公开(公告)号：US06630768B2

公开(公告)日：2003-10-07

申请号：US09964441

申请日：2001-09-28

申请人： Takahisa Yamashiro ,  Noriyuki Kitaori ,  Kiyoteru Osawa ,  Masayasu Sato

发明人： Takahisa Yamashiro ,  Noriyuki Kitaori ,  Kiyoteru Osawa ,  Masayasu Sato

IPC分类号： H01L4109

CPC分类号： B06B1/0253 ,  B08B3/12 ,  B08B7/028 ,  D06F19/00

摘要： An ultrasonic cleaning apparatus comprises: a power amplifier for amplifying an amplitude of a signal to supply the signal as power to the ultrasonic oscillator; a phase comparator for obtaining a difference between a phase of a current flowing through the ultrasonic oscillator and a phase of a voltage applied to the ultrasonic oscillator and for generating a voltage in accordance with the phase difference; and a voltage control oscillation device for generating a frequency of the signal in accordance with the voltage generated by the phase comparator and for controlling the frequency so that the phase difference is kept within ±30°, wherein the power supplied to the ultrasonic oscillator is regulated to a range from 1W to 10W, and a difference between a resonance frequency of the ultrasonic oscillator and an anti-resonance frequency thereof is regulated to 1 kHz or more.

摘要翻译： 一种超声波清洗装置，包括：功率放大器，用于放大信号的幅度，以将该信号作为功率提供给超声波振荡器; 相位比较器，用于获得流过超声波振荡器的电流的相位与施加到超声波振荡器的电压的相位之差，并根据相位差产生电压; 以及电压控制振荡装置，用于根据相位比较器产生的电压产生信号的频率，并用于控制频率使得相位差保持在±30°内，其中提供给超声波振荡器的功率被调节 在1W〜10W的范围内，将超声波振荡器的共振频率与其反共振频率之间的差设为1kHz以上。

公开(公告)号：US06493289B2

公开(公告)日：2002-12-10

申请号：US09842909

申请日：2001-04-27

申请人： Noriyuki Kitaori ,  Takahisa Yamashiro ,  Takeshi Miyamura ,  Kiyoteru Osawa ,  Masayasu Sato

发明人： Noriyuki Kitaori ,  Takahisa Yamashiro ,  Takeshi Miyamura ,  Kiyoteru Osawa ,  Masayasu Sato

IPC分类号： B08B702

CPC分类号： B06B3/02 ,  G10K11/025

摘要： Provided is a vibrating section having an ultrasonic transducer of piezoelectric elements and a rear ultrasonic horn and a front ultrasonic horn, the horns being joined to the transducer. The ultrasonic transducer has a consumption power set at 8W or less. The ultrasonic horn has a flat front end surface, the area of the front end surface being set at 0.07 to 1 cm2.

摘要翻译： 提供了一种具有压电元件的超声波换能器和后部超声波喇叭和前部超声波喇叭的振动部分，喇叭与换能器接合。 超声波换能器的消耗功率设定在8W以下。 超声波喇叭具有平坦的前端面，前端面的面积设定为0.07〜1cm 2。

公开(公告)号：US20050054273A1

公开(公告)日：2005-03-10

申请号：US10923816

申请日：2004-08-24

申请人： Kiyoteru Osawa ,  Hiroaki Kitayama ,  Toshiya Hagihara

发明人： Kiyoteru Osawa ,  Hiroaki Kitayama ,  Toshiya Hagihara

IPC分类号： B24B1/00 ,  B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  G11B5/84

CPC分类号： B24B37/048 ,  B24B37/00 ,  C09G1/02

摘要： A polishing kit for a magnetic disk containing (A) a slurry containing an alumina, (B) an oxidizing agent solution containing an oxidizing agent, and (C) an acid agent solution containing an acid; a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (D) an additive solution containing an oxidizing agent and an inorganic acid; and a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (C) an acid agent solution containing an acid, wherein the polishing kit is used with an oxidizing agent solution (B) containing an oxidizing agent; and a polishing process for a magnetic disk substrate, including the steps of feeding a liquid mixture containing components of a specified polishing kit to a space between the magnetic disk substrate and a polishing cloth; and polishing the magnetic disk substrate with the liquid mixture. The polishing composition kit can be suitably used for the manufacture of high-quality magnetic disk substrates such as hard disks.

摘要翻译： 一种用于磁盘的抛光套件，其包含（A）含有氧化铝的浆料，（B）含有氧化剂的氧化剂溶液，和（C）含有酸的酸剂溶液; 一种用于含有（A）含有氧化铝的浆料的磁盘的抛光工具，和（D）含有氧化剂和无机酸的添加剂溶液; 以及含有（A）含有氧化铝的浆料的磁盘用研磨试剂盒，（C）含有酸的酸剂溶液，其中所述研磨试剂盒与含有氧化剂的氧化剂溶液（B）一起使用; 以及用于磁盘基板的抛光处理，包括以下步骤：将含有特定抛光组件的组分的液体混合物供给到磁盘基板和抛光布之间的空间; 并用液体混合物研磨磁盘基片。 抛光组合物试剂盒可以适用于制造诸如硬盘的高品质磁盘基片。