公开(公告)号：US20180202040A1

公开(公告)日：2018-07-19

申请号：US15921030

申请日：2018-03-14

Applicant: Tango Systems, Inc.

Inventor： Ravi Mullapudi ,  Harish Varma Penmethsa ,  Harshal T. Vasa ,  Srikanth Dasaradhi ,  Lee LaBlanc

IPC: C23C14/35 ,  H01J37/34 ,  C23C14/50 ,  C23C14/54 ,  H01J37/32

CPC classification number: C23C14/352 ,  C23C14/50 ,  C23C14/505 ,  C23C14/541 ,  H01J37/32724 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3455 ,  H01J37/3464 ,  H01J2237/006 ,  H01J2237/2001 ,  H01J2237/20214

Abstract: A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.

公开(公告)号：US20170114448A1

公开(公告)日：2017-04-27

申请号：US14923357

申请日：2015-10-26

Applicant: Tango Systems, Inc.

Inventor： Ravi Mullapudi ,  Harish Varma Penmethsa ,  Harshal T. Vasa ,  Srikanth Dasaradhi ,  Lee LaBlanc

IPC: C23C14/35 ,  H01J37/32 ,  H01J37/34 ,  C23C14/50 ,  C23C14/54

CPC classification number: C23C14/352 ,  C23C14/50 ,  C23C14/505 ,  C23C14/541 ,  H01J37/32724 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3455 ,  H01J37/3464 ,  H01J2237/006 ,  H01J2237/2001 ,  H01J2237/20214

Abstract: A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.

公开(公告)号：US10550464B2

公开(公告)日：2020-02-04

申请号：US15921030

申请日：2018-03-14

Applicant: Tango Systems, Inc.

Inventor： Ravi Mullapudi ,  Harish Varma Penmethsa ,  Harshal T. Vasa ,  Srikanth Dasaradhi ,  Lee LaBlanc

IPC: C23C14/35 ,  C23C14/50 ,  C23C14/54 ,  H01J37/34 ,  H01J37/32

Abstract: A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.

公开(公告)号：US09932668B2

公开(公告)日：2018-04-03

申请号：US14923357

申请日：2015-10-26

Applicant: Tango Systems, Inc.

Inventor： Ravi Mullapudi ,  Harish Varma Penmethsa ,  Harshal T. Vasa ,  Srikanth Dasaradhi ,  Lee LeBlanc

IPC: C23C14/00 ,  C23C14/35 ,  C23C14/50 ,  C23C14/54 ,  H01J37/34 ,  H01J37/32

CPC classification number: C23C14/352 ,  C23C14/50 ,  C23C14/505 ,  C23C14/541 ,  H01J37/32724 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3455 ,  H01J37/3464 ,  H01J2237/006 ,  H01J2237/2001 ,  H01J2237/20214

Abstract: A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.