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公开(公告)号:US20230418166A1
公开(公告)日:2023-12-28
申请号:US18213785
申请日:2023-06-23
Applicant: Tokyo Electron Limited
Inventor: Yuichiro KUNUGIMOTO , Shota UEYAMA , Akihiro TERAMOTO , Yuta NISHIYAMA , Shinichi HATAKEYAMA
Abstract: A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.
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公开(公告)号:US20240152052A1
公开(公告)日:2024-05-09
申请号:US18386781
申请日:2023-11-03
Applicant: Tokyo Electron Limited
Inventor: Masataka TANAKA , Tsunaki IKEDA , Yuta NISHIYAMA
CPC classification number: G03F7/16 , G03F7/40 , H01L21/67023
Abstract: A substrate processing apparatus includes: a carrier block, into which a carrier storing a substrate is carried; a processing block including a liquid processing module that supplies a processing liquid to the substrate transferred from the carrier block, thereby performing a liquid processing; and an interface block, to which the substrate is transferred from the processing block. The interface block includes a liquid storage, in which a bottle storing the processing liquid is disposed. The carrier block includes a liquid feeder that feeds the processing liquid supplied from the liquid storage, to the liquid processing module. The liquid feeder includes a filter that filters the processing liquid supplied from the liquid storage, and a first pump that pumps the processing liquid toward the liquid processing module.
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公开(公告)号:US20220171294A1
公开(公告)日:2022-06-02
申请号:US17522050
申请日:2021-11-09
Applicant: Tokyo Electron Limited
Inventor: Yuichiro KUNUGIMOTO , Shota UEYAMA , Akihiro TERAMOTO , Yuta NISHIYAMA , Shinichi HATAKEYAMA
Abstract: A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.
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