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公开(公告)号：US20120263883A1
公开(公告)日：2012-10-18
申请号：US13516577
申请日：2010-12-13
申请人： Hiroaki Kitayama , Shinya Goto , Toshiki Sowa
发明人： Hiroaki Kitayama , Shinya Goto , Toshiki Sowa
IPC分类号： C07C309/09 , C09D7/12 , C09K3/16 , C08F2/46
CPC分类号： C08F20/60 , C09D4/00 , C09D7/63 , C08F220/60 , C08F222/1006 , C08F226/02 , C08F226/04
摘要： The present invention provides a resin modifier capable of obtaining a coating film having satisfactory basic performances such as antistatic properties, water resistance and transparency, a method for producing a coating film using the resin modifier, and a coating film obtained by the production method. The resin modifier of the present invention is a resin modifier represented by R31—O-(AO)n—SO3−, R32—OSO3−, or R33—SO3− and an ammonium ion that has a polymerizable unsaturated group.
摘要翻译： 本发明提供一种树脂改性剂，其可以获得具有令人满意的基础性能如抗静电性，耐水性和透明性的涂膜，使用该树脂改性剂的涂膜的制备方法和通过该制备方法获得的涂膜。 本发明的树脂改性剂是由R31-O-（AO）n-SO3-，R32-OSO3-或R33-SO3-表示的树脂改性剂和具有可聚合不饱和基团的铵离子。
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公开(公告)号：US20110206990A1
公开(公告)日：2011-08-25
申请号：US13126024
申请日：2009-10-07
申请人： Ryuichi Akagi , Hiroaki Kitayama , Yoshinobu Ishikawa , Kenichi Nishimura , Takamitsu Saito , Tamaki Miura , Hiroshi Miyakubo
发明人： Ryuichi Akagi , Hiroaki Kitayama , Yoshinobu Ishikawa , Kenichi Nishimura , Takamitsu Saito , Tamaki Miura , Hiroshi Miyakubo
CPC分类号： H01M4/1391 , C01G45/1228 , C01G51/42 , C01P2004/61 , C01P2006/12 , C01P2006/14 , C01P2006/16 , H01M4/02 , H01M4/0471 , H01M4/485 , H01M2004/021
摘要： A sintered lithium complex oxide characterized in that the sintered lithium complex oxide is constituted by sintering fine particles of a lithium complex oxide, the peak pore size giving the maximum differential pore volume is 0.80-5.00 μm, the total pore volume is 0.10-2.00 mL/g, the average particle size is not less than the above-specified peak pore size but not more than 20 μm, there is a sub-peak giving a differential pore volume not less than 10% of the maximum differential pore volume on the smaller pore size side with respect to the above-specified peak pore size, the pore size corresponding to the sub-peak is more than 0.50 μm but not more than 2.00 μm, the BET specific surface area of the sintered lithium complex oxide is 1.0-10.0 m2/g, and the half width of the maximum peak among X-ray diffraction peaks in an X-ray diffraction measurement is 0.12-0.30 deg.
摘要翻译： 一种烧结锂复合氧化物，其特征在于，烧结锂复合氧化物是通过烧结锂复合氧化物的细颗粒构成的，提供最大微孔容积的峰值孔径为0.80-5.00μm，总孔体积为0.10-2.00mL / g，平均粒径不小于上述规定的峰值孔径但不大于20μm，具有不小于最大微孔容积的10％的微孔容积的次峰值在较小的 相对于上述规定的峰值孔径的孔径侧，与亚峰对应的孔径大于0.50μm且不大于2.00μm，烧结的锂复合氧化物的BET比表面积为1.0〜10.0 m 2 / g，X射线衍射测定中的X射线衍射峰中的最大峰的半值宽度为0.12-0.30度。
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公开(公告)号：US20100248034A1
公开(公告)日：2010-09-30
申请号：US12745873
申请日：2008-12-03
申请人： Kazuo Oki , Minoru Sawai , Hiroaki Kitayama , Takamitsu Saito , Tamaki Miura , Kyoichi Watanabe
发明人： Kazuo Oki , Minoru Sawai , Hiroaki Kitayama , Takamitsu Saito , Tamaki Miura , Kyoichi Watanabe
CPC分类号： H01M4/13 , H01M4/02 , H01M4/139 , H01M4/364 , H01M4/622 , H01M4/625 , H01M2004/021 , H01M2004/028
摘要： The present invention provides a composite material for positive electrodes of lithium batteries, which provides a lithium battery having excellent high rate electrical discharge characteristics, has a sufficiently secured diffusion passage for Li, and has high conductivity, a process for producing the same, as well as a positive electrode and a battery using the composite material for positive electrodes of lithium batteries. The present invention relates to a composite material for positive electrodes of lithium batteries, comprising composite particles containing positive electrode active material particles and fibrous carbons, wherein the composite particles have a form in which the positive electrode active material particles are supported by the fibrous carbons.
摘要翻译： 本发明提供一种锂电池正极复合材料，其提供具有优异的高放电特性的锂电池，具有充分确保的Li的扩散通道，并且具有高的导电性，以及其制造方法 作为正极和使用锂电池用正极复合材料的电池。 本发明涉及一种锂电池正极复合材料，其包含含有正极活性物质粒子和纤维状碳的复合粒子，其中复合粒子具有正极活性物质粒子被纤维状碳负担的形式。
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公开(公告)号：US20050136807A1
公开(公告)日：2005-06-23
申请号：US11062462
申请日：2005-02-22
申请人： Hiroaki Kitayama , Shigeo Fujii
发明人： Hiroaki Kitayama , Shigeo Fujii
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition for a magnetic disk, comprising alumina, water, a peroxide and an organic acid; a polishing process for a substrate to be polished, comprising the step of polishing the substrate to be polished with the polishing composition; and a process for manufacturing a substrate, comprising the step of polishing a substrate to be polished with the polishing composition. The polishing composition can be suitably used for the manufacture of a magnetic disk substrate for high-quality hard disks and the like.
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公开(公告)号：US20050032465A1
公开(公告)日：2005-02-10
申请号：US10899065
申请日：2004-07-27
申请人： Shigeo Fujii , Hiroaki Kitayama
发明人： Shigeo Fujii , Hiroaki Kitayama
CPC分类号： G11B5/7315 , G11B5/8404 , Y10T428/24355
摘要： A method for manufacturing a substrate for a magnetic disk, including the steps of (a) polishing a substrate with a polishing composition A containing alumina abrasives having an average particle size of from 0.05 to 0.5 μm, and an oxidizing agent, and (b) polishing the substrate with a polishing composition B containing silica particles having an average particle size of from 0.005 to 0.1 μm; a substrate for a magnetic disk, obtainable by the method for manufacturing a substrate for a magnetic disk; and a substrate for a magnetic disk having the following surface properties of a long-wavelength waviness of 0.05 nm or more and 0.3 nm or less, and an AFM surface roughness of 0.03 nm or more and 0.2 nm or less. The substrate for a magnetic disk may be suitably used in the manufacture of a hard disk having a high recording density. Especially, a hard disk having a recording density of 50 G bits or more per square inch may be industrially manufactured.
摘要翻译： 一种制造磁盘用基板的方法，包括以下步骤：（a）用平均粒径为0.05〜0.5μm的氧化铝研磨剂和氧化剂的研磨用组合物A研磨基板，（b） 用含有平均粒度为0.005〜0.1μm的二氧化硅粒子的研磨用组合物B研磨基材; 用于磁盘的基板，可通过制造用于磁盘的基板的方法获得; 以及具有0.05nm以上且0.3nm以下的长波长波纹的以下表面特性以及0.03nm以上且0.2nm以下的AFM表面粗糙度的磁盘用基板。 用于磁盘的基板可以适用于制造具有高记录密度的硬盘。 特别地，可以在工业上制造具有50G位或更多每平方英寸的记录密度的硬盘。
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公开(公告)号：US20050003746A1
公开(公告)日：2005-01-06
申请号：US10875266
申请日：2004-06-25
申请人： Shigeo Fujii , Hiroaki Kitayama
发明人： Shigeo Fujii , Hiroaki Kitayama
IPC分类号： B24B37/00 , C09G1/02 , C09K3/14 , C09K13/00 , G11B5/84 , G11B7/26 , G11B11/105 , B24D3/02 , B24B1/00
CPC分类号： C09G1/02 , C09K3/1463
摘要： A polishing composition containing an α-alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying the polishing composition to the substrate to be polished; and a method for manufacturing a substrate, including the step of polishing a substrate to be polished with the polishing composition. The polishing composition is suitable for polishing substrates for precision parts such as substrates for magnetic recording media for magnetic discs, optical discs, opto-magnetic discs, and the like; photomask substrates; glass for liquid crystals; optical lenses; optical mirrors; optical prisms; and semiconductor substrates.
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公开(公告)号：US07204936B2
公开(公告)日：2007-04-17
申请号：US10625610
申请日：2003-07-24
申请人： Hiroaki Kitayama , Shigeo Fujii , Toshiya Hagihara
发明人： Hiroaki Kitayama , Shigeo Fujii , Toshiya Hagihara
IPC分类号： C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition comprising 0.03 to 0.5% by weight of an organic acid or a salt thereof, an abrasive and water, wherein the abrasive has a surface potential of from −140 to 200 mV; a roll-off reducing agent comprising an inorganic compound having a property of controlling a surface potential of an abrasive in a polishing composition, wherein a surface potential of the abrasive in a standard polishing composition is controlled to −110 to 250 mV by the presence of the inorganic compound, wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, the abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of α-type corundum crystal, 1 part by weight of citric acid, 78 parts by weight of water and 1 part by weight of an inorganic compound. The polishing composition or the roll-off reducing agent composition can be favorably used in polishing the substrate for precision parts.
摘要翻译： 一种抛光组合物，其包含0.03至0.5重量％的有机酸或其盐，研磨剂和水，其中所述研磨剂具有-140至200mV的表面电位; 包括具有控制抛光组合物中研磨剂的表面电位的性质的无机化合物的滚降还原剂，其中通过存在下述方法将标准抛光组合物中的研磨剂的表面电位控制在-110至250mV 无机化合物，其中制备包含20重量份研磨剂的标准抛光组合物，所述研磨剂是具有98.0的纯度的高纯度氧化铝 由α型刚玉晶体，1重量份柠檬酸，78重量份水和1重量份无机化合物组成的重量％以上。 抛光组合物或滚降还原剂组合物可有利地用于抛光精密零件用基板。
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8.发明授权Aqueous emulsion for pressure-sensitive adhesive and process for the preparation thereof 失效用于压敏粘合剂的水性乳液及其制备方法公开(公告)号：US06190767B1
公开(公告)日：2001-02-20
申请号：US09011504
申请日：1998-02-09
IPC分类号： C09J702
CPC分类号： C09J133/06 , C08F20/28 , C09J2201/606 , Y10T428/2891
摘要： A pressure-sensitive adhesive prepared by emulsifying dispersing a monomer mixture containing at least 50% by weight, based on the total weight of the monomer mixture, of a long-chain alkyl (meth)acrylate with the alkyl having 9 to 13 carbon atoms in an aqueous surfactant solution to bring the monomer mixture to fine particles having an average diameter of not more than 2.0 &mgr;m and polymerizing the monomer mixture in the presence of a water-soluble polymerization initiator can provide a pressure-sensitive adhesive which possesses excellent moisture resistance, water resistance, weather resistance, and adhesion to a nonpolar adherend, such as a polyolefin plastic, and, at the same time, well-balanced tackiness properties.
摘要翻译： 一种压敏粘合剂，其通过将含有至少50重量％的单体混合物（基于单体混合物的总重量）分散在具有9至13个碳原子的烷基的（甲基）丙烯酸长链烷基酯上， 使单体混合物成为平均粒径不大于2.0μm的微粒并在水溶性聚合引发剂的存在下使单体混合物聚合的水性表面活性剂溶液可提供具有优异的耐湿性的压敏粘合剂， 耐水性，耐候性和与非极性被粘物（例如聚烯烃塑料）的粘合性，同时具有均匀的粘性。
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公开(公告)号：US08444875B2
公开(公告)日：2013-05-21
申请号：US12746118
申请日：2008-12-03
申请人： Kazuo Oki , Minoru Sawai , Hiroaki Kitayama , Takamitsu Saito , Tamaki Miura , Kyoichi Watanabe
发明人： Kazuo Oki , Minoru Sawai , Hiroaki Kitayama , Takamitsu Saito , Tamaki Miura , Kyoichi Watanabe
CPC分类号： C01G1/02 , C01G45/1242 , C01P2002/72 , C01P2004/34 , C01P2004/50 , C01P2004/61 , C01P2004/62 , C01P2006/10 , C01P2006/12 , C01P2006/14 , C01P2006/16 , H01M4/505
摘要： The burned composite metal oxide of the present invention is a burned composite metal oxide which is porous and particulate and which is obtained by subjecting a slurry comprising at least one metal oxide (a), at least one metal compound (b) and a solvent to spray granulation to obtain granules, and burning the granules, the metal oxide (a) selected from the group consisting of a transition metal oxide and an oxide of a metal belonging to 3B, 4B and 5B of a periodic table, the metal compound (b) selected from the group consisting of an alkali metal compound and an alkali earth metal compound, wherein the metal oxide (a) and the metal compound (b) are sparingly soluble in the solvent; the burning is conducted after a heat-maintaining step of heating the granules obtained by the spray granulation at a temperature in a range of ±200° C. based on the decomposition temperature of the metal compound (b); and the metal compound (b) contains at least a nonmetallic element component desorbed in the heat-maintaining step.
摘要翻译： 本发明的燃烧复合金属氧化物是多孔和颗粒的燃烧复合金属氧化物，其通过将包含至少一种金属氧化物（a），至少一种金属化合物（b）和溶剂的浆料经受 喷雾造粒以获得颗粒，并且将颗粒，选自过渡金属氧化物和属于周期表3B，4B和5B的金属的氧化物的金属氧化物（a）燃烧，金属化合物（b ）选自碱金属化合物和碱土金属化合物，其中金属氧化物（a）和金属化合物（b）微溶于溶剂; 基于金属化合物（b）的分解温度，在±200℃的范围内的温度下，对通过喷雾造粒得到的颗粒进行加热保温步骤后进行燃烧; 并且所述金属化合物（b）在所述保温工序中含有至少解吸附的非金属元素成分。
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公开(公告)号：US08241516B2
公开(公告)日：2012-08-14
申请号：US12122532
申请日：2008-05-16
申请人： Shigeo Fujii , Hiroaki Kitayama
发明人： Shigeo Fujii , Hiroaki Kitayama
CPC分类号： G11B5/7315 , G11B5/8404 , Y10T428/24355
摘要： A method for manufacturing a substrate for a magnetic disk, including the steps of (a) polishing a substrate with a polishing composition A containing alumina abrasives having an average particle size of from 0.05 to 0.5 μm, and an oxidizing agent, and (b) polishing the substrate with a polishing composition B containing silica particles having an average particle size of from 0.005 to 0.1 μm; a substrate for a magnetic disk, obtainable by the method for manufacturing a substrate for a magnetic disk; and a substrate for a magnetic disk having the following surface properties of a long-wavelength waviness of 0.05 nm or more and 0.3 nm or less, and an AFM surface roughness of 0.03 nm or more and 0.2 nm or less. The substrate for a magnetic disk may be suitably used in the manufacture of a hard disk having a high recording density. Especially, a hard disk having a recording density of 50 G bits or more per square inch may be industrially manufactured.
摘要翻译： 一种制造磁盘用基板的方法，包括以下步骤：（a）用含有平均粒径为0.05〜0.5μm的氧化铝研磨剂和氧化剂的研磨用组合物A研磨基板，（b） 用含有平均粒度为0.005〜0.1μm的二氧化硅粒子的研磨用组合物B研磨基板; 用于磁盘的基板，可通过制造用于磁盘的基板的方法获得; 以及具有0.05nm以上且0.3nm以下的长波长波纹的以下表面特性以及0.03nm以上且0.2nm以下的AFM表面粗糙度的磁盘用基板。 用于磁盘的基板可以适用于制造具有高记录密度的硬盘。 特别地，可以在工业上制造具有50G位或更多每平方英寸的记录密度的硬盘。
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