公开(公告)号：US20110069296A1

公开(公告)日：2011-03-24

申请号：US12946380

申请日：2010-11-15

申请人： Toralf GRUNER ,  Daniel KRAEHMER ,  Michael TOTZECK ,  Johannes WANGLER ,  Markus BROTSACK ,  Nils DIECKMANN ,  Aksel GOEHNERMEIER ,  Markus SCHWAB ,  Damian FIOLKA ,  Markus ZENZINGER

发明人： Toralf GRUNER ,  Daniel KRAEHMER ,  Michael TOTZECK ,  Johannes WANGLER ,  Markus BROTSACK ,  Nils DIECKMANN ,  Aksel GOEHNERMEIER ,  Markus SCHWAB ,  Damian FIOLKA ,  Markus ZENZINGER

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。