公开(公告)号：US20240085813A1

公开(公告)日：2024-03-14

申请号：US18515667

申请日：2023-11-21

Applicant: Tokyo Electron Limited

Inventor： Kenta SHIBASAKI ,  Hiroichi INADA ,  Satoshi SHIMMURA ,  Koji TAKAYANAGI ,  Kenji YADA ,  Shinichi SEKI ,  Akihiro TERAMOTO

IPC: G03F7/00 ,  B05C11/02 ,  B08B3/08 ,  G03F7/16

CPC classification number: G03F7/70925 ,  B05C11/02 ,  B08B3/08 ,  G03F7/162

Abstract: A cleaning method of cleaning a solution treatment apparatus for applying a coating solution onto a substrate, the solution treatment apparatus including a holder holding and rotating the substrate; a coating solution supplier; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction. The cleaning method includes introducing the cleaning solution to the storage chamber via the introduction hole, discharging the cleaning solution from the discharge port and making the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning away the coating solution adhering to the peripheral edge side upper surface. The discharging in the cleaning discharges the cleaning solution from discharge ports of the inner cup outward in the radial direction and obliquely upward.

公开(公告)号：US20240009697A1

公开(公告)日：2024-01-11

申请号：US18346293

申请日：2023-07-03

Applicant: Tokyo Electron Limited

Inventor： Junghyun KIM ,  Koshi MUTA ,  Daiki TAKAHASHI ,  Kohei KAWAKAMI ,  Satoshi SHIMMURA ,  Kenta SHIBASAKI ,  Shota UEYAMA ,  Tetsushi MIYAMOTO

IPC: B05C11/08

CPC classification number: B05C11/08 ,  H01L21/6715

Abstract: A liquid processing apparatus that applies a coating liquid onto a substrate, includes: a substrate holder that holds and rotates the substrate; a coating liquid supplier that supplies the coating liquid to the substrate; a cup provided to surround the substrate; and a solvent supplier that supplies a solvent for the coating liquid to a coating liquid collector. The cup includes: an outer cup arranged outside the substrate holder; an inner cup arranged on an inner peripheral side of the outer cup below the substrate holder and having a downwardly-extending wall; an exhaust path provided between the outer and inner cups; and the coating liquid collector provided with a plurality of openings through which an exhaust flow passes, the coating liquid collector extending downward below the downwardly-extending wall of the inner cup with a gap between the coating liquid collector and a lower end of the downwardly-extending wall.

公开(公告)号：US20240012329A1

公开(公告)日：2024-01-11

申请号：US18346287

申请日：2023-07-03

Applicant: Tokyo Electron Limited

Inventor： Junghyun KIM ,  Koshi MUTA ,  Daiki TAKAHASHI ,  Kohei KAWAKAMI ,  Satoshi SHIMMURA ,  Kenta SHIBASAKI ,  Shota UEYAMA ,  Tetsushi MIYAMOTO

IPC: G03F7/16

CPC classification number: G03F7/162

Abstract: A liquid processing apparatus that applies a coating liquid onto a substrate, includes: a substrate holder that holds and rotates the substrate; a coating liquid supplier that applies the coating liquid to the substrate; a cup provided to surround the substrate; and a solvent supplier that supplies a solvent for the coating liquid to a coating liquid collector. The cup includes: an outer cup arranged outside the substrate holder; an inner cup arranged on an inner peripheral side of the outer cup below the substrate holder and having a downwardly-extending wall; an exhaust path provided between the outer and inner cups; a cylindrical wall portion provided below the inner cup and having an upwardly-opened exhaust port communicating with the exhaust path; and the coating liquid collector arranged below the wall of the inner cup with a gap between the coating liquid collector and a lower end of the wall.

公开(公告)号：US20240207908A1

公开(公告)日：2024-06-27

申请号：US17914108

申请日：2021-03-15

Applicant: Tokyo Electron Limited

Inventor： Satoshi SHIMMURA ,  Koji TAKAYANAGI ,  Kenta SHIBASAKI ,  Hiroichi INADA

IPC: B08B9/08 ,  B05C11/08 ,  B05C21/00 ,  G03F7/16

CPC classification number: B08B9/08 ,  B05C11/08 ,  B05C21/00 ,  G03F7/162 ,  B08B2209/08

Abstract: A cleaning jig of a disc shape used for cleaning an inside of a container while being held by a rotary holding device in a same manner as a substrate in a spin coating apparatus that supplies a processing liquid onto a substrate held by the rotary holding device disposed in the container and forms a film of the processing liquid on the substrate by rotating the substrate. A peripheral ceiling portion and a peripheral bottom portion are formed over an entire periphery of the cleaning jig, a discharge port is formed over the entire periphery between the peripheral ceiling portion and the peripheral bottom portion, a plurality of holes is formed in the peripheral bottom portion at intervals in a circumferential direction to communicate with the discharge port, and a lower surface of the peripheral ceiling portion is inclined toward an upper periphery.

公开(公告)号：US20220113643A1

公开(公告)日：2022-04-14

申请号：US17485698

申请日：2021-09-27

Applicant: Tokyo Electron Limited

Inventor： Kenta SHIBASAKI ,  Hiroichi INADA ,  Satoshi SHIMMURA ,  Koji TAKAYANAGI ,  Kenji YADA ,  Shinichi SEKI ,  Akihiro TERAMOTO

IPC: G03F7/20 ,  B08B3/08 ,  G03F7/16

Abstract: A solution treatment apparatus for applying a coating solution onto a substrate, includes: a holder holding and rotating the substrate; a coating solution supplier supplying the coating solution to the substrate on the holder; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate on the holder, wherein: the inner cup has a plurality of discharge ports formed along a circumferential direction at the apex part; and the discharge ports are formed to discharge a cleaning solution and make the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning the peripheral edge side upper surface, and to discharge the cleaning solution outward in the radial direction and obliquely upward.