公开(公告)号：US20240207908A1

公开(公告)日：2024-06-27

申请号：US17914108

申请日：2021-03-15

Applicant: Tokyo Electron Limited

Inventor： Satoshi SHIMMURA ,  Koji TAKAYANAGI ,  Kenta SHIBASAKI ,  Hiroichi INADA

IPC: B08B9/08 ,  B05C11/08 ,  B05C21/00 ,  G03F7/16

CPC classification number: B08B9/08 ,  B05C11/08 ,  B05C21/00 ,  G03F7/162 ,  B08B2209/08

Abstract: A cleaning jig of a disc shape used for cleaning an inside of a container while being held by a rotary holding device in a same manner as a substrate in a spin coating apparatus that supplies a processing liquid onto a substrate held by the rotary holding device disposed in the container and forms a film of the processing liquid on the substrate by rotating the substrate. A peripheral ceiling portion and a peripheral bottom portion are formed over an entire periphery of the cleaning jig, a discharge port is formed over the entire periphery between the peripheral ceiling portion and the peripheral bottom portion, a plurality of holes is formed in the peripheral bottom portion at intervals in a circumferential direction to communicate with the discharge port, and a lower surface of the peripheral ceiling portion is inclined toward an upper periphery.

公开(公告)号：US20220113643A1

公开(公告)日：2022-04-14

申请号：US17485698

申请日：2021-09-27

Applicant: Tokyo Electron Limited

Inventor： Kenta SHIBASAKI ,  Hiroichi INADA ,  Satoshi SHIMMURA ,  Koji TAKAYANAGI ,  Kenji YADA ,  Shinichi SEKI ,  Akihiro TERAMOTO

IPC: G03F7/20 ,  B08B3/08 ,  G03F7/16

Abstract: A solution treatment apparatus for applying a coating solution onto a substrate, includes: a holder holding and rotating the substrate; a coating solution supplier supplying the coating solution to the substrate on the holder; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate on the holder, wherein: the inner cup has a plurality of discharge ports formed along a circumferential direction at the apex part; and the discharge ports are formed to discharge a cleaning solution and make the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning the peripheral edge side upper surface, and to discharge the cleaning solution outward in the radial direction and obliquely upward.

公开(公告)号：US20150151227A1

公开(公告)日：2015-06-04

申请号：US14541450

申请日：2014-11-14

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji TAKAYANAGI ,  Kousuke Yoshihara

IPC: B01D35/34 ,  H01L21/67 ,  B01D35/02

CPC classification number: B01D35/34 ,  B01D35/02 ,  H01L21/67017

Abstract: A filter device includes a housing having space, a filter in the space of the housing, a first joint connected to a first port of the housing and having an open end which connects to a supply path of a processing liquid, a second joint connected to a second port of the housing and having an open end which connects to the path, and an exhaust joint connected to an exhaust port of the housing and having an open end which connects to an exhaust path. The first and second ports introduce or discharge the liquid and have openings to the opposite end portions of the space, respective, the filter is intersecting a straight line passing through the centers of the first and second ports, and the first, the second and exhaust joints are formed to extend in the same direction outside the space of the housing.

Abstract translation: 过滤装置包括具有空间的壳体，壳体空间中的过滤器，连接到壳体的第一端口并具有连接到处理液体的供给路径的开口端的第一接头，连接到处理液体的供给路径的第二接头 壳体的第二端口并且具有连接到路径的开口端，以及连接到壳体的排气口并且具有连接到排气路径的开口端的排气接头。 第一和第二端口引入或排出液体并且具有到空间的相对端部的开口，相应地，过滤器与穿过第一和第二端口的中心的直线相交，第一和第二端口 接头形成为在壳体的空间外侧沿相同的方向延伸。

公开(公告)号：US20160236124A1

公开(公告)日：2016-08-18

申请号：US15025045

申请日：2014-09-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yuichi YOSHIDA ,  Ryouichirou NAITOU ,  Arnaud Alain Jean DAUENDORFFER ,  Koji TAKAYANAGI ,  Shinobu MIYAZAKI

IPC: B01D37/02 ,  B01D35/18

CPC classification number: B01D37/02 ,  B01D35/18 ,  H01L21/67017

Abstract: In one embodiment, after a new filter unit (3) is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part (31) of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract translation: 在一个实施例中，在将新的过滤器单元（3）安装在处理液供给装置中之后，在使含溶剂的处理液通过过滤器单元之前，进行将过滤器单元与溶剂浸泡的步骤 预处理，然后从其中排出溶剂。 构成过滤器单元的过滤器部件（31）的材料对溶剂的溶解度大于材料对处理液体的溶解度。 该步骤使得可以在处理液体通过过滤器单元之前去除可能从过滤部分洗脱到处理液中以产生异物（颗粒）的组分。

公开(公告)号：US20150125793A1

公开(公告)日：2015-05-07

申请号：US14528290

申请日：2014-10-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kousuke YOSHIHARA ,  Koji TAKAYANAGI ,  Toshinobu FURUSHO ,  Takashi SASA ,  Daisuke ISHIMARU

IPC: G03F7/16

CPC classification number: G03F7/16 ,  H01L21/67017

Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.

Abstract translation: 处理液体供给装置执行喷射步骤，其中抽吸到泵中的处理液体通过过滤装置并从排出部件喷出而不将处理液体返回到泵中; 其中抽吸到泵中的处理液体返回到混合部分的处理液体源侧的返回步骤; 以及补充步骤，其中返回到处理液体源侧的处理液体与从处理液体源补充的处理液体一起被抽吸到泵中。 处理液体在返回步骤和补充步骤中的至少一个中通过过滤装置。 在返回步骤中返回到处理液体源侧的处理液的量大于在喷射步骤中从喷射部喷出的处理液的量。

公开(公告)号：US20240085813A1

公开(公告)日：2024-03-14

申请号：US18515667

申请日：2023-11-21

Applicant: Tokyo Electron Limited

Inventor： Kenta SHIBASAKI ,  Hiroichi INADA ,  Satoshi SHIMMURA ,  Koji TAKAYANAGI ,  Kenji YADA ,  Shinichi SEKI ,  Akihiro TERAMOTO

IPC: G03F7/00 ,  B05C11/02 ,  B08B3/08 ,  G03F7/16

CPC classification number: G03F7/70925 ,  B05C11/02 ,  B08B3/08 ,  G03F7/162

Abstract: A cleaning method of cleaning a solution treatment apparatus for applying a coating solution onto a substrate, the solution treatment apparatus including a holder holding and rotating the substrate; a coating solution supplier; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction. The cleaning method includes introducing the cleaning solution to the storage chamber via the introduction hole, discharging the cleaning solution from the discharge port and making the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning away the coating solution adhering to the peripheral edge side upper surface. The discharging in the cleaning discharges the cleaning solution from discharge ports of the inner cup outward in the radial direction and obliquely upward.

公开(公告)号：US20200016521A1

公开(公告)日：2020-01-16

申请号：US16580292

申请日：2019-09-24

Applicant: Tokyo Electron Limited

Inventor： Yuichi YOSHIDA ,  Ryouichirou NAITOU ,  Arnaud Alain Jean DAUENDORFFER ,  Koji TAKAYANAGI ,  Shinobu MIYAZAKI

IPC: B01D37/02 ,  B01D35/18

Abstract: In one embodiment, after a new filter unit is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

公开(公告)号：US20240120867A1

公开(公告)日：2024-04-11

申请号：US18480575

申请日：2023-10-04

Applicant: Tokyo Electron Limited

Inventor： Youichi MASAKI ,  Mitsuteru YANO ,  Eiichi SEKIMOTO ,  Tsuyoshi OTSUKA ,  Akihiro TERAMOTO ,  Teppei ITO ,  Koji TAKAYANAGI

IPC: H02P21/20 ,  H02P21/22

CPC classification number: H02P21/20 ,  H02P21/22 ,  H02P2205/05

Abstract: A motor control method for transferring an object to be transferred by a moving object that moves by driving of a motor in a substrate processing apparatus, includes: a data acquisition process of acquiring, at different times, pieces of drive data which relate to the driving of the motor and vary with heat generation of the motor; and a transfer process of transferring the object to be transferred by controlling current to be supplied to the motor, based on each of the pieces of drive data, to compensate for displacement of the object to be transferred from a target transfer position due to the heat generation of the motor.

公开(公告)号：US20180254205A1

公开(公告)日：2018-09-06

申请号：US15971320

申请日：2018-05-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato MIZUTA ,  Koji TAKAYANAGI

IPC: H01L21/67 ,  H01L21/687 ,  F27B17/00

CPC classification number: H01L21/67103 ,  F27B17/0025 ,  H01L21/67017 ,  H01L21/68742

Abstract: A substrate heating device includes: heating modules each having a processing vessel within which a heating plate is disposed, an gas inlet port for introducing a purge gas into a processing atmosphere, and an exhaust port for exhausting the processing atmosphere; individual exhaust paths each connected to the exhaust port of the heating modules; a common exhaust path connected to downstream ends of the individual exhaust paths of the heating modules; a branch path branched from the individual exhaust paths and opened to the outside of the processing vessel; and an exhaust flow rate adjusting unit configured to adjust a flow rate ratio of an exhaust flow rate of a gas exhausted from the exhaust port into the common exhaust path and an introduction flow rate of a gas introduced from the outside of the processing vessel into the common exhaust path through the branch path.

公开(公告)号：US20170043287A1

公开(公告)日：2017-02-16

申请号：US15336856

申请日：2016-10-28

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hiroshi MARUMOTO ,  Koji TAKAYANAGI ,  Kenji ADACHI

IPC: B01D36/00 ,  B01D19/00 ,  H01L21/67

CPC classification number: H01L21/6715 ,  B01D19/0031 ,  B01D19/0036 ,  B01D36/001 ,  H01L21/67017

Abstract: According to an embodiment of the present disclosure, a process liquid supply apparatus operating method is provided. The method includes filling a filter unit with a process liquid from an upstream side of the filter unit to a downstream side of the filter unit after newly mounting or replacing the filter unit and repeating a depressurization filtering process and a pressurization filtering process for a predetermined number of times. The depressurization filtering process depressurizes the process liquid in the downstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit. The pressurization filtering process pressurizes the process liquid from the upstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit.

Abstract translation: 根据本公开的实施例，提供了一种处理液体供应装置操作方法。 该方法包括在新安装或更换过滤器单元之后，将过滤液从过滤器单元的上游侧填充到过滤器单元的下游侧，并重复进行预定数量的减压过滤和加压过滤处理 的时代。 减压过滤处理对过滤器单元的下游侧的处理液进行减压，从而允许处理液体透过过滤器单元。 加压过滤过程从过滤器单元的上游侧对工艺液体进行加压，从而允许处理液体渗透过滤单元。