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    POLISHING PAD AND METHOD FOR PRODUCING SAME
    1.
    发明申请
    POLISHING PAD AND METHOD FOR PRODUCING SAME 有权
    抛光垫及其制造方法

    公开(公告)号：US20110256817A1

    公开(公告)日：2011-10-20

    申请号：US13141298

    申请日：2009-12-24

    申请人： Takeshi Fukuda ,  Nobuyoshi Ishizaka

    发明人： Takeshi Fukuda ,  Nobuyoshi Ishizaka

    IPC分类号： B24D11/00 ,  B24D18/00

    CPC分类号： B24B37/24 ,  Y10T428/249978

    摘要： An object of the invention is to provide a polishing pad that achieves a high polishing rate and has high thickness precision so that the break-in time (dummy polishing time) can be shortened, and to provide a method for producing same. The invention is directed to a polishing pad including a base material layer and a polishing layer provided on the base material layer, wherein the polishing layer includes a thermoset polyurethane foam having roughly spherical interconnected cells with an average cell diameter of 35 to 200 μm, and the polishing layer has a storage modulus E′ (40° C.) of 130 to 400 MPa at 40° C., a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (60° C.) at 60° C. [E′(30° C.)/E′(60° C.)] of 1 to less than 2.5, and a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (90° C.) at 90° C. [E′(30° C.)/E′(90° C.)] of 15 to 130.

    摘要翻译： 本发明的目的是提供一种能够实现高抛光速度并且具有高厚度精度的抛光垫，从而可以缩短打入时间（假抛光时间），并提供其制造方法。 本发明涉及一种抛光垫，其包括基材层和设置在基材层上的抛光层，其中抛光层包括具有平均泡孔直径为35至200μm的具有大致球形互连孔的热固性聚氨酯泡沫，以及 研磨层在40℃下的储能模量E'（40℃）为130〜400MPa，在30℃下的储能模量E'（30℃）与储能模量E'（ 60℃，60℃，[E'（30℃）/ E'（60℃）]为1〜小于2.5，储能模量E'（30℃） 在90℃下，在90℃下的储能模量E'（90℃）为15〜130℃[E'（30℃）/ E'（90℃）]。

    Polishing pad and method for producing same
    2.
    发明授权
    Polishing pad and method for producing same 有权
    抛光垫及其制造方法

    公开(公告)号：US09156127B2

    公开(公告)日：2015-10-13

    申请号：US13141298

    申请日：2009-12-24

    申请人： Takeshi Fukuda ,  Nobuyoshi Ishizaka

    发明人： Takeshi Fukuda ,  Nobuyoshi Ishizaka

    IPC分类号： B32B3/00 ,  B32B3/26 ,  B24D11/00 ,  B24B37/24

    CPC分类号： B24B37/24 ,  Y10T428/249978

    摘要： An object of the invention is to provide a polishing pad that achieves a high polishing rate and has high thickness precision so that the break-in time (dummy polishing time) can be shortened, and to provide a method for producing same. The invention is directed to a polishing pad including a base material layer and a polishing layer provided on the base material layer, wherein the polishing layer includes a thermoset polyurethane foam having roughly spherical interconnected cells with an average cell diameter of 35 to 200 μm, and the polishing layer has a storage modulus E′ (40° C.) of 130 to 400 MPa at 40° C., a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (60° C.) at 60° C. [E′(30° C.)/E′(60° C.)] of 1 to less than 2.5, and a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (90° C.) at 90° C. [E′(30° C.)/E′(90° C.)] of 15 to 130.

    摘要翻译： 本发明的目的是提供一种能够实现高抛光速度并且具有高厚度精度的抛光垫，从而可以缩短打入时间（假抛光时间），并提供其制造方法。 本发明涉及一种抛光垫，其包括基材层和设置在基材层上的抛光层，其中抛光层包括具有平均泡孔直径为35至200μm的具有大致球形互连孔的热固性聚氨酯泡沫，以及 研磨层在40℃下的储能模量E'（40℃）为130〜400MPa，在30℃下的储能模量E'（30℃）与储能模量E'（ 60℃，60℃，[E'（30℃）/ E'（60℃）]为1〜小于2.5，储能模量E'（30℃） 在90℃下，在90℃下的储能模量E'（90℃）为15〜130℃[E'（30℃）/ E'（90℃）]。

    Catalyst for living radical polymerization and polymerization method
    3.
    发明授权
    Catalyst for living radical polymerization and polymerization method 有权
    催化剂用于活性自由基聚合和聚合方法

    公开(公告)号：US09546226B2

    公开(公告)日：2017-01-17

    申请号：US13388811

    申请日：2010-05-10

    申请人： Atsushi Goto ,  Yoshinobu Tsujii ,  Takeshi Fukuda

    发明人： Atsushi Goto ,  Yoshinobu Tsujii ,  Takeshi Fukuda

    IPC分类号： C08F20/14 ,  C08F4/40 ,  C08F293/00 ,  C08F12/08 ,  C08F120/14

    CPC分类号： C08F4/40 ,  C08F12/08 ,  C08F120/14 ,  C08F293/005 ,  C08F2438/00

    摘要： Provided is a low-cost, highly active, environmentally friendly living radical polymerization catalyst which does not require a radical initiator. An organic compound having an oxidation-reduction capability is used as a catalyst. Even if a radical initiator is not used, a monomer can be subjected to a radical polymerization to obtain a polymer having narrow molecular weight distribution. The cost of the living radical polymerization can be remarkably reduced. It is made possible to prevent adverse effects of using a radical initiator. The present invention is significantly more environmentally friendly and economically excellent than conventional living radical polymerization methods, due to advantages of the catalyst such as low toxicity of the catalyst, low amount of the catalyst necessary, high solubility of the catalyst, mild reaction conditions, and no coloration/no odor (which do not require a post-treatment for a molded article), etc.

    摘要翻译： 提供了不需要自由基引发剂的低成本，高活性，环保的活性自由基聚合催化剂。 使用具有氧化还原能力的有机化合物作为催化剂。 即使不使用自由基引发剂，也可以对单体进行自由基聚合，得到分子量分布窄的聚合物。 活性自由基聚合的成本可以显着降低。 可以防止使用自由基引发剂的不利影响。 由于催化剂的优点，催化剂的低毒性，必需的催化剂量低，催化剂的溶解度高，反应条件温和，反应条件好，因此本发明的环保性和经济性优于常规的活性自由基聚合方法。 无着色/无异味（不需要后处理成型品）等

    Method for producing tolylene diisocyanate
    5.
    发明授权
    Method for producing tolylene diisocyanate 有权
    甲苯二异氰酸酯的制备方法

    公开(公告)号：US08748654B2

    公开(公告)日：2014-06-10

    申请号：US14115852

    申请日：2012-04-06

    申请人： Koji Takamatsu ,  Kazuhiro Kosumi ,  Takeshi Fukuda ,  Masaaki Sasaki

    发明人： Koji Takamatsu ,  Kazuhiro Kosumi ,  Takeshi Fukuda ,  Masaaki Sasaki

    IPC分类号： C07C263/00 ,  C07C263/04 ,  C07C263/06 ,  C07C263/20

    CPC分类号： C07C263/00 ,  C07C263/04 ,  C07C263/06 ,  C07C263/20 ,  C07C269/04 ,  C07C265/14 ,  C07C271/28

    摘要： A method for producing tolylene diisocyanate includes: mixing a first diaminotoluene containing 2,4-diaminotoluene and 2,6-diaminotoluene at a first isomer ratio and a second diaminotoluene containing 2,4-diaminotoluene and/or 2,6-diaminotoluene at a second isomer ratio that is different from the first isomer ratio so as to prepare mixed diaminotoluene; producing tolylene dicarbamate by reaction of the mixed diaminotoluene, urea and/or N-unsubstituted carbamic acid ester and alcohol; and thermally decomposing the tolylene dicarbamate.

    摘要翻译： 一种制备甲苯二异氰酸酯的方法包括：以第一异构体比例混合含有2,4-二氨基甲苯和2,6-二氨基甲苯的第一二氨基甲苯和第二异构体含有2,4-二氨基甲苯和/或2,6-二氨基甲苯的第二二氨基甲苯 异构体比例与第一异构体比例不同，以制备混合的二氨基甲苯; 通过混合的二氨基甲苯，脲和/或N-未取代的氨基甲酸酯和醇的反应制备甲苯二甲氨基甲酸酯; 并分解甲苯二氨基甲酸酯。

    Catalyst for living radical polymerization
    7.
    发明授权
    Catalyst for living radical polymerization 有权
    活性自由基聚合催化剂

    公开(公告)号：US08575285B2

    公开(公告)日：2013-11-05

    申请号：US13062688

    申请日：2009-09-08

    申请人： Atsushi Goto ,  Yoshinobu Tsujii ,  Takeshi Fukuda

    发明人： Atsushi Goto ,  Yoshinobu Tsujii ,  Takeshi Fukuda

    IPC分类号： C08F4/00 ,  C08F12/02 ,  C07C19/16 ,  C07C255/50 ,  C07C19/07 ,  C07C25/02 ,  C07C43/247 ,  B01J31/00 ,  B01J27/06 ,  B01J27/135

    CPC分类号： C08F4/00 ,  C08F293/005 ,  C08F2438/00

    摘要： Provided is a catalyst used for a living radical polymerization method, which contains a central element consisting of carbon and at least one halogen atom binding to the central element. Further, a hydrocarbon compound can be used as a catalyst precursor. A monomer having a radical-reactive unsaturated bond is subjected to a radical polymerization reaction in the presence of the catalyst, consequently a polymer having narrow molecular weight distribution can be obtained, and thus the cost of the living radical polymerization can be remarkably reduced. The present invention is significantly more environmentally friendly and economically excellent than conventional living radical polymerization methods, due to advantages such as low toxicity of the catalyst, low amount of the catalyst used, high solubility of the catalyst, mild reaction conditions, and no coloration/no odor (no need of any post-treatments for a molded article), and the like.

    摘要翻译： 提供了用于活性自由基聚合法的催化剂，其包含由碳和与中心元素结合的至少一个卤素原子组成的中心元素。 此外，可以使用烃化合物作为催化剂前体。 具有自由基反应性不饱和键的单体在催化剂的存在下进行自由基聚合反应，因此可以获得具有窄分子量分布的聚合物，从而可显着降低活性自由基聚合的成本。 本发明由于催化剂的毒性低，催化剂用量少，催化剂溶解性高，反应条件温和，无着色/无色性等优点，比现有的活性自由基聚合法更具环保性和经济性， 无异味（不需要对成形品进行后处理）等。

    Process for manufacturing polishing pad
    9.
    发明授权
    Process for manufacturing polishing pad 有权
    制造抛光垫的工艺

    公开(公告)号：US08409308B2

    公开(公告)日：2013-04-02

    申请号：US12601725

    申请日：2008-05-15

    申请人： Akinori Sato ,  Junji Hirose ,  Kenji Nakamura ,  Takeshi Fukuda ,  Masato Doura

    发明人： Akinori Sato ,  Junji Hirose ,  Kenji Nakamura ,  Takeshi Fukuda ,  Masato Doura

    IPC分类号： B24B1/00 ,  B24D11/00

    CPC分类号： B24D18/00 ,  B24B37/205 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24364

    摘要： A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.

    摘要翻译： 一种制造具有高水平的光学检测精度并且防止从抛光区域和透光区域之间的浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在面材料或带式输送机上的预定位置放置透光区域，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施用到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

    POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME
    10.
    发明申请
    POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME 有权
    抛光垫及其制造方法

    公开(公告)号：US20120279138A1

    公开(公告)日：2012-11-08

    申请号：US13552346

    申请日：2012-07-18

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    IPC分类号： B24B37/24

    CPC分类号： B24B37/24 ,  B24D3/26 ,  B24D11/001

    摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.

    摘要翻译： 抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300μm聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为原料组分，活性氢化合物包括30至85重量％的具有2至4个官能团的高分子量多元醇和 羟值为20〜100mg KOH / g。