Maskless lateral epitaxial overgrowth of aluminum nitride and high aluminum composition aluminum gallium nitride
    1.
    发明申请
    Maskless lateral epitaxial overgrowth of aluminum nitride and high aluminum composition aluminum gallium nitride 审中-公开
    无氮化铝的侧向外延生长和高铝组成的氮化镓铝

    公开(公告)号:US20050142876A1

    公开(公告)日:2005-06-30

    申请号:US10973332

    申请日:2004-10-25

    摘要: A method of maskless lateral epitaxial overgrowth (LEO) of aluminum nitride (AlN) and high aluminum composition aluminum gallium nitride (AlGaN) layers by crystal growth techniques, such as metalorganic chemical vapor deposition (MOCVD), Hydride Vapor Phase Epitaxy (HVPE), other vapor phase transport techniques such as sublimation, and Molecular Beam Epitaxy (MBE). The process etches periodic patterns into a suitable material, such AlN or high aluminum composition AlGaN base layers heteroepitaxially grown on a substrate or a substrate itself. A lateral epitaxial overgrowth is performed of the AlN or high aluminum composition AlGaN layers on the suitable material. Lateral epitaxial overgrowth of the AlN or high aluminum composition AlGaN layers may be enhanced by using low V/III ratios and fast growth rates. The process reduces the threading dislocation density (TDD) in high Al containing nitrides by several orders of magnitude.

    摘要翻译: 通过诸如金属有机化学气相沉积(MOCVD),氢化物气相外延(HVPE)等晶体生长技术的氮化铝(AlN)和高铝组成的氮化镓铝(AlGaN)层的无掩模横向外延过度生长(LEO) 其他气相传输技术如升华和分子束外延(MBE)。 该工艺将周期性图案蚀刻成合适的材料,例如在衬底或衬底本身异质外延生长的AlN或高铝组合物AlGaN基底层。 在合适的材料上进行AlN或高铝组成AlGaN层的横向外延过度生长。 可以通过使用低V / III比和快速生长速率来增强AlN或高铝组分AlGaN层的横向外延过度生长。 该方法将高含铝氮化物中的穿透位错密度(TDD)降低数个数量级。