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公开(公告)号：US5238777A
公开(公告)日：1993-08-24
申请号：US563446
申请日：1990-08-07
IPC分类号： C08G63/685 , G03F7/00 , G03F7/012 , G03F7/038
CPC分类号： C08G63/6858 , G03F7/012
摘要： A radiation-sensitive compound, which comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.
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2.发明授权Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing 失效在含有重氮化合物的混合物中具有磺酰基铀侧链和含侧链的辐射敏感性聚合物
公开(公告)号：US5254431A
公开(公告)日：1993-10-19
申请号：US980429
申请日：1992-11-23
CPC分类号： G03F7/012 , Y10S430/107
摘要： A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.
摘要翻译： 适用于生产用于平版印刷版制造的辐射敏感板的辐射敏感材料包括具有附加的叠氮取代的芳族酯基和磺基氨基甲酸酯基的聚合物。 辐射敏感化合物通过一种方法制备，其中聚合物的一些羟基和/或环氧基团与叠氮取代的羧酸或其形成酯的衍生物反应，并且一些羟基与异氰酸磺酰酯反应。
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公开(公告)号：US4994530A
公开(公告)日：1991-02-19
申请号：US440674
申请日：1989-11-22
IPC分类号： G03F7/039 , C08F8/14 , C08F8/30 , C08F8/34 , C08F8/46 , C08G8/28 , C08G16/00 , C08G16/04 , C08G18/62 , C08G59/14 , C08G59/42 , C08G83/00 , G03F7/00
CPC分类号： C08G59/42 , C08F8/30 , C08F8/34 , C08G8/28 , C08F2800/20 , C08F2810/50
摘要： Polymeric compounds comprise groups of the formula ##STR1## attached to carbon atoms of a polymer containing hydroxyl and optionally epoxide groups wherein X is ##STR2## The compounds are produced by reacting a starting polymer, which contains hydroxy groups and optionally epoxide groups with a reagent containing a cyclic anhydride group and a further functional group capable of reacting with the hydroxyl (and/or epoxide) groups preferentially to the anhydride group. The compounds are useful as bakeable support resins for radiation sensitive compounds in the production of printing plates.
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公开(公告)号：US5162431A
公开(公告)日：1992-11-10
申请号：US650488
申请日：1991-02-05
IPC分类号： G03F7/035 , C08F8/30 , C08F8/34 , C08F8/36 , C08F8/44 , C08K5/23 , C08L101/00 , C08L101/02 , G03F7/004 , H01L21/027
CPC分类号： C08F8/44 , C08F2800/20
摘要： A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## and pendant alkyl urethane groups of the formula ##STR2## where X is an aliphatic, aromatic, carboxylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub.2.sup.- Z.sup.+, CO.sub.2 R or SO.sub.3.sup.- Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen alkyl, alkylene, aryl or aralkyl group.
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公开(公告)号：US4999271A
公开(公告)日：1991-03-12
申请号：US298221
申请日：1989-01-17
IPC分类号： C08F2/48 , C08F290/00 , C08F299/06 , C09D5/00 , C09D5/03 , G03F7/00 , G03F7/027
CPC分类号： G03F7/027
摘要： A printing plate precursor comprises a substrate coated with a radiation sensitive composition comprising a photoinitiator and a photopolymerizable urethane acrylate or methacrylate. The urethane acrylate or methacrylate is produced by partial acrylation or methacrylation of a tetrafunctional polyol and the remaining hydroxy groups of the polyol are reacted with a di or polyisocyanate.
摘要翻译： 印版前体包括涂覆有包含光引发剂和可光聚合的聚氨酯丙烯酸酯或甲基丙烯酸酯的辐射敏感组合物的基材。 氨基甲酸酯丙烯酸酯或甲基丙烯酸酯通过四官能多元醇的部分丙烯酸酯化或甲基丙烯酸酯化制备，并且多元醇的剩余羟基与二异氰酸酯或多异氰酸酯反应。
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