公开(公告)号：US08780321B2

公开(公告)日：2014-07-15

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20110273679A1

公开(公告)日：2011-11-10

申请号：US13187086

申请日：2011-07-20

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20100157260A1

公开(公告)日：2010-06-24

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes KNAAPEN ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes KNAAPEN ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US08259283B2

公开(公告)日：2012-09-04

申请号：US12408392

申请日：2009-03-20

申请人： Daniël Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Daniël Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。

公开(公告)号：US20090237632A1

公开(公告)日：2009-09-24

申请号：US12408392

申请日：2009-03-20

申请人： Daniel Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Daniel Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。

公开(公告)号：US08638417B2

公开(公告)日：2014-01-28

申请号：US13085069

申请日：2011-04-12

申请人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  Y10T137/86292

摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中。 流体处理结构的下表面具有供给开口，其构造成朝向相对表面供应流体;多个提取开口，其构造成从流体处理结构和相对表面之间移除流体;以及在供给开口和提取物之间的突起 开口

公开(公告)号：US08836912B2

公开(公告)日：2014-09-16

申请号：US13273879

申请日：2011-10-14

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。

公开(公告)号：US20120120376A1

公开(公告)日：2012-05-17

申请号：US13273879

申请日：2011-10-14

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。