公开(公告)号：US20160009942A1

公开(公告)日：2016-01-14

申请号：US14862283

申请日：2015-09-23

Applicant: Toppan Printing Co., Ltd.

Inventor： Takahumi HORIIKE ,  Jin SATO ,  Nao TAKASHIMA

IPC: C09D133/10 ,  C23C16/40 ,  C09D1/00 ,  C23C16/455

CPC classification number: C09D133/10 ,  B32B9/00 ,  B32B27/06 ,  B32B2307/7242 ,  B32B2439/00 ,  B32B2439/70 ,  B32B2439/80 ,  B32B2457/14 ,  B32B2457/20 ,  C09D1/00 ,  C23C16/40 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45525 ,  C23C16/45555

Abstract: A laminate includes a base having a surface; an atomic layer deposition film that covers the surface of the base and has a film thickness of about 3 nm to about 500 nm (inclusive); and an overcoat layer that covers the atomic layer deposition film. A relationship of ta

Abstract translation: 层压体包括具有表面的基部; 覆盖基材表面并具有约3nm至约500nm（含）的膜厚度的原子层沉积膜; 以及覆盖原子层沉积膜的覆盖层。 满足ta

公开(公告)号：US20190032208A1

公开(公告)日：2019-01-31

申请号：US16149509

申请日：2018-10-02

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Nao TAKASHIMA

IPC: C23C16/455 ,  B29C71/02 ,  C23C16/40 ,  B32B9/00 ,  C23C16/54 ,  B32B27/08 ,  B05D7/04 ,  B32B37/14 ,  B32B38/18 ,  B05D1/00

Abstract: A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

公开(公告)号：US20170350009A1

公开(公告)日：2017-12-07

申请号：US15684312

申请日：2017-08-23

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Nao TAKASHIMA

IPC: C23C16/455 ,  B05D1/00 ,  B32B37/14 ,  B29C71/02 ,  B05D7/04 ,  B32B27/08

CPC classification number: C23C16/45525 ,  B05D1/60 ,  B05D7/04 ,  B32B9/00 ,  B32B27/08 ,  B32B37/144 ,  B32B38/18 ,  B32B2307/422 ,  B32B2307/7242 ,  B32B2457/206 ,  C08J7/08 ,  C08J2367/02 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45536 ,  C23C16/545

Abstract: A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

公开(公告)号：US20180036998A1

公开(公告)日：2018-02-08

申请号：US15730806

申请日：2017-10-12

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Takafumi HORIIKE ,  Jin SATO ,  Nao TAKASHIMA

IPC: B32B7/02 ,  B32B7/12 ,  C23C16/54 ,  C23C16/56 ,  C23C16/44 ,  C23C14/10 ,  B32B7/06 ,  C23C16/30

CPC classification number: B32B7/02 ,  B05D3/066 ,  B32B7/06 ,  B32B7/12 ,  B32B9/00 ,  B32B27/306 ,  B32B27/32 ,  B32B27/36 ,  B32B37/12 ,  B32B2037/246 ,  B32B2264/102 ,  C23C14/10 ,  C23C16/30 ,  C23C16/44 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/545 ,  C23C16/56

Abstract: A laminate includes a substrate; an atomic layer deposition film that is disposed on at least one surface of the substrate, and is made of an inorganic material; and a protective film that is bonded to and covers the atomic layer deposition film, and has an adhesive layer that is in contact with the atomic layer deposition film.

公开(公告)号：US20160265111A1

公开(公告)日：2016-09-15

申请号：US15163447

申请日：2016-05-24

Applicant: Toppan Printing Co., Ltd.

Inventor： Takafumi HORIIKE ,  Jin SATO ,  Nao TAKASHIMA

IPC: C23C16/455 ,  C23C16/40

CPC classification number: C23C16/45536 ,  B32B7/12 ,  B32B27/08 ,  B32B27/281 ,  B32B27/302 ,  B32B27/32 ,  B32B27/36 ,  B32B2307/584 ,  B32B2307/7246 ,  B32B2439/70 ,  B32B2439/80 ,  B32B2457/14 ,  C23C16/405

Abstract: A laminate (10) includes: a first substrate (11); an atomic layer deposition film (12) that is an inorganic oxide layer disposed on a first surface (11a) of the first substrate; a second substrate (14) disposed on one surface of the atomic layer deposition film; and a first adhesive layer (13) disposed between the atomic layer deposition film and the second substrate for adhering the atomic layer deposition film to the second substrate.

Abstract translation: 层压板（10）包括：第一基板（11）; 原子层沉积膜（12），其是设置在所述第一基板的第一表面（11a）上的无机氧化物层; 设置在所述原子层沉积膜的一个表面上的第二衬底（14） 以及设置在所述原子层沉积膜和所述第二基板之间的用于将所述原子层沉积膜粘附到所述第二基板的第一粘合剂层（13）。