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    Pattern inspection method and system therefor
    1.
    发明申请
    Pattern inspection method and system therefor 审中-公开
    图案检验方法及系统

    公开(公告)号：US20070131877A9

    公开(公告)日：2007-06-14

    申请号：US10062666

    申请日：2002-02-05

    申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Munenori Fukunishi ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Munenori Fukunishi ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    IPC分类号： G01N23/00

    CPC分类号： G06K9/6211 ,  G01N23/22 ,  G06K9/033 ,  G06K2209/19 ,  G06T7/001 ,  G06T2207/30148

    摘要： Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, the present invention, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, enables the retrieval of image data via an outside results confirmation system. Further, in the case of defect data of a plurality of substrates, it is enabled to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.

    摘要翻译： 通常，由检查系统输出的缺陷数据仅包括诸如坐标数据，面积和投影长度的特征定量数据，并且仅有用于移动到缺陷位置的坐标数据可以被有效地利用。 相比之下，本发明通过使用除了特征定量数据之外的图像数据作为检查系统的缺陷数据，能够经由外部结果确认系统检索图像数据。 此外，在多个基板的缺陷数据的情况下，能够通过图像检索相似缺陷的事实在检查期间显示缺陷图像，并且检索结果被显示为趋势，使得可以在显示缺陷图像期间显示缺陷图像 通过搜索图像上的类似缺陷并将其显示为趋势，指定趋势上的基板，从而显示其缺陷图并指定缺陷图上的缺陷来进行检查。

    Apparatus for inspecting a specimen
    2.
    发明授权
    Apparatus for inspecting a specimen 有权
    用于检查样本的装置

    公开(公告)号：US07049587B2

    公开(公告)日：2006-05-23

    申请号：US10079428

    申请日：2002-02-22

    申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Munenori Fukunishi ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Munenori Fukunishi ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： G06K9/6211 ,  G01N23/22 ,  G06K9/033 ,  G06K2209/19 ,  G06T7/001 ,  G06T2207/30148

    摘要： Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, the retrieval of image data via an outside results confirmation system is made possible. Further, for defect data of a plurality of substrates, it is possible to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends, which makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, and designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.

    摘要翻译： 通常，由检查系统输出的缺陷数据仅包括诸如坐标数据，面积和投影长度的特征定量数据，并且仅有用于移动到缺陷位置的坐标数据可以被有效地利用。 相反，通过使用特征定量数据以外的图像数据作为检查系统的缺陷数据，可以经由外部结果确认系统检索图像数据。 此外，对于多个基板的缺陷数据，可以通过图像检索类似缺陷的事实在检查期间显示缺陷图像，并且检索结果被显示为趋势，这使得可以在检查期间显示缺陷图像 通过搜索图像上的类似缺陷并将其显示为趋势，并在趋势上指定基底，从而显示其缺陷图并指定缺陷图上的缺陷。

    METHOD AND ITS APPARATUS FOR INSPECTING A PATTERN
    3.
    发明申请
    METHOD AND ITS APPARATUS FOR INSPECTING A PATTERN 审中-公开
    用于检查图案的方法及其装置

    公开(公告)号：US20080002876A1

    公开(公告)日：2008-01-03

    申请号：US11853500

    申请日：2007-09-11

    申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

    摘要翻译： 在图案检查装置中，将可以预期相同图案的位置的图像彼此进行比较。 然而，通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题，在高灵敏度条件下检测到的缺陷被认为是缺陷候选，并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外，将如此获得的临界阈值与多个阈值进行比较，从而允许在单次检查中获得多个检查结果。

    Method and its apparatus for inspecting a pattern
    4.
    发明授权
    Method and its apparatus for inspecting a pattern 有权
    检查图案的方法及其装置

    公开(公告)号：US07269280B2

    公开(公告)日：2007-09-11

    申请号：US10062632

    申请日：2002-02-05

    申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

    摘要翻译： 在图案检查装置中，将可以预期相同图案的位置的图像彼此进行比较。 然而，通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题，在高灵敏度条件下检测到的缺陷被认为是缺陷候选，并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外，将如此获得的临界阈值与多个阈值进行比较，从而允许在单次检查中获得多个检查结果。