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公开(公告)号：US5238777A
公开(公告)日：1993-08-24
申请号：US563446
申请日：1990-08-07
IPC分类号： C08G63/685 , G03F7/00 , G03F7/012 , G03F7/038
CPC分类号： C08G63/6858 , G03F7/012
摘要： A radiation-sensitive compound, which comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.
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2.发明授权Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing 失效在含有重氮化合物的混合物中具有磺酰基铀侧链和含侧链的辐射敏感性聚合物
公开(公告)号：US5254431A
公开(公告)日：1993-10-19
申请号：US980429
申请日：1992-11-23
CPC分类号： G03F7/012 , Y10S430/107
摘要： A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.
摘要翻译： 适用于生产用于平版印刷版制造的辐射敏感板的辐射敏感材料包括具有附加的叠氮取代的芳族酯基和磺基氨基甲酸酯基的聚合物。 辐射敏感化合物通过一种方法制备，其中聚合物的一些羟基和/或环氧基团与叠氮取代的羧酸或其形成酯的衍生物反应，并且一些羟基与异氰酸磺酰酯反应。
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公开(公告)号：US4994530A
公开(公告)日：1991-02-19
申请号：US440674
申请日：1989-11-22
IPC分类号： G03F7/039 , C08F8/14 , C08F8/30 , C08F8/34 , C08F8/46 , C08G8/28 , C08G16/00 , C08G16/04 , C08G18/62 , C08G59/14 , C08G59/42 , C08G83/00 , G03F7/00
CPC分类号： C08G59/42 , C08F8/30 , C08F8/34 , C08G8/28 , C08F2800/20 , C08F2810/50
摘要： Polymeric compounds comprise groups of the formula ##STR1## attached to carbon atoms of a polymer containing hydroxyl and optionally epoxide groups wherein X is ##STR2## The compounds are produced by reacting a starting polymer, which contains hydroxy groups and optionally epoxide groups with a reagent containing a cyclic anhydride group and a further functional group capable of reacting with the hydroxyl (and/or epoxide) groups preferentially to the anhydride group. The compounds are useful as bakeable support resins for radiation sensitive compounds in the production of printing plates.
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公开(公告)号：US4933452A
公开(公告)日：1990-06-12
申请号：US233673
申请日：1988-08-18
IPC分类号： C07D251/16 , C07D251/18 , C07D251/22 , C08F2/50 , C08K5/34 , C08K5/3477 , C08L101/00 , C09D5/00 , C09D5/23 , G03F7/029 , G03F7/031 , G03F7/105
CPC分类号： G03F7/0295 , C07D251/18 , C07D251/22 , G03F7/105
摘要： A radiation sensitive compound and method for making same. The compound has the general formula: ##STR1## wherein, R.sup.1 and R.sup.2, which may be the same or different, each represents lower alkyl, aryl, X, CHX.sub.2, CH.sub.2 X, CX.sub.3 or NHR.sup.3 wherein R.sup.3 represents hydrogen, lower alkyl, aryl or ##STR2## and provided at least one of R.sup.1 and R.sup.2 is CX.sub.3, X is halogen, and A.sup.1 and A.sup.2 are each residues of A.sup.1 --H and A.sup.2 --H respectively wherein A.sup.1 --H and A.sup.2 --H which may be the same or different are each compounds containing at least one group having an active hydrogen atom. The method comprises reacting together an isocyanate of the formula ##STR3## with a compound of the formula A.sup.1 --H or A.sup.2 --H to obtain the desired compound wherein R.sup.1 or R.sup.4 represents lower alkyl, aryl, X, CHX.sub.2, CX.sub.3, NCO or NHR.sup.5 wherein R.sup.5 represents hydrogen, lower alkyl or aryl and at least one of R.sup.1 and R.sup.4 is CX.sub.3.
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