公开(公告)号：US20220205920A1

公开(公告)日：2022-06-30

申请号：US17394223

申请日：2021-08-04

Applicant: The Trustees of Princeton University

Inventor： Stephen Y. CHOU ,  Fei DING

IPC: G01N21/65 ,  B29C37/00 ,  B29C59/02 ,  G03F7/00 ,  B29C33/56 ,  G01N21/64

Abstract: Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.

公开(公告)号：US20240344993A1

公开(公告)日：2024-10-17

申请号：US18523814

申请日：2023-11-29

Applicant: The Trustees of Princeton University

Inventor： Stephen Y. CHOU ,  Fei DING

IPC: G01N21/65 ,  B29C33/42 ,  B29C33/56 ,  B29C37/00 ,  B29C59/02 ,  G01N21/64 ,  G03F7/00

CPC classification number: G01N21/658 ,  B29C33/56 ,  B29C37/0003 ,  B29C59/02 ,  B29C59/026 ,  G01N21/648 ,  G01N21/6486 ,  G03F7/0002 ,  B29C33/424 ,  B29C2059/023 ,  B29K2995/0005

Abstract: Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.