利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

24 条记录 (耗时 0.045 秒)

    Heat resistant layered porous silica and process for producing the same
    2.
    发明授权
    Heat resistant layered porous silica and process for producing the same 失效
    耐热层状多孔二氧化硅及其制造方法

    公开(公告)号：US5382558A

    公开(公告)日：1995-01-17

    申请号：US087440

    申请日：1993-07-02

    申请人： Shinji Inagaki ,  Yoshiaki Fukushima ,  Akane Okada ,  Kazuhiro Fukumoto ,  Kazuyuki Kuroda

    发明人： Shinji Inagaki ,  Yoshiaki Fukushima ,  Akane Okada ,  Kazuhiro Fukumoto ,  Kazuyuki Kuroda

    IPC分类号： B01J20/10 ,  B01J21/08 ,  B01J23/04 ,  B01J29/04 ,  B01J35/04 ,  B01J20/28

    CPC分类号： B01J35/04 ,  B01J20/10 ,  B01J21/08 ,  B01J23/04 ,  B01J29/049

    摘要： A heat resistant layered porous silica having a honeycomb porous structure comprises a plurality of waved or bent sheet layers of crystalline layered silicate superposed one after another, and the neighboring sheets are partially bonded by siloxane bonding. The spacing between the neighboring sheet layers is narrowed toward the bonded portions and expanded at other portions to thereby form fine pores. The layered porous silica contains alkali metal ions in an amount of 0.2% by weight or less and has a specific surface area of 1,000 m.sup.2 /g or more.The layered porous silica has a large specific surface area, and exhibits an excellent heat resistance and adsorption of organic substances such as fuel.

    摘要翻译： 具有蜂窝状多孔结构的耐热性层状多孔二氧化硅，包括多个叠层的多个波状或弯曲的结晶层状硅酸盐层，相邻的片材通过硅氧烷键部分地结合。 相邻片层之间的间隔朝向接合部变窄，在其他部分膨胀，形成细孔。 层状多孔二氧化硅含有0.2重量％以下的碱金属离子，比表面积为1000m 2 / g以上。 层状多孔二氧化硅具有大的比表面积，并表现出优异的耐热性和有机物质如燃料的吸附。

    Porous material composed of layered silica and metal oxide and a process for manufacturing the same
    4.
    发明授权
    Porous material composed of layered silica and metal oxide and a process for manufacturing the same 失效
    由层状二氧化硅和金属氧化物构成的多孔材料及其制造方法

    公开(公告)号：US5508081A

    公开(公告)日：1996-04-16

    申请号：US192933

    申请日：1994-02-07

    申请人： Shinji Inagaki ,  Yoshiaki Fukushima ,  Akane Okata ,  Chuzo Kato ,  Kazuyuki Kuroda

    发明人： Shinji Inagaki ,  Yoshiaki Fukushima ,  Akane Okata ,  Chuzo Kato ,  Kazuyuki Kuroda

    IPC分类号： C01B33/12 ,  B01J20/10 ,  B01J21/08 ,  B01J23/04 ,  B01J29/00 ,  B01J29/04 ,  B01J35/04 ,  C01B33/20 ,  C01B33/32 ,  C01B33/44 ,  B32B3/12

    CPC分类号： B01J20/10 ,  B01J21/08 ,  B01J23/04 ,  B01J29/049 ,  B01J35/04 ,  Y10T428/24149 ,  Y10T428/249969 ,  Y10T428/24997

    摘要： A porous material composed of many SiO.sub.4 tetrahedra sheets having interlayer bridges of SiO.sub.2. It has pores having a diameter of 10 .ANG. or above, and possesses the properties of a solid acid formed by the isomorphous substitution of metal atoms for Si of SiO.sub.4 frameworks. It is made by a process including introducing an organic substance into interlayer space of crystals of layered silicates to expand the spacing between crystal layers, as well as forming bridges of SiO.sub.2 therebetween, bringing the intercalated compounds into contact with a metal salt to link metal atoms to the SiO.sub.4 frameworks, and firing the products. The material can withstand a temperature of 800.degree. C., has a pore diameter larger than that of zeolites, etc., and is useful in making an adsorbent or catalyst for molecules having a high molecular weight, such as a catalyst for the catalytic cracking of petroleum.

    摘要翻译： 由具有SiO 2层间桥的许多SiO 4四面体片组成的多孔材料。 它具有直径为10或更大的孔，并且具有通过金属原子对SiO 4骨架的Si的同晶取代而形成的固体酸的性质。 它是通过包括将有机物质引入到层状硅酸盐晶体的层间空间中以扩大晶体层之间的间距，以及在其间形成二氧化硅之间的过程，使插入的化合物与金属盐接触以连接金属原子 到SiO4框架，并烧制产品。 该材料可以承受800℃的温度，孔径大于沸石等的孔径，并且可用于制备具有高分子量的分子的吸附剂或催化剂，例如用于催化裂化的催化剂 的石油。

    Process for preparing organic smectite by solid-solid reaction
    6.
    发明授权
    Process for preparing organic smectite by solid-solid reaction 失效
    固相反应制备有机蒙皂石的方法

    公开(公告)号：US5028351A

    公开(公告)日：1991-07-02

    申请号：US515305

    申请日：1990-04-27

    申请人： Chuzo Kato ,  Kazuyuki Kuroda ,  Makoto Ogawa

    发明人： Chuzo Kato ,  Kazuyuki Kuroda ,  Makoto Ogawa

    IPC分类号： C04B33/00 ,  B28C1/10 ,  C01B33/40 ,  C01B33/44

    CPC分类号： C01B33/44

    摘要： A process for preparing organic smectite applied for thickener, protective colloid, dispersant and binder. The present invention features the process for preparing the organic smectite by mixing smectite incluidng 0 to 20% by weight of interlayer water in the interlayer spaces of said smectite with organic cation-supplying substance selected from at least one of aliphatic alkylamine salts, aromatic amine salts and basic organic compound having pyridine nucleus, and/or basic organic molecule in a mixing ratio of the latter to the former of 10 to 500 milliequivalents per 100 g smectite, and stirring the resulting mixture at a temperature of 5.degree. to 50.degree. C. under an applied pressure of 0.5 to 10 kg/cm.sup.2 to cause a solid-solid reaction. By the process of the present invention, exchangeable organic cations and/or basic organic molecules as a guest substance are intercalated int he interlayer spaces of the smectite as a host substance, thus the hydrophilic smectite can convert to the organic smectite by a more simplified solid-solid reaction than a liquid-liquid reaction.

    摘要翻译： 一种制备有机蒙皂石的方法，用于增稠剂，保护胶体，分散剂和粘合剂。 本发明的特征在于通过将含有0-20％重量的层间水的蒙皂石与所述蒙皂石的层间空间中的有机阳离子供应物质混合，所述有机阳离子供体物质选自以下中的至少一种：脂族烷基胺盐，芳族胺盐 和具有吡啶核的碱性有机化合物和/或碱性有机分子，其混合比例相对于每100克蒙皂石的10-500毫当量的混合比，并在5℃至50℃的温度下搅拌所得混合物。 在0.5〜10kg / cm2的施加压力下进行固体 - 固体反应。 通过本发明的方法，作为客体物质的交换性有机阳离子和/或碱性有机分子以蒙脱石的层间空间作为主体物质嵌入，因此亲水性绿土可以通过更简单的固体转化为有机蒙皂石 固液反应比液 - 液反应。

    Mesostructured film, mesoporous material film, and production methods for the same
    8.
    发明申请
    Mesostructured film, mesoporous material film, and production methods for the same 失效
    中等结构膜，介孔材料膜及其制备方法

    公开(公告)号：US20060204758A1

    公开(公告)日：2006-09-14

    申请号：US10544109

    申请日：2004-08-05

    申请人： Hirokatsu Miyata ,  Yasuhiro Kawashima ,  Kazuyuki Kuroda

    发明人： Hirokatsu Miyata ,  Yasuhiro Kawashima ,  Kazuyuki Kuroda

    IPC分类号： B32B9/04

    CPC分类号： G21K1/06 ,  C01B37/02 ,  Y10T428/24322 ,  Y10T428/24496 ,  Y10T428/249967 ,  Y10T428/249969 ,  Y10T428/31504

    摘要： A mesostructured film is provided having a structure in which surfactant molecular assemblies are regularly arranged three-dimensionally. A polymer compound thin film is formed on the substrate surface through spin coating or the like, and a rotating roller wrapped with a cloth is pressed against the polymer film for rubbing in one direction. The polymer material includes polyimide, polyamide, and polystyrene. The substrate includes a silica glass substrate and a silicon substrate. The mesostructured film can be formed by retaining the substrate in an aqueous solution containing a surfactant, silicon alkoxide, and acid. After being retained in the solution, the substrate is heated at about 60 to 120° C. for several hours to several days for reaction. The surfactant includes C18H37 (OCH2CH2)200H and C16H33 (OCH2CH2) 200H. The alkoxide included tetraethoxysilane, tetramethoxysilane, and tetrapropoxysilane. Hydrochloric acid, nitric acid, or sulfuric acid is used as a catalyst.

    摘要翻译： 提供了具有其中表面活性剂分子组件被三维规则地排列的结构的介孔结构膜。 通过旋涂等在基材表面上形成高分子化合物薄膜，将用布覆盖的旋转辊按压在聚合物膜上以在一个方向上摩擦。 聚合物材料包括聚酰亚胺，聚酰胺和聚苯乙烯。 基板包括石英玻璃基板和硅基板。 可以通过将基材保持在含有表面活性剂，硅醇盐和酸的水溶液中来形成介孔结构膜。 保留在溶液中后，将基底在约60至120℃加热数小时至数天以进行反应。 表面活性剂包括C 18 H 23（OCH 2 CH 2）2 O 20 H和C 16 H 33（OCH 2 CH 2）20 H 2 O 醇盐包括四乙氧基硅烷，四甲氧基硅烷和四丙氧基硅烷。 使用盐酸，硝酸或硫酸作为催化剂。