CONTROL DEVICE FOR A VARIABLE DAMPER
    3.
    发明申请
    CONTROL DEVICE FOR A VARIABLE DAMPER 有权
    可变阻尼器的控制装置

    公开(公告)号:US20090112402A1

    公开(公告)日:2009-04-30

    申请号:US12255169

    申请日:2008-10-21

    IPC分类号: B60G17/016

    摘要: A control device for controlling a variable damper of a wheel suspension system includes a first sensor detecting a first dynamic state variable of a vehicle body, a damping force base value determining unit determining a target damping force base value, a second sensor detecting a second dynamic state variable of the vehicle body; a correction value determining unit determining a damping force correction value, and a target damping force determining unit determining a target damping force. When the differential value of the lateral acceleration is relatively high (or the target damping force is high), a drive current to the variable damper is increased. The same is true when the vehicle is undergoing a pitching movement. The target damping force may be obtained by subtracting the damping force correction value from the target damping force base value.

    摘要翻译: 一种用于控制车轮悬挂系统的可变阻尼器的控制装置,包括检测车体的第一动态状态变量的第一传感器,确定目标阻尼力基值的阻尼力基础值确定单元,检测第二动态 车身状态变量; 确定阻尼力校正值的校正值确定单元和确定目标阻尼力的目标阻尼力确定单元。 当横向加速度的差值相对较高(或目标阻尼力高)时,到可变阻尼器的驱动电流增加。 当车辆正在进行俯仰运动时也是如此。 可以通过从目标阻尼力基值减去阻尼力校正值来获得目标阻尼力。

    Control device for a variable damper
    4.
    发明授权
    Control device for a variable damper 有权
    可变阻尼器的控制装置

    公开(公告)号:US08090501B2

    公开(公告)日:2012-01-03

    申请号:US12255169

    申请日:2008-10-21

    IPC分类号: B60G17/016

    摘要: A control device for controlling a variable damper of a wheel suspension system includes a first sensor detecting a first dynamic state variable of a vehicle body, a damping force base value determining unit determining a target damping force base value, a second sensor detecting a second dynamic state variable of the vehicle body; a correction value determining unit determining a damping force correction value, and a target damping force determining unit determining a target damping force. When the differential value of the lateral acceleration is relatively high (or the target damping force is high), a drive current to the variable damper is increased. The same is true when the vehicle is undergoing a pitching movement. The target damping force may be obtained by subtracting the damping force correction value from the target damping force base value.

    摘要翻译: 一种用于控制车轮悬挂系统的可变阻尼器的控制装置,包括检测车体的第一动态状态变量的第一传感器,确定目标阻尼力基值的阻尼力基础值确定单元,检测第二动态 车身状态变量; 确定阻尼力校正值的校正值确定单元和确定目标阻尼力的目标阻尼力确定单元。 当横向加速度的差值相对较高(或目标阻尼力高)时,到可变阻尼器的驱动电流增加。 当车辆正在进行俯仰运动时也是如此。 可以通过从目标阻尼力基值减去阻尼力校正值来获得目标阻尼力。

    Rotary cleaning method with chemical solutions and rotary cleaning
apparatus with chemical solutions
    8.
    发明授权
    Rotary cleaning method with chemical solutions and rotary cleaning apparatus with chemical solutions 失效
    具有化学溶液的旋转清洗方法和具有化学溶液的旋转清洁装置

    公开(公告)号:US5487398A

    公开(公告)日:1996-01-30

    申请号:US262602

    申请日:1994-06-20

    摘要: To provide a cleaning method and a cleaning apparatus for decreasing the total cost by producing high-performance semiconductor using silicon wafers with cleaner surface, decreasing the semiconductor production cost, decreasing the consumption of chemical solutions and the cleaning time by using a new cleaning method and apparatus, simplifying the recovery of waste liquids, and decreasing equipment investment.A cleaning method having a plurality of chemical-solution-cleaning processes characterized by performing a chemical-solution-cleaning process for continuously feeding a chemical solution to the surface of an object to be cleaned from an upper part of the object surface by horizontally setting the object in a cleaning bath, closing the bath, and then rotating the object and an ultrapure-water-cleaning process for feeding ultrapure water in order for each chemical solution in the same cleaning bath; and thereafter drying the object after cleaning it.

    摘要翻译: 为了提供清洁方法和清洁装置,通过使用具有更清洁表面的硅晶片生产高性能半导体来降低总成本,降低半导体制造成本,通过使用新的清洁方法减少化学溶液的消耗和清洁时间,以及 设备,简化废液回收,减少设备投资。 一种具有多个化学溶液清洗方法的清洗方法,其特征在于进行化学溶液清洗处理,用于通过水平设定所述化学溶液清洗工序,从所述物体表面的上部连续地供给化学溶液到待清洁物体的表面 在清洁浴中,关闭浴缸,然后旋转物体,并进行超纯水清洗过程,以提供超纯水,以使每个化学溶液在同一个清洗槽中; 然后在清洁物体之后干燥物体。