SUBSTRATE PROCESSING APPARATUS
    2.
    发明公开

    公开(公告)号:US20240152052A1

    公开(公告)日:2024-05-09

    申请号:US18386781

    申请日:2023-11-03

    CPC classification number: G03F7/16 G03F7/40 H01L21/67023

    Abstract: A substrate processing apparatus includes: a carrier block, into which a carrier storing a substrate is carried; a processing block including a liquid processing module that supplies a processing liquid to the substrate transferred from the carrier block, thereby performing a liquid processing; and an interface block, to which the substrate is transferred from the processing block. The interface block includes a liquid storage, in which a bottle storing the processing liquid is disposed. The carrier block includes a liquid feeder that feeds the processing liquid supplied from the liquid storage, to the liquid processing module. The liquid feeder includes a filter that filters the processing liquid supplied from the liquid storage, and a first pump that pumps the processing liquid toward the liquid processing module.

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