公开(公告)号：US11598007B2

公开(公告)日：2023-03-07

申请号：US16549365

申请日：2019-08-23

Applicant: Tokyo Electron Limited

Inventor： Nao Akashi ,  Yuta Haga ,  Hiroyuki Sato ,  Motoi Okada ,  Kei Sano ,  Junya Sato ,  Takayuki Kita ,  Atsushi Suzuki ,  Kiwamu Tsukino ,  Takuro Tsutsui

IPC: G06K9/00 ,  C23C16/52 ,  C23C16/458 ,  C23C16/46 ,  G06T7/73 ,  G06N3/08 ,  G06T7/00 ,  H04N5/247

Abstract: According to an aspect of the present disclosure, a substrate state determining apparatus includes: an image capturing unit that captures an image of a substrate placed on a stage; a learning unit that executes a machine learning using training data in which information indicating a state of the substrate is attached to the image of the substrate, so as to generate a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output; and a determination unit that determines the state of the substrate corresponding to the image of the substrate captured by the image capturing unit, using the substrate state determination model generated by the learning unit.

公开(公告)号：US20200080202A1

公开(公告)日：2020-03-12

申请号：US16549365

申请日：2019-08-23

Applicant: Tokyo Electron Limited

Inventor： Nao Akashi ,  Yuta Haga ,  Hiroyuki Sato ,  Motoi Okada ,  Kei Sano ,  Junya Sato ,  Takayuki Kita ,  Atsushi Suzuki ,  Kiwamu Tsukino ,  Takuro Tsutsui

IPC: C23C16/52 ,  C23C16/458 ,  C23C16/46 ,  G06T7/73 ,  G06T7/00 ,  G06N3/08

Abstract: According to an aspect of the present disclosure, a substrate state determining apparatus includes: an image capturing unit that captures an image of a substrate placed on a stage; a learning unit that executes a machine learning using training data in which information indicating a state of the substrate is attached to the image of the substrate, so as to generate a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output; and a determination unit that determines the state of the substrate corresponding to the image of the substrate captured by the image capturing unit, using the substrate state determination model generated by the learning unit.

公开(公告)号：US20140345523A1

公开(公告)日：2014-11-27

申请号：US14284536

申请日：2014-05-22

Applicant: Tokyo Electron Limited

Inventor： Hitoshi KIKUCHI ,  Takeshi Kobayashi ,  Mitsuhiro Yoshida ,  Yuta Haga ,  Yuji Takabatake ,  Naohide Ito ,  Katsuaki Sugawara ,  Masaaki Chiba ,  Hiroyuki Sato

IPC: C23C16/52 ,  G01B11/14 ,  G01B21/16

CPC classification number: C23C16/52 ,  C23C16/45551

Abstract: A substrate ejection detection device is used for substrate processing apparatus configured to process a substrate by continuously rotating a turntable holding the substrate on a concave portion formed in a surface thereof to receive the substrate thereon. In the substrate processing device, the turntable is substantially horizontally provided in a chamber. The substrate ejection detection device includes a substrate ejection determination unit configured to determine whether the substrate is out of the concave portion by determining whether the substrate exists on the concave portion while rotating the turntable.

Abstract translation: 衬底喷射检测装置用于基板处理装置，其被配置为通过将保持基板的转台连续旋转在形成在其表面上的凹部上来处理基板，以在其上接纳基板。 在基板处理装置中，转盘基本上水平地设置在室中。 基板喷射检测装置包括基板排出确定单元，其被配置为通过在旋转转盘的同时确定基板是否存在于凹部上来确定基板是否在凹部之外。