公开(公告)号：US20250045635A1

公开(公告)日：2025-02-06

申请号：US18783106

申请日：2024-07-24

Applicant: Tokyo Electron Limited

Inventor： Masahiro YANAGISAWA

IPC: G06N20/00

Abstract: An information processing apparatus includes a model acquisition unit that acquires a learned model that has learned a relationship between first log information measured during a processing in a first substrate processing apparatus and a first process result indicating a state of a processing target after the processing; a data acquisition unit that acquires second log information measured during a processing in a second substrate processing apparatus and a second process result indicating a state of a processing target after the processing; and a model correction unit that corrects the learned model based on the second log information and the second process result.

公开(公告)号：US20250014925A1

公开(公告)日：2025-01-09

申请号：US18759466

申请日：2024-06-28

Applicant: Tokyo Electron Limited

Inventor： Yuka NAKASATO ,  Masahiro YANAGISAWA ,  Huizhen BU

IPC: H01L21/67 ,  G01M99/00

Abstract: An information processing apparatus includes an acquisition unit that acquires a plurality of sensor values output from a plurality of sensors installed in a semiconductor manufacturing apparatus while a process is running; an inference unit that infers an abnormality degree of the process from the acquired sensor values, using an abnormality detection model that has learned a correspondence relationship between the sensor values and the abnormality degree of the process using learning data; an abnormality detection unit that detects an abnormality occurring in the process based on the inferred abnormality degree of the process; and an abnormality factor search unit that searches for a univariate abnormality and a correlation abnormality that are candidates of abnormality factors occurring in the process, using abnormality factor search methods; and an abnormality determination result output unit that outputs the detected abnormality and the searched univariate abnormality and correlation abnormality, as an abnormality determination result.

公开(公告)号：US20230085325A1

公开(公告)日：2023-03-16

申请号：US17903444

申请日：2022-09-06

Applicant: Tokyo Electron Limited

Inventor： Hirokazu KYOKANE ,  Hidefumi MATSUI ,  Toshiyuki FUKUMOTO ,  Satoshi ITOH ,  Masashi IMANAKA ,  Toyohisa TSURUDA ,  Masashi ENOMOTO ,  Masahiro YANAGISAWA

IPC: G01B11/06 ,  G06T7/60

Abstract: A substrate processing apparatus includes: an imaging portion configured to acquire a surface image of a film formed on a surface of a substrate; an optical property estimation portion configured to estimate an optical property of the film based on process information acquired during formation of the film; and a film thickness estimation portion configured to estimate a film thickness of the film based on the surface image and an estimation result of the optical property.