Process for producing transparent conductive laminate
    1.
    发明申请
    Process for producing transparent conductive laminate 有权
    制造透明导电层压板的方法

    公开(公告)号:US20050045471A1

    公开(公告)日:2005-03-03

    申请号:US10925930

    申请日:2004-08-26

    摘要: A process for producing a transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding is provided. The transparent conductive layer is excellent in transparency and wet heat confidence, is not excessively low in specific resistivity, and has no variation on optical properties such as retardation characteristic. The transparent conductive laminate is obtained by sputter-film forming a transparent conductive layer on a substrate comprising an organic polymer molding under conditions of a substrate temperature of 80-150° C. and a degree of vacuum of 8×10−3 Pa or lower to form an amorphous transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1-6 % by weight based on the total weight of In atom and Sn atom and having a film thickness of 15-30 nm, a Hall mobility of 15-28 cm2 V·S, and a carrier density of 2×1020/cm3 to 5×1020/cm3, and heat treating the layer at a temperature lower than 120° C., to convert it into a completely crystallized transparent conductive layer having a Hall mobility of 30-45 cm2/V·S and a carrier density of 2×1020/cm3 to 7×1020/cm3.

    摘要翻译: 提供了一种制造在包含有机聚合物成型体的基板上具有完全结晶的透明导电层的透明导电层压体的方法。 透明导电层的透明性和湿热置信度优异,电阻率不低,对延迟特性等光学特性没有变化。 在基板温度为80-150℃,真空度为8×10 -3 Pa以下的条件下,在包含有机聚合物成型体的基板上溅射成膜,形成透明导电性层叠体 形成非晶透明导电层,其包含相对于In原子和Sn原子的总重量为15〜30nm的Sn原子量为1-6重量%的In.Sn复合氧化物, 霍尔迁移率为15-28cm 2,载体密度为2×10 20 / cm 3至5×10 20 / cm 3,并在低于120℃的温度下对该层进行热处理 将其转化为具有30-45cm 2 / Vs的霍尔迁移率和2×10 20 / cm 3至7×10 20 / cm 3的载流子密度的完全结晶的透明导电层 。

    Process for producing transparent conductive laminate
    2.
    发明授权
    Process for producing transparent conductive laminate 有权
    制造透明导电层压板的方法

    公开(公告)号:US07763151B2

    公开(公告)日:2010-07-27

    申请号:US10925930

    申请日:2004-08-26

    IPC分类号: C23C14/34

    摘要: A process for producing a transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding is provided. The transparent conductive layer is excellent in transparency and wet heat confidence, is not excessively low in specific resistivity, and has no variation on optical properties such as retardation characteristic. The transparent conductive laminate is obtained by sputter-film forming a transparent conductive layer on a substrate comprising an organic polymer molding under conditions of a substrate temperature of 80-150° C. and a degree of vacuum of 8×10−3 Pa or lower to form an amorphous transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1-6 % by weight based on the total weight of In atom and Sn atom and having a film thickness of 15-30 nm, a Hall mobility of 15-28 cm2 V·S, and a carrier density of 2×1020/cm3 to 5×1020/cm3, and heat treating the layer at a temperature lower than 120° C., to convert it into a completely crystallized transparent conductive layer having a Hall mobility of 30-45 cm2/V·S and a carrier density of 2×1020/cm3 to 7×1020/cm3.

    摘要翻译: 提供了一种制造在包含有机聚合物成型体的基板上具有完全结晶的透明导电层的透明导电层压体的方法。 透明导电层的透明性和湿热置信度优异,电阻率不低,对延迟特性等光学特性没有变化。 在基板温度为80-150℃,真空度为8×10 -3 Pa以下的条件下,在包含有机聚合物成型体的基板上溅射成膜,形成透明导电性层叠体 形成非晶透明导电层,其包含相对于In原子和Sn原子的总重量为15〜30nm的Sn原子量为1-6重量%的In.Sn复合氧化物, 霍尔迁移率为15-28 cm2 V·S,载流子密度为2×1020 / cm3至5×1020 / cm3,并在低于120℃的温度下对该层进行热处理,将其转化为完全结晶 透明导电层的霍尔迁移率为30-45cm2 / V·S,载流子密度为2×1020 / cm3〜7×1020 / cm3。

    Transparent conductive laminated body and touch panel
    4.
    发明授权
    Transparent conductive laminated body and touch panel 有权
    透明导电层压体和触摸屏

    公开(公告)号:US06720955B2

    公开(公告)日:2004-04-13

    申请号:US10062916

    申请日:2002-01-31

    IPC分类号: G09G500

    摘要: A transparent conductive laminated body comprising a transparent dielectric substance thin film having two layers and furthermore a transparent conductive thin film being formed on one face of a transparent film substrate with thickness of 2 to 120 &mgr;m, and a transparent substrate being adhered on another face of the film substrate through a transparent pressure sensitive adhesive layer, wherein a relationship of n3

    摘要翻译: 一种透明导电性层叠体,其具有2层的透明电介质薄膜,另外,在厚度为2〜120μm的透明薄膜基材的一面上形成透明导电性薄膜,在其另一面 通过透明压敏粘合剂层形成膜基材,其中满足n3

    Transparent conductive laminated body
    5.
    发明授权
    Transparent conductive laminated body 有权
    透明导电层压体

    公开(公告)号:US07968185B1

    公开(公告)日:2011-06-28

    申请号:US13032305

    申请日:2011-02-22

    摘要: A transparent conductive laminated body comprising: a transparent film substrate having a thickness of 2 to 200 μm, and a first transparent dielectric thin film, a second transparent dielectric thin film and a transparent conductive thin film that are formed on one side of the substrate in this order from the side of the substrate, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide relative to 100 parts by weight of indium oxide, and the relationship: n2

    摘要翻译: 1.一种透明导电性层叠体,其特征在于,具有:厚度为2〜200μm的透明膜基板,以及形成在所述基板的一侧的第一透明电介质薄膜,第二透明电介质薄膜和透明导电性薄膜 从衬底的该顺序开始,其中通过真空沉积,溅射或离子电镀形成第一透明电介质薄膜,并且包括含有0至20重量份氧化锡和10至40重量份铈的复合氧化物 氧化物相对于100重量份的氧化铟,并且满足关系:n2

    TRANSPARENT CONDUCTIVE LAMINATED BODY
    6.
    发明申请
    TRANSPARENT CONDUCTIVE LAMINATED BODY 有权
    透明导电层压体

    公开(公告)号:US20110141065A1

    公开(公告)日:2011-06-16

    申请号:US13032305

    申请日:2011-02-22

    IPC分类号: G06F3/042

    摘要: A transparent conductive laminated body comprising: a transparent film substrate having a thickness of 2 to 200 μm, and a first transparent dielectric thin film, a second transparent dielectric thin film and a transparent conductive thin film that are formed on one side of the substrate in this order from the side of the substrate, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide relative to 100 parts by weight of indium oxide, and the relationship: n2

    摘要翻译: 1.一种透明导电性层叠体,其特征在于,具有:厚度为2〜200μm的透明膜基板,以及形成在所述基板的一侧的第一透明电介质薄膜,第二透明电介质薄膜和透明导电性薄膜 从衬底的该顺序开始,其中通过真空沉积,溅射或离子电镀形成第一透明电介质薄膜,并且包括含有0至20重量份氧化锡和10至40重量份铈的复合氧化物 氧化物相对于100重量份的氧化铟,并且满足关系:n2

    Transparent conductive laminated body
    8.
    发明申请
    Transparent conductive laminated body 有权
    透明导电层压体

    公开(公告)号:US20060290409A1

    公开(公告)日:2006-12-28

    申请号:US11448660

    申请日:2006-06-08

    IPC分类号: H03K17/96

    摘要: A transparent conductive laminated body comprising: a transparent film substrate having a thickness of 2 to 200 μm, and a first transparent dielectric thin film, a second transparent dielectric thin film and a transparent conductive thin film that are formed on one side of the substrate in this order from the side of the substrate, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide relative to 100 parts by weight of indium oxide, and the relationship: n2

    摘要翻译: 一种透明导电性层叠体,其特征在于,具有:厚度为2〜200μm的透明膜基板,以及形成在所述基板的一侧上的第一透明电介质薄膜,第二透明电介质薄膜和透明导电性薄膜 从衬底的该顺序开始,其中通过真空沉积,溅射或离子电镀形成第一透明电介质薄膜,并且包括含有0至20重量份氧化锡和10至40重量份铈的复合氧化物 氧化物相对于100重量份的氧化铟,并且满足n 2

    TRANSPARENT CRYSTALLINE ELECTRICALLY-CONDUCTIVE THIN FILM, METHOD OF PRODUCTION THEREOF, TRANSPARENT ELECTRICALLY-CONDUCTIVE FILM, AND TOUCH PANEL
    9.
    发明申请
    TRANSPARENT CRYSTALLINE ELECTRICALLY-CONDUCTIVE THIN FILM, METHOD OF PRODUCTION THEREOF, TRANSPARENT ELECTRICALLY-CONDUCTIVE FILM, AND TOUCH PANEL 有权
    透明晶体导电薄膜,其生产方法,透明导电薄膜和触控面板

    公开(公告)号:US20090117405A1

    公开(公告)日:2009-05-07

    申请号:US11917110

    申请日:2006-12-27

    IPC分类号: B32B9/00 B05D5/12 H01B1/02

    CPC分类号: C23C14/086

    摘要: A transparent crystalline electrically-conductive thin film of the present invention comprises an indium tin oxide as a main component, wherein the indium tin oxide contains 9% by weight or less of tin oxide based on the total amount of indium oxide and tin oxide, wherein the transparent crystalline electrically-conductive thin film contains 0.45 atomic % or less of nitrogen. The transparent crystalline electrically-conductive thin film of the present invention has a high resistance value and good reliability in a high-temperature, high-humidity environment.

    摘要翻译: 本发明的透明结晶性导电性薄膜,以铟锡氧化物为主要成分,其中,所述氧化铟锡含有氧化铟和氧化锡总量的9重量%以下,其中, 透明结晶性导电性薄膜含有0.45原子%以下的氮。 本发明的透明结晶性导电性薄膜在高温高湿环境下具有高电阻值和良好的可靠性。

    Transparent crystalline electrically-conductive thin film, method of production thereof, transparent electrically-conductive film, and touch panel
    10.
    发明授权
    Transparent crystalline electrically-conductive thin film, method of production thereof, transparent electrically-conductive film, and touch panel 有权
    透明结晶导电薄膜,其制造方法,透明导电膜和触摸面板

    公开(公告)号:US09260777B2

    公开(公告)日:2016-02-16

    申请号:US11917110

    申请日:2006-12-27

    IPC分类号: C23C16/00 C23C14/08

    CPC分类号: C23C14/086

    摘要: A transparent crystalline electrically-conductive thin film of the present invention comprises an indium tin oxide as a main component, wherein the indium tin oxide contains 9% by weight or less of tin oxide based on the total amount of indium oxide and tin oxide, wherein the transparent crystalline electrically-conductive thin film contains 0.45 atomic % or less of nitrogen. The transparent crystalline electrically-conductive thin film of the present invention has a high resistance value and good reliability in a high-temperature, high-humidity environment.

    摘要翻译: 本发明的透明结晶性导电性薄膜,以铟锡氧化物为主要成分,其中,所述氧化铟锡含有氧化铟和氧化锡总量的9重量%以下,其中, 透明结晶性导电性薄膜含有0.45原子%以下的氮。 本发明的透明结晶性导电性薄膜在高温高湿环境下具有高电阻值和良好的可靠性。