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公开(公告)号：US20060039003A1
公开(公告)日：2006-02-23
申请号：US11256151
申请日：2005-10-24
IPC分类号： G01N21/55
CPC分类号： G01N21/553
摘要： Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.
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公开(公告)号：US07030988B2
公开(公告)日：2006-04-18
申请号：US10102203
申请日：2002-03-21
IPC分类号： G01N21/55
CPC分类号： G01N21/553
摘要： Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.
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公开(公告)号：US07075654B2
公开(公告)日：2006-07-11
申请号：US11256151
申请日：2005-10-24
CPC分类号： G01N21/553
摘要： Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.
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公开(公告)号：US06885454B2
公开(公告)日：2005-04-26
申请号：US10108258
申请日：2002-03-28
申请人： Masayuki Naya , Nobufumi Mori , Toshihito Kimura , Hitoshi Shimizu , Shu Sato
发明人： Masayuki Naya , Nobufumi Mori , Toshihito Kimura , Hitoshi Shimizu , Shu Sato
CPC分类号： G01N21/553
摘要： A measuring apparatus is disclosed which includes a measuring unit equipped with a dielectric block and a thin film layer; an incidence system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer; and a photodetector for receiving the light beam totally reflected at the interface. The measuring unit is measured a plurality of times, and a change in the state of attenuated total reflection during the plurality of measurements is detected. The sensor further includes a tilt measurement section for measuring the longitudinal tilt of the interface which changes the incidence angles during the plurality of measurements, and a calculating section for obtaining a measured value in which errors due to the longitudinal tilt have been corrected.
摘要翻译： 公开了一种测量装置，其包括配备有介质块和薄膜层的测量单元; 用于使光束进入介质块的入射系统使得在介电块和薄膜层之间的界面处满足全内反射条件; 以及用于接收在界面处全反射的光束的光电检测器。 测量测量单元多次，并且检测在多个测量期间衰减的全反射状态的变化。 传感器还包括用于测量在多个测量期间改变入射角的界面的纵向倾斜的倾斜测量部分，以及用于获得校正了由于纵向倾斜引起的误差的测量值的计算部分。
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公开(公告)号：US06697158B2
公开(公告)日：2004-02-24
申请号：US10113960
申请日：2002-04-02
IPC分类号： G01N2155
CPC分类号： G01N21/553
摘要： Disclosed herein is a measuring apparatus utilizing attenuated total reflection. The measuring apparatus is equipped with a dielectric block, a thin film layer formed on one surface of the dielectric block, an optical system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer, and a two-piece photodiode for detecting the light beam totally reflected at the interface. When attenuated total reflection is detected a plurality of times for a single sample, the two-piece photodiode is disposed at a predetermined position relative to a dark line when a first measurement is made. The two-piece photodiode is also disposed at the same position as the predetermined position stored in a storage unit when a second measurement and measurements thereafter are made.
摘要翻译： 本文公开了一种利用衰减全反射的测量装置。 测量装置配备有介质块，形成在介质块的一个表面上的薄膜层，用于使光束进入介电块的光学系统，使得在内部反射的一个界面处满足完全内部反射的条件 介质块和薄膜层，以及用于检测在界面处全反射的光束的两片光电二极管。 当对单个样本检测多次衰减的全反射时，当进行第一测量时，两片光电二极管相对于暗线设置在预定位置。 当进行第二测量和其后的测量时，两件式光电二极管也被设置在与存储单元中存储的预定位置相同的位置。
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公开(公告)号：US07830521B2
公开(公告)日：2010-11-09
申请号：US11864711
申请日：2007-09-28
IPC分类号： G01N21/00
CPC分类号： G01N21/553 , G01N2021/157
摘要： Provided are a detection apparatus, a detection method and an optically transparent member, which can detect a decrease in a precision. A convolution is performed by a convolution portion 80 contained in an image processing portion 38, to acquire the distribution information indicating the light intensity distribution of a light beam, which is totally reflected at the interface and which is incident at a plurality of angles to an dielectric block 52 so as to be totally reflected at the interface of the dielectric block 52. A spatial frequency resolution is performed on the light intensity distribution indicated by the distribution information acquired, by a detection precision evaluating portion 86 contained in the image processing portion 38, to thereby derive the light intensity distribution of each spatial frequency of the light beam. The precision is detected by comparing the light intensity distribution derived, with a threshold value predetermined for each spatial frequency.
摘要翻译： 提供了能够检测精度降低的检测装置，检测方法和光学透明构件。 通过包含在图像处理部分38中的卷积部分80执行卷积，以获取指示在该界面处被全反射并以多个角度入射的光束的光强度分布的分布信息 介质块52，以便在介质块52的界面处被全反射。通过由图像处理部分38中包含的检测精度评估部分86对由所获取的分布信息指示的光强度分布执行空间频率分辨率 ，从而导出光束的每个空间频率的光强度分布。 通过将导出的光强度分布与针对每个空间频率预定的阈值进行比较来检测精度。
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7.发明授权公开(公告)号：US06791691B2
公开(公告)日：2004-09-14
申请号：US10273270
申请日：2002-10-18
IPC分类号： G01N2155
CPC分类号： G01N21/553 , G01N21/43
摘要： A state of attenuation in total internal reflection is detected by the use of a measuring apparatus having a measuring unit and a reference unit and a measuring system which corrects result of detection by the measuring unit on the basis of result of detection by the reference unit and measures the change of a state of attenuation in total internal reflection on the basis of the corrected result of detection by the measuring unit. The difference in sensitivity between the measuring unit and the reference unit is detected before initiating the measurement of the change of a state of attenuation in total internal reflection, and result of measurement by the measuring system is calibrated on the basis of the difference in sensitivity between the measuring unit and the reference unit.
摘要翻译： 通过使用具有测量单元和参考单元的测量装置以及基于由参考单元的检测结果校正测量单元的检测结果的测量系统来检测全内反射的衰减状态，以及 根据校正检测结果，测量全内反射的衰减状态的变化。 在开始测量全内反射中的衰减状态的测量之前，检测测量单元和参考单元之间的灵敏度差异，并且基于测量系统的灵敏度差校正测量系统的结果， 测量单元和参考单元。
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公开(公告)号：US20080079951A1
公开(公告)日：2008-04-03
申请号：US11864711
申请日：2007-09-28
IPC分类号： G01B11/30
CPC分类号： G01N21/553 , G01N2021/157
摘要： Provided are a detection apparatus, a detection method and an optically transparent member, which can detect a decrease in a precision. A convolution is performed by a convolution portion 80 contained in an image processing portion 38, to acquire the distribution information indicating the light intensity distribution of a light beam, which is totally reflected at the interface and which is incident at a plurality of angles to an dielectric block 52 so as to be totally reflected at the interface of the dielectric block 52. A spatial frequency resolution is performed on the light intensity distribution indicated by the distribution information acquired, by a detection precision evaluating portion 86 contained in the image processing portion 38, to thereby derive the light intensity distribution of each spatial frequency of the light beam. The precision is detected by comparing the light intensity distribution derived, with a threshold value predetermined for each spatial frequency.
摘要翻译： 提供了能够检测精度降低的检测装置，检测方法和光学透明构件。 通过包含在图像处理部分38中的卷积部分80执行卷积，以获取指示在该界面处被全反射并以多个角度入射的光束的光强度分布的分布信息 介质块52，以便在介质块52的界面处被完全反射。 由包含在图像处理部分38中的检测精度评估部分86对由所获取的分布信息指示的光强度分布执行空间频率分辨率，从而导出光束的每个空间频率的光强度分布。 通过将导出的光强度分布与针对每个空间频率预定的阈值进行比较来检测精度。
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9.发明授权公开(公告)号：US07187444B2
公开(公告)日：2007-03-06
申请号：US10291566
申请日：2002-11-12
申请人： Masayuki Naya , Mitsuru Sawano , Shu Sato , Toshihito Kimura , Hitoshi Shimizu
发明人： Masayuki Naya , Mitsuru Sawano , Shu Sato , Toshihito Kimura , Hitoshi Shimizu
IPC分类号： G01N21/55
CPC分类号： G01N21/553
摘要： In a measuring method utilizing the phenomenon of attenuation in total internal reflection in which a light beam is caused to enter a dielectric block provided with a film layer to be brought into contact with a sample so that total internal reflection conditions are satisfied at the interface of the dielectric block and the film layer and various angles of incidence of the light beam to the interface of the dielectric block and the film layer can be obtained, and the intensity of the light beam reflected in total internal reflection at the interface is detected, the light beam is caused to intermittently impinge upon the dielectric block.
摘要翻译： 在利用全内反射的衰减现象的测量方法中，使得光束被引入具有与样品接触的膜层的介电块，使得在内部反射条件的界面处满足全内反射条件 可以获得介质块和膜层以及光束到介质块和膜层的界面的各种入射角度，并且检测在界面处的全内反射中反射的光束的强度， 导致光束间歇地撞击介质块。
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公开(公告)号：US07102754B2
公开(公告)日：2006-09-05
申请号：US10932270
申请日：2004-09-02
IPC分类号： G01N21/55
CPC分类号： G01N21/553 , G01N21/43
摘要： A state of attenuation in total internal reflection is detected by the use of a measuring apparatus having a measuring unit and a reference unit and a measuring system which corrects result of detection by the measuring unit on the basis of result of detection by the reference unit and measures the change of a state of attenuation in total internal reflection on the basis of the corrected result of detection by the measuring unit. The difference in sensitivity between the measuring unit and the reference unit is detected before initiating the measurement of the change of a state of attenuation in total internal reflection, and result of measurement by the measuring system is calibrated on the basis of the difference in sensitivity between the measuring unit and the reference unit.
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