公开(公告)号：US09842751B2

公开(公告)日：2017-12-12

申请号：US14922441

申请日：2015-10-26

Applicant: Tokyo Electron Limited

Inventor： Shouta Umezaki ,  Yoshihiro Kai ,  Kazuki Kosai ,  Mitsuo Tanaka

IPC: B05B1/28 ,  B05C11/02 ,  H01L21/67

CPC classification number: H01L21/6708 ,  B05B1/28 ,  B05C11/02 ,  H01L21/67051

Abstract: Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.

公开(公告)号：US20160114345A1

公开(公告)日：2016-04-28

申请号：US14922441

申请日：2015-10-26

Applicant: Tokyo Electron Limited

Inventor： Shouta Umezaki ,  Yoshihiro Kai ,  Kazuki Kosai ,  Mitsuo Tanaka

IPC: B05B13/02 ,  B05B1/00

CPC classification number: H01L21/6708 ,  B05B1/28 ,  B05C11/02 ,  H01L21/67051

Abstract: Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.

Abstract translation: 公开了一种基板液体处理装置。 该装置包括：基板保持单元，被配置为水平地保持基板; 喷嘴，被配置为从设置在由所述基板保持单元保持的所述基板上的液体到达目标位置朝向从所述液体到达目标位置隔开预定的喷射口的喷出口喷射处理液， 水平距离 以及液体接收单元，设置在喷嘴下方，以接收从喷嘴的喷射口落下的处理液。