公开(公告)号：US20160293457A1

公开(公告)日：2016-10-06

申请号：US15082342

申请日：2016-03-28

申请人： Tokyo Electron Limited

发明人： Tatsuya Yamaguchi ,  Koji Yoshii ,  Masafumi Shoji

IPC分类号： H01L21/67 ,  H01L21/324

CPC分类号： H01L21/67109 ,  H01L21/324 ,  H01L21/67248

摘要： Disclosed is a heat treatment apparatus including: a heating unit that heats an inside of a processing chamber that accommodates a plurality of workpieces; a temperature drop rate model storing unit that stores a temperature drop rate model; and a heat treatment performing unit that sets the temperature drop rate model stored in the temperature drop model storing unit and sets the inside of the processing chamber to the temperature and the time represented in the temperature drop rate model. The temperature drop rate model storing unit stores a plurality of temperature drop rate models, each of which has a different temperature drop rate. The processing chamber is divided into a plurality of zones, and the temperature drop rate mode is set for each of the zones. The heat treatment performing unit sets different temperature drop rate models in a plurality of zones to heat the plurality of workpieces.

摘要翻译： 公开了一种热处理设备，包括：加热单元，其加热容纳多个工件的处理室的内部; 温度下降率模型存储单元，其存储温度降率模型; 以及热处理执行单元，其设定存储在温降模型存储单元中的温度下降率模型，并将处理室的内部设定为温度下降率模型中表示的温度和时间。 温度下降率模型存储单元存储多个具有不同温度下降率的温度降率模型。 处理室被分成多个区域，并且为每个区域设定温度降低模式。 热处理执行单元在多个区域中设置不同的温度下降率模型以加热多个工件。

公开(公告)号：US11424143B2

公开(公告)日：2022-08-23

申请号：US16297858

申请日：2019-03-11

申请人： Tokyo Electron Limited

发明人： Koji Yoshii ,  Tatsuya Yamaguchi ,  Hiroyuki Hayashi ,  Mitsuhiro Okada ,  Satoshi Takagi ,  Toshihiko Takahashi ,  Masafumi Shoji ,  Kazuya Kitamura

IPC分类号： H01L21/67 ,  H01L21/673

摘要： Provided is a heat insulation structure used for a vertical heat treatment apparatus that performs a heat treatment on a substrate. The vertical heat treatment apparatus includes: a processing container having a double tube structure including an inner tube and an outer tube closed upward, the processing container having an opening at a lower end thereof; a gas supply section and exhaust section provided on a lower side of the processing container; a lid configured to introduce or discharge the substrate into or from the opening and to open/close the opening; and a heating section provided to cover the processing container from an outside. The heat insulation structure is provided between the inner tube and the outer tube.

公开(公告)号：US20190287828A1

公开(公告)日：2019-09-19

申请号：US16297858

申请日：2019-03-11

申请人： Tokyo Electron Limited

发明人： Koji Yoshii ,  Tatsuya Yamaguchi ,  Hiroyuki Hayashi ,  Mitsuhiro Okada ,  Satoshi Takagi ,  Toshihiko Takahashi ,  Masafumi Shoji ,  Kazuya Kitamura

IPC分类号： H01L21/67 ,  H01L21/673

摘要： Provided is a heat insulation structure used for a vertical heat treatment apparatus that performs a heat treatment on a substrate. The vertical heat treatment apparatus includes: a processing container having a double tube structure including an inner tube and an outer tube closed upward, the processing container having an opening at a lower end thereof; a gas supply section and exhaust section provided on a lower side of the processing container; a lid configured to introduce or discharge the substrate into or from the opening and to open/close the opening; and a heating section provided to cover the processing container from an outside. The heat insulation structure is provided between the inner tube and the outer tube.

公开(公告)号：US09905442B2

公开(公告)日：2018-02-27

申请号：US15082342

申请日：2016-03-28

申请人： Tokyo Electron Limited

发明人： Tatsuya Yamaguchi ,  Koji Yoshii ,  Masafumi Shoji

IPC分类号： F27B5/14 ,  H01L21/67 ,  H01L21/324

CPC分类号： H01L21/67109 ,  H01L21/324 ,  H01L21/67248

摘要： Disclosed is a heat treatment apparatus including: a heating unit that heats an inside of a processing chamber that accommodates a plurality of workpieces; a temperature drop rate model storing unit that stores a temperature drop rate model; and a heat treatment performing unit that sets the temperature drop rate model stored in the temperature drop model storing unit and sets the inside of the processing chamber to the temperature and the time represented in the temperature drop rate model. The temperature drop rate model storing unit stores a plurality of temperature drop rate models, each of which has a different temperature drop rate. The processing chamber is divided into a plurality of zones, and the temperature drop rate mode is set for each of the zones. The heat treatment performing unit sets different temperature drop rate models in a plurality of zones to heat the plurality of workpieces.