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    Multilayer piezoelectric element and injector using the same
    3.
    发明授权
    Multilayer piezoelectric element and injector using the same 有权
    多层压电元件和注射器使用相同

    公开(公告)号：US08441174B2

    公开(公告)日：2013-05-14

    申请号：US11917747

    申请日：2006-06-15

    申请人： Takeshi Okamura ,  Masaki Terazono ,  Tomohiro Kawamoto ,  Takafumi Tsurumaru ,  Shigenobu Nakamura ,  Ken Yamamoto

    发明人： Takeshi Okamura ,  Masaki Terazono ,  Tomohiro Kawamoto ,  Takafumi Tsurumaru ,  Shigenobu Nakamura ,  Ken Yamamoto

    IPC分类号： H01L41/083

    CPC分类号： H01L41/0838 ,  B05B17/0653 ,  F02M51/0603 ,  H01L41/0471 ,  H01L41/0477

    摘要： In a multilayer piezoelectric element in which a plurality of piezoelectric layers and a plurality of metal layers are stacked alternately, the plurality of metal layers include a plurality of low-filled metal layers having a lower filling rate of metal composing the metal layers than oppositely disposed metal layers adjacent to each other in a stacking direction. In a multilayer piezoelectric element in which a plurality of piezoelectric layers and a plurality of metal layers are stacked alternately, the plurality of metal layers include a plurality of thin metal layers having a smaller thickness than oppositely disposed metal layers adjacent to each other in a stacking direction. In a multilayer piezoelectric element in which a plurality of piezoelectric layers and a plurality of metal layers composed mainly of an alloy are stacked alternately, the plurality of metal layers include a plurality of high-ratio metal layers having a higher ratio of a component constituting the alloy than oppositely disposed metal layers adjacent to each other in a stacking direction.

    摘要翻译： 在其中多个压电层和多个金属层交替堆叠的多层压电元件中，多个金属层包括多个低填充金属层，其中构成金属层的金属填充率低于相对设置的金属层 在层叠方向上彼此相邻的金属层。 在其中多个压电层和多个金属层交替堆叠的多层压电元件中，多个金属层包括多个薄金属层，其厚度相对于彼此相邻布置的金属层的厚度小于堆叠 方向。 在其中多个压电层和主要由合金构成的多个金属层交替堆叠的多层压电元件中，多个金属层包括多个高比例的金属层，其中构成 合金比层叠方向上彼此相邻的相对设置的金属层。

    Piezoelectric ceramic composition
    6.
    发明授权
    Piezoelectric ceramic composition 失效
    压电陶瓷组合物

    公开(公告)号：US5648012A

    公开(公告)日：1997-07-15

    申请号：US577204

    申请日：1995-12-21

    申请人： Makoto Higashibeppu ,  Tomohiro Kawamoto ,  Tomonori Eguchi ,  Kenichi Yoshimura ,  Katsuhiko Onitsuka ,  Harumi Hayashi

    发明人： Makoto Higashibeppu ,  Tomohiro Kawamoto ,  Tomonori Eguchi ,  Kenichi Yoshimura ,  Katsuhiko Onitsuka ,  Harumi Hayashi

    IPC分类号： C04B35/491 ,  H01L41/187 ,  C04B35/49

    CPC分类号： C04B35/491 ,  H01L41/187

    摘要： A piezoelectric ceramic composition comprising a perovskite compound which contains, as metal components, Pb, Sr, Zr, Ti, Nb, Cr, Y, Co and at least one element selected from La, Gd, Nd, Sm and Pr, and may further contain Sb or Na, wherein when the composition formula is expressed as,(Pb.sub.1-x-.alpha.-y Sr.sub.x Na.sub..alpha. M.sub.y).sub.a [(Nb.sub.b Y.sub.c Cr.sub.d Co.sub.e Sb.sub..beta.).sub.f Ti.sub.g Zr.sub.1-f-g ]O.sub.3,wherein M is at least one element selected from La, Gd, Nd, Sm and Pr, then, x, y, a, b, c, d, e, f, g, .alpha. and .beta. satisfy the following relationships, 0.005.ltoreq.x.ltoreq.0.08, 0.002.ltoreq.y.ltoreq.0.05, 0.95.ltoreq.a.ltoreq.1.05, 0.47.ltoreq.b.ltoreq.0.70, 0.02.ltoreq.c.ltoreq.0.31, 0.11.ltoreq.d.ltoreq.0.42, 0.01.ltoreq.e.ltoreq.0.12, 0.02.ltoreq.f.ltoreq.0.15, 0.46.ltoreq.g.ltoreq.0.52, 0.ltoreq..alpha..ltoreq.0.005, 0.ltoreq..beta..ltoreq.0.13, and b+c+d+e+.beta.=1.00. The piezoelectric ceramic composition of the present invention exhibits a high electromechanical coupling coefficient Kp, a low mechanical quality factor Qm, a low dielectric constant .epsilon.r, excellent heat resistance, and can be preferably used as a piezoelectric part for being mounted on the surface and, particularly, as a digital piezoelectric.

    摘要翻译： 一种包含钙钛矿化合物的压电陶瓷组合物，其包含Pb，Sr，Zr，Ti，Nb，Cr，Y，Co和选自La，Gd，Nd，Sm和Pr中的至少一种元素作为金属成分，并且还可以进一步 含有Sb或Na，其中当组成式表示为（Pb1-x-α-ySrxNaαMy）a [（NbbYcCrdCoeBb）fTigZr1-fg] O3时，其中M为选自La，Gd， Nd，Sm和Pr，则x，y，a，b，c，d，e，f，g，α和β满足以下关系：0.005≤x≤0.08,0.002< /=0.05,0.95

    Exposure apparatus, control method thereof, and image forming apparatus
    7.
    发明授权
    Exposure apparatus, control method thereof, and image forming apparatus 失效
    曝光装置及其控制方法和图像形成装置

    公开(公告)号：US08520042B2

    公开(公告)日：2013-08-27

    申请号：US13014284

    申请日：2011-01-26

    申请人： Tomohiro Kawamoto

    发明人： Tomohiro Kawamoto

    IPC分类号： B41J2/435 ,  B41J2/47

    CPC分类号： G03G15/043 ,  G03G2215/0404

    摘要： The invention provides an exposure apparatus having a configuration such that, when a single laser light source having a plurality of light-emitting points is driven by a plurality of laser control apparatuses, mutual monitoring of the control state of the respective laser control apparatuses is possible, thus reducing malfunctions due to the effects of noise, and also provides a method to control this exposure apparatus, and an image forming apparatus. To accomplish this, the exposure apparatus does not execute light amount control of the light source to be driven when the determination unit has determined that another driving unit is causing the light source to be driven to emit light, and executes the light amount control of the light source to be driven when the determination unit has determined that another driving unit is not causing the light source to be driven to emit light.

    摘要翻译： 本发明提供一种曝光装置，其具有以下结构：当具有多个发光点的单个激光光源被多个激光控制装置驱动时，可以相互监视各激光控制装置的控制状态 ，从而减少由噪声的影响引起的故障，并且还提供了一种控制该曝光装置的方法和图像形成装置。 为了实现这一点，当确定单元确定另一个驱动单元正在使光源被驱动发光时，曝光设备不执行要驱动的光源的光量控制，并且执行 当确定单元确定另一驱动单元不使光源被驱动以发光时，要驱动的光源。

    EXPOSURE APPARATUS, CONTROL METHOD THEREOF, AND IMAGE FORMING APPARATUS
    8.
    发明申请
    EXPOSURE APPARATUS, CONTROL METHOD THEREOF, AND IMAGE FORMING APPARATUS 失效
    曝光装置，其控制方法和图像形成装置

    公开(公告)号：US20110182603A1

    公开(公告)日：2011-07-28

    申请号：US13014284

    申请日：2011-01-26

    申请人： Tomohiro Kawamoto

    发明人： Tomohiro Kawamoto

    IPC分类号： G03G15/043

    CPC分类号： G03G15/043 ,  G03G2215/0404

    摘要： The invention provides an exposure apparatus having a configuration such that, when a single laser light source having a plurality of light-emitting points is driven by a plurality of laser control apparatuses, mutual monitoring of the control state of the respective laser control apparatuses is possible, thus reducing malfunctions due to the effects of noise, and also provides a method to control this exposure apparatus, and an image forming apparatus. To accomplish this, the exposure apparatus does not execute light amount control of the light source to be driven when the determination unit has determined that another driving unit is causing the light source to be driven to emit light, and executes the light amount control of the light source to be driven when the determination unit has determined that another driving unit is not causing the light source to be driven to emit light.

    摘要翻译： 本发明提供一种曝光装置，其具有以下结构：当具有多个发光点的单个激光光源被多个激光控制装置驱动时，可以相互监视各激光控制装置的控制状态 ，从而减少由噪声的影响引起的故障，并且还提供了一种控制该曝光装置的方法和图像形成装置。 为了实现这一点，当确定单元确定另一驱动单元正在使光源被驱动发光时，曝光设备不执行要驱动的光源的光量控制，并且执行 当确定单元确定另一个驱动单元不使光源被驱动以发光时，要驱动的光源。

    Optical power control apparatus, optical beam scanning apparatus, image forming apparatus, and optical power control method
    9.
    发明授权
    Optical power control apparatus, optical beam scanning apparatus, image forming apparatus, and optical power control method 有权
    光功率控制装置，光束扫描装置，成像装置和光功率控制方法

    公开(公告)号：US07535939B2

    公开(公告)日：2009-05-19

    申请号：US11757740

    申请日：2007-06-04

    申请人： Tomohiro Kawamoto ,  Shingo Kitamura

    发明人： Tomohiro Kawamoto ,  Shingo Kitamura

    IPC分类号： H01S3/13

    CPC分类号： B41J2/442 ,  B41J2/471

    摘要： An optical power control apparatus includes a changing unit which changes, a plurality of number of times, the value of a current flowing to an optical beam output apparatus, and an obtaining unit which obtains, in correspondence with each current value, a peripheral optical power representing an optical power at the peripheral part of the spot of the optical beam output from the optical beam output apparatus. The optical power control apparatus also includes a correction unit which corrects the peripheral optical power so that the peripheral optical power and a central optical power representing an optical power at the central part of the spot have an approximately linear relationship in correspondence with each current value. The optical power control apparatus also includes a control unit which controls the optical power of the optical beam output from the optical beam output apparatus in accordance with the corrected peripheral optical power.

    摘要翻译： 光功率控制装置包括：变化单元，其多次改变流向光束输出装置的电流的值;以及获取单元，其与每个电流值对应地获得周边光功率 表示从光束输出装置输出的光束的光点的周边部分处的光功率。 光功率控制装置还包括校正外围光功率的校正单元，使得周围光功率和表示中心部位的光功率的中心光功率对应于每个电流值具有近似的线性关系。 光功率控制装置还包括控制单元，其根据校正的外围光功率来控制从光束输出装置输出的光束的光功率。