公开(公告)号：US20220122867A1

公开(公告)日：2022-04-21

申请号：US17449848

申请日：2021-10-04

Applicant: Tokyo Electron Limited

Inventor： Shingo HISHIYA ,  Hiroaki IKEGAWA ,  Volker HEMEL ,  Bernhard ZOBEL ,  Sung Duk SON

IPC: H01L21/677 ,  H01L21/67 ,  C23C16/44

Abstract: With respect to a boat transfer method for transferring a boat holding a substrate into a processing chamber, the boat transfer method includes supplying a reducing gas into the processing chamber, and transferring the boat into the processing chamber in a state in which the reducing gas is present within the processing chamber.

公开(公告)号：US20130323935A1

公开(公告)日：2013-12-05

申请号：US13905734

申请日：2013-05-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Keisuke SUZUKI ,  Kentaro KADONAGA ,  Volker HEMEL ,  Bernhard ZOBEL

IPC: H01L21/02

CPC classification number: H01L21/02271 ,  C23C16/345 ,  C23C16/45512 ,  C23C16/45525 ,  C23C16/45561 ,  H01L21/0217 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/0228

Abstract: A method of forming a thin film on a surface of target objects in a vacuum-evacuable processing chamber by using a source gas and a reaction gas includes: forming a mixed gas by mixing the source gas and an inert gas in a gas reservoir tank, and supplying the mixed gas and the reaction gas into the processing chamber.

Abstract translation: 通过使用源气体和反应气体，在真空排气处理室的目标物体的表面上形成薄膜的方法包括：通过在气体储存罐中混合源气体和惰性气体来形成混合气体， 并将混合气体和反应气体供给到处理室中。