公开(公告)号：US20200165720A1

公开(公告)日：2020-05-28

申请号：US16695411

申请日：2019-11-26

Applicant: Tokyo Electron Limited

Inventor： Kenta Horigome ,  Shinobu Kawamorita ,  Yosuke Matsumoto ,  Kosuke Takahashi ,  Naohide Ito

IPC: C23C14/54 ,  G05B15/02 ,  G05D23/19

Abstract: A monitoring apparatus for monitoring a raw material tank monitors the temperature of the raw material tank when the temperature of the raw material tank storing a solid or liquid raw material is raised to a set temperature by a heating unit. The monitoring apparatus includes: a temperature determination unit configured to determine whether the temperature has reached a stable range including the set temperature, and determine whether the temperature has deviated from the stable range; and a setting unit configured to set the set temperature of the heating unit to 0° C. when a predetermined timeout time has elapsed from a time point at which the temperature determination unit determined that the temperature deviated from the stable range.

公开(公告)号：US10002417B2

公开(公告)日：2018-06-19

申请号：US14281989

申请日：2014-05-20

Applicant: Tokyo Electron Limited

Inventor： Kiichi Takahashi ,  Takeshi Kobayashi ,  Yuji Takabatake ,  Naohide Ito ,  Katsuaki Sugawara

IPC: G01C5/00 ,  G06T7/00 ,  H04N7/18

CPC classification number: G06T7/0004 ,  G06T2207/30148

Abstract: A ready for rotation state detection device is configured to detect a state in which a substrate, which is placed on a concave portion formed in a surface of a turntable, will not fly out of the concave portion when the turntable is rotated in a chamber. The ready for rotation state detection device includes a ready for rotation state detection unit configured to detect that a height of a surface of an end of the substrate is equal to or lower than a predetermined value indicating that the turntable is rotatable, upon receiving the substrate on the concave portion.

公开(公告)号：US09583318B2

公开(公告)日：2017-02-28

申请号：US15080822

申请日：2016-03-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shigehiro Miura ,  Takeshi Kobayashi ,  Katsuaki Sugawara ,  Naohide Ito

IPC: H01L21/67 ,  H01J37/32 ,  C23C16/458 ,  C23C16/52 ,  C23C16/50 ,  H01L21/687

CPC classification number: H01J37/32972 ,  C23C16/45536 ,  C23C16/45551 ,  C23C16/4584 ,  C23C16/4586 ,  C23C16/50 ,  C23C16/52 ,  H01J37/321 ,  H01J37/32935 ,  H01L21/67115 ,  H01L21/68764 ,  H01L21/68771

Abstract: There is provided an apparatus of performing a plasma process on substrates mounted on an upper surface of a rotary table. The apparatus includes: a heater for heating the substrates; a process gas supply part for supplying a process gas toward the upper surface of the rotary table; an antenna for generating an inductively coupled plasma by converting the process gas to plasma; a light detection part for detecting respective light intensities of R, G and B component as light color components; a calculation part for obtaining an evaluation value corresponding to a change amount before and after supplying a high-frequency power to the antenna, with respect to at least one of the respective light intensities; and an ignition determination part for comparing the evaluation value with a threshold value and to determine that ignition of plasma is not generated if the evaluation value does not exceed the threshold value.

Abstract translation: 提供了对安装在旋转台的上表面上的基板上进行等离子体处理的装置。 该装置包括：用于加热基板的加热器; 处理气体供给部，其用于向所述转台的上表面供给处理气体; 用于通过将处理气体转换成等离子体来产生电感耦合等离子体的天线; 用于检测作为浅色分量的R，G和B分量的各个光强度的光检测部分; 相对于各个光强度中的至少一个，获得与向天线供给高频电力前后变化量对应的评价值的计算部; 以及点火确定部分，用于将评估值与阈值进行比较，并且如果评估值不超过阈值，则确定不产生等离子体的点燃。

公开(公告)号：US20140347465A1

公开(公告)日：2014-11-27

申请号：US14281989

申请日：2014-05-20

Applicant: Tokyo Electron Limited

Inventor： Kiichi TAKAHASHI ,  Takeshi Kobayashi ,  Yuji Takabatake ,  Naohide Ito ,  Katsuaki Sugawara

IPC: G01C5/00 ,  G06T7/00 ,  H04N7/18

CPC classification number: G06T7/0004 ,  G06T2207/30148

Abstract: A ready for rotation state detection device is configured to detect a state in which a substrate, which is placed on a concave portion formed in a surface of a turntable, will not fly out of the concave portion when the turntable is rotated in a chamber. The ready for rotation state detection device includes a ready for rotation state detection unit configured to detect that a height of a surface of an end of the substrate is equal to or lower than a predetermined value indicating that the turntable is rotatable, upon receiving the substrate on the concave portion.

Abstract translation: 准备旋转状态检测装置被配置为检测当转盘在腔室中旋转时，放置在转盘表面上的凹部上的基板不会从凹部中飞出的状态。 准备旋转状态检测装置包括准备旋转状态检测单元，其被配置为在接收到基板时检测基板的端部的表面的高度等于或低于指示转盘是可旋转的预定值 在凹部上。

公开(公告)号：US11073851B2

公开(公告)日：2021-07-27

申请号：US16695411

申请日：2019-11-26

Applicant: Tokyo Electron Limited

Inventor： Kenta Horigome ,  Shinobu Kawamorita ,  Yosuke Matsumoto ,  Kosuke Takahashi ,  Naohide Ito

IPC: G05D23/19 ,  C23C14/54 ,  G05B15/02 ,  C23C16/44 ,  F24F110/10 ,  B01F15/06

Abstract: A monitoring apparatus for monitoring a raw material tank monitors the temperature of the raw material tank when the temperature of the raw material tank storing a solid or liquid raw material is raised to a set temperature by a heating unit. The monitoring apparatus includes: a temperature determination unit configured to determine whether the temperature has reached a stable range including the set temperature, and determine whether the temperature has deviated from the stable range; and a setting unit configured to set the set temperature of the heating unit to 0° C. when a predetermined timeout time has elapsed from a time point at which the temperature determination unit determined that the temperature deviated from the stable range.

公开(公告)号：US20140345523A1

公开(公告)日：2014-11-27

申请号：US14284536

申请日：2014-05-22

Applicant: Tokyo Electron Limited

Inventor： Hitoshi KIKUCHI ,  Takeshi Kobayashi ,  Mitsuhiro Yoshida ,  Yuta Haga ,  Yuji Takabatake ,  Naohide Ito ,  Katsuaki Sugawara ,  Masaaki Chiba ,  Hiroyuki Sato

IPC: C23C16/52 ,  G01B11/14 ,  G01B21/16

CPC classification number: C23C16/52 ,  C23C16/45551

Abstract: A substrate ejection detection device is used for substrate processing apparatus configured to process a substrate by continuously rotating a turntable holding the substrate on a concave portion formed in a surface thereof to receive the substrate thereon. In the substrate processing device, the turntable is substantially horizontally provided in a chamber. The substrate ejection detection device includes a substrate ejection determination unit configured to determine whether the substrate is out of the concave portion by determining whether the substrate exists on the concave portion while rotating the turntable.

Abstract translation: 衬底喷射检测装置用于基板处理装置，其被配置为通过将保持基板的转台连续旋转在形成在其表面上的凹部上来处理基板，以在其上接纳基板。 在基板处理装置中，转盘基本上水平地设置在室中。 基板喷射检测装置包括基板排出确定单元，其被配置为通过在旋转转盘的同时确定基板是否存在于凹部上来确定基板是否在凹部之外。

公开(公告)号：US11621185B2

公开(公告)日：2023-04-04

申请号：US17177382

申请日：2021-02-17

Applicant: Tokyo Electron Limited

Inventor： Rintaro Takao ,  Naohide Ito ,  Hiroaki Dewa ,  Masayuki Kozawa

IPC: H01L21/677 ,  H01L21/68 ,  B65G49/07 ,  H01L21/67 ,  G05B19/418

Abstract: A semiconductor manufacturing apparatus includes one or more process modules, a scheduler, and a transfer controller. A product wafer of a lot that is transferred from a load port to one of the one or more process modules is replenished such that a total number of wafers that are simultaneously processed in the one or more process modules becomes N. When an advance lot being processed and a post lot to be processed subsequent to the advance lot have a same processing condition, the scheduler creates the transfer plan to replenish with the product wafer of the post lot instead of a dummy wafer such that the transfer controller transfers the product wafer and the dummy wafer to the one or more process modules according to the created transfer plan.

公开(公告)号：US10186422B2

公开(公告)日：2019-01-22

申请号：US14060182

申请日：2013-10-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naohide Ito ,  Keiji Osada ,  Daisuke Morisawa

IPC: H01J37/32 ,  H01L21/02 ,  H01L21/67

Abstract: A substrate processing apparatus is provided with a process module including a processing container, a rotary table installed within the processing container, the rotary table having a plurality of placing regions to receive substrates, and a process gas supply unit supplying a process gas to the placing regions, a load port in which a transfer container is placed, a dummy substrate receiving unit, a transfer chamber including a transfer mechanism delivering the product substrates or the dummy substrates between the transfer container or the dummy substrate receiving unit and the rotary table, a setting unit setting a placing region to which one of the product substrates is to be transferred, and a control unit outputting a control signal such that the dummy substrates are carried into the remaining placing regions.

公开(公告)号：US09828675B2

公开(公告)日：2017-11-28

申请号：US14860251

申请日：2015-09-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naohide Ito ,  Daisuke Morisawa ,  Keiji Osada

IPC: H01L21/31 ,  C23C16/458 ,  H01L21/02 ,  H01L21/67 ,  C23C16/52 ,  H01L21/677

CPC classification number: C23C16/4584 ,  C23C16/52 ,  H01L21/02263 ,  H01L21/67201 ,  H01L21/67745

Abstract: Disclosed is a processing apparatus. The processing apparatus includes: a load port in which a conveyance container accommodating a plurality of semiconductor wafers is placed; a dummy wafer storage area in which a conveyance container accommodating a plurality of dummy wafers is placed; a normal-pressure conveyance room in which a first conveyance arm is installed; an equipment that processes the plurality of semiconductor wafers in a state where the semiconductor wafers and the dummy wafers which are conveyed are placed in slots, respectively; and a controller that controls each component of the processing apparatus. The controller classifies the dummy wafers accommodated in the conveyance container into a plurality of groups, and controls the first conveyance arm to preferentially convey the dummy wafers within one of the classified groups to the equipment and, in replacing the dummy wafers, to perform replacement of the dummy wafers group to group as classified.