-
公开(公告)号：US20110016437A1
公开(公告)日：2011-01-20
申请号：US12933226
申请日：2009-03-19
申请人： Thomas Scherübl , Holger Seitz , Ulrich Strössner , Axel Zibold , Rigo Richter
发明人： Thomas Scherübl , Holger Seitz , Ulrich Strössner , Axel Zibold , Rigo Richter
IPC分类号： G06F17/50
CPC分类号： G03F1/84 , G03F7/70625 , G03F7/70666 , G03F7/70775
摘要： The invention relates to a method and an apparatus for measuring masks for photolithography. In this case, structures to be measured on the mask on a movable mask carrier are illuminated and imaged as an aerial image onto a detector, the illumination being set in a manner corresponding to the illumination in a photolithography scanner during a wafer exposure. A selection of positions at which the structures to be measured are situated on the mask is predetermined, and the positions on the mask in the selection are successively brought to the focus of an imaging optical system, where they are illuminated and in each case imaged as a magnified aerial image onto a detector, and the aerial images are subsequently stored. The structure properties of the structures are then analyzed by means of predetermined evaluation algorithms. The accuracy of the setting of the positions and of the determination of structure properties is increased in this case.
摘要翻译： 本发明涉及一种用于测量光刻掩模的方法和装置。 在这种情况下，在可移动掩模载体上的掩模上测量的结构被照射并作为空间图像成像到检测器上，在晶片曝光期间以与光刻扫描器中的照明相对应的方式设置照明。 要测量的结构位于掩模上的位置的选择是预定的，并且选择中的掩模上的位置被连续地带到成像光学系统的焦点，在那里它们被照亮，并且在每种情况下被成像为 将放大的航空图像放置在检测器上，随后存储航空图像。 然后通过预定的评估算法分析结构的结构特性。 在这种情况下，位置的设定和结构特性的确定的准确性增加。
-
公开(公告)号：US08730474B2
公开(公告)日：2014-05-20
申请号：US12933226
申请日：2009-03-19
申请人： Thomas Scheruebl , Holger Seitz , Ulrich Matejka , Axel Zibold , Rigo Richter
发明人： Thomas Scheruebl , Holger Seitz , Ulrich Matejka , Axel Zibold , Rigo Richter
CPC分类号： G03F1/84 , G03F7/70625 , G03F7/70666 , G03F7/70775
摘要： The invention relates to a method and an apparatus for measuring masks for photolithography. In this case, structures to be measured on the mask on a movable mask carrier are illuminated and imaged as an aerial image onto a detector, the illumination being set in a manner corresponding to the illumination in a photolithography scanner during a wafer exposure. A selection of positions at which the structures to be measured are situated on the mask is predetermined, and the positions on the mask in the selection are successively brought to the focus of an imaging optical system, where they are illuminated and in each case imaged as a magnified aerial image onto a detector, and the aerial images are subsequently stored. The structure properties of the structures are then analyzed by means of predetermined evaluation algorithms. The accuracy of the setting of the positions and of the determination of structure properties is increased in this case.
摘要翻译： 本发明涉及一种用于测量光刻掩模的方法和装置。 在这种情况下，在可移动掩模载体上的掩模上测量的结构被照射并作为空间图像成像到检测器上，在晶片曝光期间以与光刻扫描器中的照明相对应的方式设置照明。 要测量的结构位于掩模上的位置的选择是预定的，并且选择中的掩模上的位置被连续地带到成像光学系统的焦点，在那里它们被照亮，并且在每种情况下被成像为 将放大的航空图像放置在检测器上，随后存储航空图像。 然后通过预定的评估算法分析结构的结构特性。 在这种情况下，位置的设定和结构特性的确定的准确性增加。
-
公开(公告)号：US20060269117A1
公开(公告)日：2006-11-30
申请号：US10564282
申请日：2004-07-03
申请人： Holger Seitz , Roman Windpassinger
发明人： Holger Seitz , Roman Windpassinger
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G03F1/70 , G03F7/70666
摘要： A method for analysis of an object in microlithography. The steps of the method include providing an aerial image measurement system (AIMS) that consists of at least two imaging steps; detecting the image output of the AIMS; and employing a correction filter to correct the detected image with respect to the transfer behavior of the second or other imaging steps. An AIMS apparatus to carry out the method is also defined.
摘要翻译： 用于微光刻中物体分析的方法。 该方法的步骤包括提供由至少两个成像步骤组成的空中图像测量系统（AIMS）; 检测AIMS的图像输出; 并且使用校正滤波器来相对于第二或其它成像步骤的传送行为校正检测到的图像。 还定义了执行该方法的AIMS设备。
-
公开(公告)号：US20120162755A1
公开(公告)日：2012-06-28
申请号：US13391996
申请日：2010-08-28
IPC分类号： G02B21/06
CPC分类号： G02B21/086 , G02B5/005 , G03F1/84
摘要： During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane. According to the invention, the diaphragm is embodied in such a way that the resultant intensity distribution of the projection light has at least one further intensity value between a minimum and a maximum intensity value.
摘要翻译： 在面罩检查期间，有必要识别在晶片曝光期间也会发生的缺陷。 因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。 为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。 本发明涉及一种用于可变地设定照明的掩模检查显微镜。 其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。 它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和用于产生投影光在照明光瞳面（135）中的合成强度分布的光阑 光束路径（3,87,88），其相对于物平面光学共轭。 根据本发明，隔膜的实施方式是使投影光的合成强度分布在最小和最大强度值之间具有至少一个另外的强度值。
-
5.发明授权Method for characterizing a feature on a mask and device for carrying out the method 有权用于表征掩模和装置上用于执行该方法的特征的方法公开(公告)号：US09222897B2
公开(公告)日：2015-12-29
申请号：US13247579
申请日：2011-09-28
申请人： Holger Seitz
发明人： Holger Seitz
IPC分类号： H04N7/18 , G01N21/956 , G01B11/02 , G03F1/84
CPC分类号： G01N21/95607 , G01B11/02 , G01N2021/95676 , G03F1/84
摘要： A mask inspection microscope is provided for characterizing a mask having a feature. The mask inspection microscope is configured to generate an aerial image of at least one segment of the feature of the mask, acquire a spatially resolved intensity distribution of the aerial image, and determine a total intensity from the intensities of at least one region of the aerial image.
摘要翻译： 提供了一种用于表征具有特征的掩模的掩模检查显微镜。 掩模检查显微镜被配置为生成掩模的特征的至少一个部分的空间图像，获取空间图像的空间分辨的强度分布，并且根据空中至少一个区域的强度确定总强度 图片。
-
公开(公告)号：US08970951B2
公开(公告)日：2015-03-03
申请号：US13391996
申请日：2010-08-28
CPC分类号： G02B21/086 , G02B5/005 , G03F1/84
摘要： During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane. According to the invention, the diaphragm is embodied in such a way that the resultant intensity distribution of the projection light has at least one further intensity value between a minimum and a maximum intensity value.
摘要翻译： 在面罩检查期间，有必要识别在晶片曝光期间也会发生的缺陷。 因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。 为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。 本发明涉及一种用于可变地设定照明的掩模检查显微镜。 其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。 它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和用于产生投影光在照明光瞳面（135）中的合成强度分布的光阑 光束路径（3,87,88），其相对于物平面光学共轭。 根据本发明，隔膜的实施方式是使投影光的合成强度分布在最小和最大强度值之间具有至少一个另外的强度值。
-
7.发明申请METHOD FOR CHARACTERIZING A FEATURE ON A MASK AND DEVICE FOR CARRYING OUT THE METHOD 有权用于表征掩模上的特征的方法和用于实施该方法的装置公开(公告)号：US20120075456A1
公开(公告)日：2012-03-29
申请号：US13247579
申请日：2011-09-28
申请人： Holger Seitz
发明人： Holger Seitz
CPC分类号： G01N21/95607 , G01B11/02 , G01N2021/95676 , G03F1/84
摘要： A mask inspection microscope is provided for characterizing a mask having a feature. The mask inspection microscope is configured to generate an aerial image of at least one segment of the feature of the mask, acquire a spatially resolved intensity distribution of the aerial image, and determine a total intensity from the intensities of at least one region of the aerial image.
摘要翻译： 提供了一种用于表征具有特征的掩模的掩模检查显微镜。 掩模检查显微镜被配置为生成掩模的特征的至少一个部分的空间图像，获取空间图像的空间分辨的强度分布，并且根据空中至少一个区域的强度确定总强度 图片。
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.02 秒)
