的层的情况下也可以剥离氮化钛被膜 ，不会被氮化钛剥离液体腐蚀。
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4.发明授权Composition for dielectric of plasma display panel, laminate for dielectric, and method for forming the dielectric 失效用于等离子体显示面板的电介质的组合物，用于电介质的层压体，以及用于形成电介质的方法公开(公告)号：US07554270B2
公开(公告)日：2009-06-30
申请号：US10554657
申请日：2004-05-17
IPC分类号： H01J17/49
CPC分类号： H01J11/38 , B32B27/08 , C03C17/34 , C03C17/3405 , C03C2217/445 , C03C2217/475 , H01J9/02 , H01J9/241 , H01J11/10 , Y10T428/26 , Y10T428/31504
摘要： A composition for a dielectric of a plasma display panel laminating a plurality of layers, includes: a lower layer composition containing inorganic powder and a binder resin, an upper layer composition containing inorganic powder, a binder resin, a photopolymerizable monomer and a photopolymerization initiator, the upper layer composition being provided above the lower layer, and an intermediate layer composition containing a thermally decomposable resin, the intermediate layer composition being provided between the lower layer and the upper layer.
摘要翻译： 用于层叠多层的等离子体显示面板的电介质组合物包括：含有无机粉末和粘合剂树脂的下层组合物，含有无机粉末的上层组合物，粘合剂树脂，光聚合性单体和光聚合引发剂， 上层组合物设置在下层上方，中间层组合物含有可热分解的树脂，中间层组合物设置在下层和上层之间。
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5.发明申请Composition for dielectric of plasma display, laminate for dielectric, and method for forming the dielectric 失效用于等离子体显示器的电介质的组合物，用于电介质的层压体，以及用于形成电介质的方法公开(公告)号：US20070042177A1
公开(公告)日：2007-02-22
申请号：US10554657
申请日：2004-05-17
CPC分类号： H01J11/38 , B32B27/08 , C03C17/34 , C03C17/3405 , C03C2217/445 , C03C2217/475 , H01J9/02 , H01J9/241 , H01J11/10 , Y10T428/26 , Y10T428/31504
摘要： A composition for a dielectric of a plasma display panel laminating a plurality of layers, includes: a lower layer composition containing inorganic powder and a binder resin, an upper layer composition containing inorganic powder, a binder resin, a photopolymerizable monomer and a photopolymerization initiator, the upper layer composition being provided above the lower layer, and an intermediate layer composition containing a thermally decomposable resin, the intermediate layer composition being provided between the lower layer and the upper layer.
摘要翻译： 用于层叠多层的等离子体显示面板的电介质组合物包括：含有无机粉末和粘合剂树脂的下层组合物，含有无机粉末的上层组合物，粘合剂树脂，光聚合性单体和光聚合引发剂， 上层组合物设置在下层上方，中间层组合物含有可热分解的树脂，中间层组合物设置在下层和上层之间。
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6.发明申请Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device 失效用于制造等离子体显示装置的前板的未烘烤的层压板以及等离子体显示装置的前板的制造方法公开(公告)号：US20050271982A1
公开(公告)日：2005-12-08
申请号：US10526491
申请日：2004-05-26
IPC分类号： G03F7/004 , G03C5/00 , G03F7/40 , H01J9/02 , H01J9/24 , H01J11/12 , H01J11/14 , H01J11/22 , H01J11/24 , H01J11/26 , H01J11/34 , H01J11/36
摘要： The present invention provides an unbaked laminate for producing a front plate (1) of a plasma display device, and a method for producing such a front plate (1). The laminate includes a burnable intermediate layer (14), and may include an unbaked dielectric layer (12A) and a photosensitive unbaked spacer material layer (16A). The burnable intermediate layer (14) positions between the dielectric layer (12) and the spacer material layer (16), and may burn up upon baking treatment, enabling removal of residues of the spacer material layer in the region subjected to its removal.
摘要翻译： 本发明提供了一种用于制造等离子体显示装置的前板（1）的未烘烤层压板，以及用于制造这种前板（1）的方法。 层压体包括可燃的中间层（14），并且可以包括未烘烤的电介质层（12A）和感光未烘烤间隔物材料层（16A）。 可燃中间层（14）位于电介质层（12）和间隔材料层（16）之间，并且可以在烘烤处理时燃烧，从而能够去除在其去除区域中的间隔材料层的残留物。
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公开(公告)号：US06506540B2
公开(公告)日：2003-01-14
申请号：US09855785
申请日：2001-05-15
IPC分类号： G03F7004
CPC分类号： G03F7/0325 , G03F7/0007 , G03F7/027 , Y10S430/106
摘要： A photopolymerizable composition comprising (A) a polymer binder, (B) a photopolymerizable monomer and (C) a photopolymerization initiator, wherein the component (B) is at least one compound represented by the following formula (1):
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8.发明授权Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device 失效用于制造等离子体显示装置的前板的未烘烤的层压板以及等离子体显示装置的前板的制造方法公开(公告)号：US07563146B2
公开(公告)日：2009-07-21
申请号：US10526491
申请日：2004-05-26
摘要： The present invention provides an unbaked laminate for producing a front plate (1) of a plasma display device, and a method for producing such a front plate (1). The laminate includes a burnable intermediate layer (14), and may include an unbaked dielectric layer (12A) and a photosensitive unbaked spacer material layer (16A). The burnable intermediate layer (14) positions between the dielectric layer (12) and the spacer material layer (16), and may burn up upon baking treatment, enabling removal of residues of the spacer material layer in the region subjected to its removal.
摘要翻译： 本发明提供了一种用于制造等离子体显示装置的前板（1）的未烘烤层压板，以及用于制造这种前板（1）的方法。 层压体包括可燃的中间层（14），并且可以包括未烘烤的电介质层（12A）和感光未烘烤间隔物材料层（16A）。 可燃中间层（14）位于电介质层（12）和间隔材料层（16）之间，并且可以在烘烤处理时燃烧，从而能够去除在其去除区域中的间隔材料层的残留物。
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9.发明申请公开(公告)号：US20070105035A1
公开(公告)日：2007-05-10
申请号：US11645172
申请日：2006-12-26
IPC分类号： G03C11/12
CPC分类号： G03F7/423
摘要： Disclosed is a photoresist stripping solution comprising: (a) a salt of hydrofluoric acid with a base free from metallic ions; and (b) a water-soluble organic solvent, wherein the content of the component (a) is 0.001 to 0.1 mass % based on the total mass of the photoresist stripping solution. Also disclosed is a method of treating a substrate, which comprises: forming a photoresist film on a substrate; subjecting it to light exposure and then to development; etching thereof with a photoresist pattern as a mask pattern; ashing the mask; and bringing the photoresist stripping solution into contact with the substrate.
摘要翻译： 公开了一种光致抗蚀剂剥离溶液，其包含：（a）氢氟酸与不含金属离子的碱的盐; 和（b）水溶性有机溶剂，其中组分（a）的含量相对于光致抗蚀剂剥离溶液的总质量为0.001〜0.1质量％。 还公开了一种处理衬底的方法，其包括：在衬底上形成光致抗蚀剂膜; 使其曝光，然后进行开发; 用光刻胶图案作为掩模图案进行蚀刻; 灰化面具; 并使光致抗蚀剂剥离溶液与基材接触。
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10.发明授权Photosensitive composition for sandblasting and photosensitive film using the same 失效用于喷砂的感光组合物和使用其的感光膜公开(公告)号：US06897011B2
公开(公告)日：2005-05-24
申请号：US10801449
申请日：2004-03-16
摘要： A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
摘要翻译： 一种用于喷砂的感光组合物，其包含以下组分：（A）包含（甲基）丙烯酰基的可光聚氨酯（甲基）丙烯酸酯低聚物; （B）丙烯酸共聚物; 和（C）光聚合引发剂，其中组分（B）包含作为单体单元的包含苯环和环己基之一的可共聚单体之一。
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