公开(公告)号：US20220093432A1

公开(公告)日：2022-03-24

申请号：US17479842

申请日：2021-09-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takami FUKASAWA ,  Ryosuke KANAMARU

IPC: H01L21/67 ,  B25J13/08 ,  B25J9/16 ,  H01L21/687

Abstract: There is provided a transfer device for transferring a substrate. The transfer device comprises a robot arm having an arm for transferring the substrate and a driving unit for rotating the arm, a first light irradiation unit configured to irradiate light along a first optical path, a first light receiving unit configured to receive the light irradiated from the first light irradiation unit, and a control device configured to control the driving unit so that the arm is rotated across the first optical path.

公开(公告)号：US20160379855A1

公开(公告)日：2016-12-29

申请号：US15187989

申请日：2016-06-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takami FUKASAWA

IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677

CPC classification number: H01L21/6732 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67769 ,  H01L21/67778

Abstract: A storage unit of an embodiment includes a container, a rectifying plate, and an exhaust duct. The container provides a first space for storing a plurality of substrates therein, and a second space behind the first space. The rectifying plate is provided between the first and second spaces. The exhaust duct communicates with the second space. The rectifying plate has an effective region facing the first space. The effective region includes a first region and a second region. The first region faces a center of the first space. The second region extends on one side or both sides of the first region. In the first region, a plurality of through holes are formed to be distributed over the first region. The second region has a conductance lower than a conductance of the first region.

Abstract translation: 实施例的存储单元包括容器，整流板和排气管。 容器提供用于在其中存储多个基板的第一空间和第一空间后面的第二空间。 整流板设置在第一和第二空间之间。 排气管与第二空间连通。 整流板具有面向第一空间的有效区域。 有效区域包括第一区域和第二区域。 第一个区域面向第一个空间的中心。 第二区域在第一区域的一侧或两侧延伸。 在第一区域中，形成分布在第一区域上的多个通孔。 第二个地区的电导率低于第一个地区的电导率。

公开(公告)号：US20250069940A1

公开(公告)日：2025-02-27

申请号：US18946976

申请日：2024-11-14

Applicant: Tokyo Electron Limited

Inventor： Norihiko AMIKURA ,  Masatomo KITA ,  Masahiro DOGOME ,  Takami FUKASAWA ,  Daisuke HAYASHI ,  Toshiaki TOYOMAKI

IPC: H01L21/687 ,  B25J11/00 ,  H01L21/683

Abstract: A transfer device for simultaneously or separately transferring a wafer and a consumable part having a circular shape is disclosed. The consumable part is disposed in a wafer processing module, and the outer diameter of the consumable part is larger than the outer diameter of the wafer. The transfer device comprises an end effector configured to place the wafer and the consumable part thereon simultaneously or separately, an arm configured to move the end effector, and a controller configured to control the arm, to place the consumable part on the end effector such that the center of gravity of the consumable part coincides with a first position when transferring the consumable part, and to place the wafer on the end effector such that the center of gravity of the wafer coincides with a second position between the first position and front ends of the end effector when transferring the wafer.

公开(公告)号：US20200075376A1

公开(公告)日：2020-03-05

申请号：US16548652

申请日：2019-08-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takami FUKASAWA

IPC: H01L21/677 ,  H01L21/687

Abstract: A substrate transfer mechanism includes a moving body, a support body supported by the moving body, first and second rotary shafts at the support body, first and second arms respectively extending from first and second rotary shafts and having first and second substrate support regions. The first arm and the second arm are disposed at different height positions. The mechanism includes a third rotary shaft rotating the support body with respect to the moving body, and a switching mechanism switching a first rotation operation of rotating the support body such that a distance in a right-left direction between the first and second substrate support region is maintained and a second rotation operation of rotating the support body together with rotation of at least one of the first and second rotary shaft such that the distance is changed between a first distance and a second distance shorter than the first distance.