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19 条记录 (耗时 0.02 秒)

    Apparatus with permanent magnetic lenses
    3.
    发明授权
    Apparatus with permanent magnetic lenses 有权
    带永久磁性镜片的设备

    公开(公告)号：US07285785B2

    公开(公告)日：2007-10-23

    申请号：US11418730

    申请日：2006-05-03

    申请人： Bart Buijsse ,  Theodorus Hubertus Josephus Bisschops ,  Mark Theo Meuwese

    发明人： Bart Buijsse ,  Theodorus Hubertus Josephus Bisschops ,  Mark Theo Meuwese

    IPC分类号： H01J1/50 ,  H01J37/147 ,  H01J37/26

    CPC分类号： H01J37/143

    摘要： The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).

    摘要翻译： 本发明描述了一种粒子光学装置，其被布置成借助于两个粒子光学透镜系统（10,20）来聚焦带电粒子的束（1）。 透镜作用是通过磁场实现的，这些磁场由永磁材料（13,23）产生。 与配备有线圈的磁性透镜相比，在配备永磁材料的透镜的情况下，为了改变光焦度来改变聚焦磁场是不容易的。 在根据本发明的装置中，通过改变光束（1）穿过透镜系统（10,20）的能量来改变透镜系统的光焦度。 这可以通过改变电源的电压来容易地发生（14,24）。

    Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
    5.
    发明授权
    Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit 失效
    产生极短波辐射的方法和极短波辐射源单元

    公开(公告)号：US06538257B2

    公开(公告)日：2003-03-25

    申请号：US09726780

    申请日：2000-11-30

    申请人： Theodorus Hubertus Josephus Bisschops

    发明人： Theodorus Hubertus Josephus Bisschops

    IPC分类号： G21G400

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033

    摘要： A method of generating EUV radiation is described, comprising the steps of: transporting a solid medium (33) through a source space (34) connected to a vacuum pump (35), and irradiating a portion (37) of the medium with an intense, pulsed, laser beam (41) focused on said portion of the medium, thus creating a plasma (47) which emits EUV radiation. To increase the intensity of the EUV radiation and improve the possibility to collect particles (51, 52, 53) released from the medium, at least the medium portions (37) to be irradiated have a concave shape. The method can be improved by embedding the medium in a flow of rare gas. Also described are a EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices such as IC devices, and in a lithographic projection apparatus.

    摘要翻译： 描述了一种产生EUV辐射的方法，包括以下步骤：将固体介质（33）输送通过连接到真空泵（35）的源空间（34），并用强烈的， 脉冲激光束（41）聚焦在介质的所述部分上，从而产生发射EUV辐射的等离子体（47）。为了增加EUV辐射的强度，并提高收集释放的颗粒（51,52,53）的可能性 至少所述被照射的介质部（37）从所述介质形成为凹状。 该方法可以通过将介质嵌入到稀有气体流中而得到改善。还描述了一种EUV辐射源单元，用于实现该方法在制造诸如IC器件的器件中的方法和应用，并且在光刻投影设备 。

    Apparatus for evacuating a sample
    7.
    发明授权
    Apparatus for evacuating a sample 有权
    用于抽出样品的装置

    公开(公告)号：US07456413B2

    公开(公告)日：2008-11-25

    申请号：US11169274

    申请日：2005-06-28

    申请人： Bart Buijsse ,  Mark Theo Meuwese ,  Maria Van Wely-Dieleman ,  Sjoerd Antonius Maria Mentink ,  Theodorus Hubertus Josephus Bisschops

    发明人： Bart Buijsse ,  Mark Theo Meuwese ,  Maria Van Wely-Dieleman ,  Sjoerd Antonius Maria Mentink ,  Theodorus Hubertus Josephus Bisschops

    IPC分类号： G01F23/00

    CPC分类号： H01J37/18 ,  H01J37/20 ,  H01J2237/2003 ,  H01J2237/2605

    摘要： The invention relates to an apparatus for evacuating samples. A sample 4 is hereby placed in a cavity 3 of a sheet 1 with a smooth surface 2. A sole plate 5 Is placed upon this smooth surface 2, whereby the smooth surface 2 and the sole plate 5 placed thereupon together form a vacuum seal. The sole plate 5, upon which a vacuum column 6 is mounted, can be slid across the smooth surface 2. By sliding the sole plate 5 over the cavity 4, the cavity 4 is evacuated in several steps.In an embodiment of the invention, the vacuum column 6 takes the form of an ESEM (Environmental Scanning Electron Microscope). In this way, it is possible to inspect the evacuated sample 4 with the ESEM.

    摘要翻译： 本发明涉及抽样样品的装置。 样品4因此被放置在具有光滑表面2的片材1的空腔3中。 将底板5放置在该光滑表面2上，由此将光滑表面2和放置在其上的底板5一起形成真空密封。 其上安装有真空塔6的底板5可以滑过光滑表面2。 通过将底板5滑动在空腔4上方，空腔4以几个步骤排空。 在本发明的一个实施方案中，真空塔6采用ESEM（环境扫描电子显微镜）的形式。 以这种方式，可以用ESEM检查抽空的样品4。

    METHOD OF GENERATING EXTREMELY SHORT-WAVE RADIATION, METHOD OF MANUFACTURING A DEVICE BY MEANS OF SAID RADIATION, EXTREMELY SHORT-WAVE RADIATION SOURCE UNIT AND LITHOGRAPHIC PROJECTION APPARATUS PROVIDED WITH SUCH A RADIATION SOURCE UNIT
    9.
    发明授权
    METHOD OF GENERATING EXTREMELY SHORT-WAVE RADIATION, METHOD OF MANUFACTURING A DEVICE BY MEANS OF SAID RADIATION, EXTREMELY SHORT-WAVE RADIATION SOURCE UNIT AND LITHOGRAPHIC PROJECTION APPARATUS PROVIDED WITH SUCH A RADIATION SOURCE UNIT 失效
    产生极度短波辐射的方法，通过辐射源制造器件的方法，具有这种辐射源单元的极端短波辐射源单元和光栅投影装置

    公开(公告)号：US06493423B1

    公开(公告)日：2002-12-10

    申请号：US09726768

    申请日：2000-11-30

    申请人： Theodorus Hubertus Josephus Bisschops

    发明人： Theodorus Hubertus Josephus Bisschops

    IPC分类号： G21K500

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70933 ,  H05G2/006 ,  H05G2/008

    摘要： A method is described for generating EUV radiation, comprising the steps of generating a flow of a medium (39); transporting this medium through a source space (60) connected to a vacuum pump (75), and irradiating part of the medium with an intensive, pulsed laser beam (41) focused on said part of the medium, thus creating a plasma (47) which emits EUV radiation. In order to maintain a vacuum in the source space and to prevent elements of the medium, like vapor or elementary particles, from leaving the source space through apertures (63, 64) provided in the wall of the space for passing the laser beam and EUV radiation, the flow of medium is embedded in a flow of rare gas. The invention also describes an EUV radiation source unit for performing the method and the application of the method in the manufacture of devices like IC devices, and in a lithographic projection apparatus.

    摘要翻译： 描述了一种用于产生EUV辐射的方法，包括产生介质流（39）的步骤。 通过连接到真空泵（75）的源空间（60）传送该介质，并且用集中在介质的该部分上的集中的脉冲激光束（41）照射介质的一部分，从而产生等离子体（47） 其发射EUV辐射。 为了在源空间中保持真空并且防止诸如蒸汽或基本粒子的介质元件通过设置在空间壁中的孔（63,64）离开源空间，以使激光束和EUV 辐射，介质的流动被嵌入稀有气体流中。 本发明还描述了一种EUV辐射源单元，用于执行该方法在制造诸如IC器件的设备中的方法和应用，并且在光刻投影设备中。