Optical element and exposure apparatus
    3.
    发明申请
    Optical element and exposure apparatus 有权
    光学元件和曝光装置

    公开(公告)号:US20090103070A1

    公开(公告)日:2009-04-23

    申请号:US12292271

    申请日:2008-11-14

    IPC分类号: G03F7/20

    摘要: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.

    摘要翻译: 光学元件用于曝光装置,其被配置为用曝光光束照射掩模,用于通过投影光学系统将掩模上的图案转印到基板上,并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。

    Optical element and exposure apparatus
    4.
    发明授权
    Optical element and exposure apparatus 有权
    光学元件和曝光装置

    公开(公告)号:US08189170B2

    公开(公告)日:2012-05-29

    申请号:US12659121

    申请日:2010-02-25

    IPC分类号: G03B27/42

    摘要: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.

    摘要翻译: 光学元件用于曝光装置,其被配置为用曝光光束照射掩模,用于通过投影光学系统将掩模上的图案转印到基板上,并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。

    Optical element and exposure apparatus
    5.
    发明授权
    Optical element and exposure apparatus 有权
    光学元件和曝光装置

    公开(公告)号:US07697111B2

    公开(公告)日:2010-04-13

    申请号:US10569207

    申请日:2004-08-26

    IPC分类号: G03B27/42

    摘要: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.

    摘要翻译: 光学元件用于曝光装置,其被配置为用曝光光束照射掩模,用于通过投影光学系统将掩模上的图案转印到基板上,并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。

    Optical element and exposure apparatus
    6.
    发明授权
    Optical element and exposure apparatus 有权
    光学元件和曝光装置

    公开(公告)号:US07993008B2

    公开(公告)日:2011-08-09

    申请号:US12292271

    申请日:2008-11-14

    IPC分类号: G03B27/42

    摘要: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.

    摘要翻译: 光学元件用于曝光装置,其被配置为用曝光光束照射掩模,用于通过投影光学系统将掩模上的图案转印到基板上,并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。