公开(公告)号：US09274435B2

公开(公告)日：2016-03-01

申请号：US12415173

申请日：2009-03-31

申请人： Nils Dieckmann ,  Damian Fiolka

发明人： Nils Dieckmann ,  Damian Fiolka

IPC分类号： G03F7/20 ,  G02B27/28

CPC分类号： G03F7/70216 ,  G02B27/281 ,  G02B27/286 ,  G03F7/70091 ,  G03F7/70566

摘要： The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.

摘要翻译： 本公开涉及一种光学系统，例如微光刻投影曝光设备的照明系统或投影物镜，其包括具有偏振影响光学布置的光学系统，其允许提供期望的偏振分布的增强的灵活性。

公开(公告)号：US09013680B2

公开(公告)日：2015-04-21

申请号：US12836436

申请日：2010-07-14

申请人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

发明人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

IPC分类号： G03F7/20

CPC分类号： G03F7/70208 ,  G03F7/70116

摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

摘要翻译： 微光刻投影曝光装置的照明系统包括包括多个光束偏转元件（例如镜子）的光束偏转阵列。 每个光束偏转元件适于使入射光束偏转响应于控制信号而变化的偏转角。 从光束偏转元件反射的光束在系统光瞳表面产生斑点。 在曝光处理期间在掩模被成像在光敏表面上的系统光瞳表面中照亮的光斑的数量大于光束偏转元件的数量。 这可以借助于将来自光束偏转元件反射的光束相乘的光束倍增器单元来实现。 在另一个实施例中，控制光束偏转元件，使得在系统光瞳表面中产生的辐照度分布在曝光过程的两个连续的光脉冲之间变化。

公开(公告)号：US20130222780A1

公开(公告)日：2013-08-29

申请号：US13783533

申请日：2013-03-04

申请人： Damian Fiolka

发明人： Damian Fiolka

IPC分类号： G03F7/20

CPC分类号： G03F7/702 ,  G03F7/2004 ,  G03F7/70158 ,  G03F7/70891

摘要： The disclosure relates to an EUV microlithography projection exposure apparatus having an exposure light source for producing radiation in a first spectral range from 5 nm-15 nm, and a heat light source for producing radiation in a second spectral range from 1-50 μm. The apparatus also includes an optical system having a first group of mirrors for guiding radiation from the first spectral range along a light path such that each mirror in the first group can have a first associated intensity distribution applied to it in the first spectral range during operation of the exposure light source. The heat light source is arranged such that at least one mirror in the first group can have a second associated intensity distribution in the second spectral range applied to it during operation of the heat light source. The first intensity distribution differs from the second intensity distribution essentially by a position-independent factor.

摘要翻译： 本公开涉及具有用于在5nm-15nm的第一光谱范围内产生辐射的曝光光源的EUV微光刻投影曝光装置和用于在1-50μm的第二光谱范围内产生辐射的热光源。 该装置还包括具有第一组反射镜的光学系统，用于沿着光路引导来自第一光谱范围的辐射，使得第一组中的每个反射镜可以在操作期间在第一光谱范围内施加于其上的第一相关强度分布 的曝光光源。 加热光源被布置成使得第一组中的至少一个反射镜在加热光源的操作期间可以在施加到其的第二光谱范围内具有第二相关联的强度分布。 第一强度分布与第二强度分布不同，基本上与位置无关的因子。

公开(公告)号：US08482717B2

公开(公告)日：2013-07-09

申请号：US12201767

申请日：2008-08-29

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/42

CPC分类号： G03F7/70191 ,  G02B7/008 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70966

摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

摘要翻译： 本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到光敏基板上的投影物镜，其中所述投影系统包括光学系统 包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中 另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中 有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

公开(公告)号：US08339577B2

公开(公告)日：2012-12-25

申请号：US12506364

申请日：2009-07-21

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G01C11/26 ,  G01N21/00 ,  G03B27/32 ,  G03B27/54 ,  G03B27/74

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.

摘要翻译： 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

公开(公告)号：US20120293785A1

公开(公告)日：2012-11-22

申请号：US13486073

申请日：2012-06-01

申请人： Marc Kirch ,  Martin Endres ,  Damian Fiolka ,  Joachim Hartjes

发明人： Marc Kirch ,  Martin Endres ,  Damian Fiolka ,  Joachim Hartjes

IPC分类号： G03B27/72

CPC分类号： G02B26/0816 ,  G02B5/0891 ,  G02B5/09 ,  G02B7/1822 ,  G02B27/0927 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116

摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.

摘要翻译： 用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。 每个反射小面元件具有至少一个反射表面。 在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。 旋转轴与小面元件的至少一个反射表面相交。 利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

公开(公告)号：US08279524B2

公开(公告)日：2012-10-02

申请号：US10580698

申请日：2005-01-14

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element formed of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料形成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US08040492B2

公开(公告)日：2011-10-18

申请号：US12270994

申请日：2008-11-14

申请人： Damian Fiolka

发明人： Damian Fiolka

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70141 ,  G03F7/70108 ,  G03F7/70566

摘要： An illumination system of a microlithographic projection exposure apparatus, as well as related systems, methods and components are disclosed. The illumination system can include a polarization manipulator configured to variably adjust a change in the polarization state of light impinging thereon. The illumination system can also include a mirror arrangement having a plurality of mirror elements that are displaceable independently of each other to alter an angle distribution of the light reflected by the mirror arrangement. A change in the intensity distribution caused by the polarization manipulator in a plane of the projection exposure apparatus can be at least partially compensated by the mirror arrangement.

摘要翻译： 公开了一种微光刻投影曝光装置的照明系统，以及相关系统，方法和部件。 照明系统可以包括被配置为可变地调节照射在其上的光的偏振状态的变化的偏振操纵器。 照明系统还可以包括具有多个反射镜元件的反射镜装置，其可彼此独立地移位以改变由反射镜装置反射的光的角度分布。 由投影曝光装置的平面中的偏光操纵器引起的强度分布的变化可以至少部分地被反射镜装置补偿。

公开(公告)号：US20110177463A1

公开(公告)日：2011-07-21

申请号：US13038453

申请日：2011-03-02

申请人： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

发明人： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70083 ,  G02B17/0605 ,  G02B17/0647 ,  G02B27/0043 ,  G03F7/70033 ,  G03F7/70075

摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.

摘要翻译： 用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。 照明系统的照明光学器件用于将来自光源的照明光引导到物场。 照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。 其结果是改善了物场照明的均匀性的照明系统。

公开(公告)号：US20110149261A1

公开(公告)日：2011-06-23

申请号：US12968781

申请日：2010-12-15

申请人： Ingo Saenger ,  Damian Fiolka

发明人： Ingo Saenger ,  Damian Fiolka

IPC分类号： G03B27/72 ,  G03B27/32

CPC分类号： G02B5/30 ,  G02B26/00 ,  G03F7/70566

摘要： An optical system, in particular of a microlithographic projection exposure apparatus, includes an optical system axis and a polarization-influencing optical arrangement, wherein said arrangement has a polarization-influencing optical element which includes an optically active material having an optical crystal axis and is of a thickness profile which varies in the direction of said optical crystal axis, and a position manipulator for manipulation of the position of said polarization-influencing optical element, wherein the polarization manipulator is adapted to cause rotation of the polarization-influencing optical element about an axis of rotation, wherein said axis of rotation is arranged at an angle of 90°±5° relative to the optical system axis.

摘要翻译： 特别是微光刻投影曝光装置的光学系统包括光学系统轴和偏振影响光学装置，其中所述装置具有偏振影响光学元件，其包括具有光学晶体轴的光学活性材料，并且具有 在所述光学晶体轴的方向上变化的厚度分布和用于操纵所述偏振影响光学元件的位置的位置操纵器，其中所述偏振操纵器适于引起偏振影响光学元件围绕轴的旋转 的旋转，其中所述旋转轴线相对于所述光学系统轴线以90°±5°的角度布置。