公开(公告)号：US07289181B2

公开(公告)日：2007-10-30

申请号：US11516155

申请日：2006-09-05

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G02F1/1343 ,  G02F1/136

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

摘要翻译： 形成适合于大尺寸屏幕的互连结构和像素结构。 反向线/电极形成在TFT基板上，对向线/电极由叠层结构膜制成，其中由铝或基本上含有铝的合金构成的层被高熔点金属膜覆盖，并且 覆盖层叠结构膜的透明导电膜。

公开(公告)号：US06903793B2

公开(公告)日：2005-06-07

申请号：US10936021

申请日：2004-09-07

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G09F9/30 ,  G02F1/133 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

摘要翻译： 形成适合于大尺寸屏幕的互连结构和像素结构。 反向线/电极形成在TFT基板上，对向线/电极由叠层结构膜制成，其中由铝或基本上含有铝的合金构成的层被高熔点金属膜覆盖，并且 覆盖层叠结构膜的透明导电膜。

公开(公告)号：US20050206825A1

公开(公告)日：2005-09-22

申请号：US11139164

申请日：2005-05-26

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G09F9/30 ,  G02F1/133 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

摘要翻译： 形成适合于大尺寸屏幕的互连结构和像素结构。 反向线/电极形成在TFT基板上，对向线/电极由叠层结构膜制成，其中由铝或基本上含有铝的合金构成的层被高熔点金属膜覆盖，并且 覆盖层叠结构膜的透明导电膜。

公开(公告)号：US20070182905A1

公开(公告)日：2007-08-09

申请号：US11735790

申请日：2007-04-16

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G02F1/1343

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

摘要翻译： 形成适合于大尺寸屏幕的互连结构和像素结构。 反向线/电极形成在TFT基板上，对向线/电极由叠层结构膜制成，其中由铝或基本上含有铝的合金构成的层被高熔点金属膜覆盖，并且 覆盖层叠结构膜的透明导电膜。

公开(公告)号：US20070002252A1

公开(公告)日：2007-01-04

申请号：US11516155

申请日：2006-09-05

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G02F1/1343

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

公开(公告)号：US07113244B2

公开(公告)日：2006-09-26

申请号：US11139164

申请日：2005-05-26

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G02F1/1343 ,  G02F1/136

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

摘要翻译： 形成适合于大尺寸屏幕的互连结构和像素结构。 反向线/电极形成在TFT基板上，对向线/电极由叠层结构膜制成，其中由铝或基本上含有铝的合金构成的层被高熔点金属膜覆盖，并且 覆盖层叠结构膜的透明导电膜。

公开(公告)号：US06912035B2

公开(公告)日：2005-06-28

申请号：US09754232

申请日：2001-01-03

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G09F9/30 ,  G02F1/133 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

摘要翻译： 形成适合于大尺寸屏幕的互连结构和像素结构。 反向线/电极形成在TFT基板上，对向线/电极由叠层结构膜制成，其中由铝或基本上含有铝的合金构成的层被高熔点金属膜覆盖，并且 覆盖层叠结构膜的透明导电膜。

公开(公告)号：US20050030463A1

公开(公告)日：2005-02-10

申请号：US10936021

申请日：2004-09-07

申请人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

发明人： Toshiki Kaneko ,  Kazumi Fujii ,  Kikuo Ono

IPC分类号： G09F9/30 ,  G02F1/133 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/123 ,  G02F2203/01

摘要： An interconnecting structure and a pixel structure suited to large-sized screens are formed. A counter line/electrode is formed on a TFT substrate, and the counter line/electrode is made of a stacked structure film in which a layer made of aluminum or an alloy essentially containing aluminum is covered with a high-melting point metal film, and a transparent conductive film which covers the stacked structure film.

公开(公告)号：US06404473B1

公开(公告)日：2002-06-11

申请号：US09092078

申请日：1998-06-05

申请人： Toshiki Kaneko ,  Yuichi Hashimoto ,  Kikuo Ono ,  Kazuhiro Ohhara ,  Takahiro Ochiai ,  Masaru Takabatake ,  Kenichi Onisawa ,  Kenichi Cyahara

发明人： Toshiki Kaneko ,  Yuichi Hashimoto ,  Kikuo Ono ,  Kazuhiro Ohhara ,  Takahiro Ochiai ,  Masaru Takabatake ,  Kenichi Onisawa ,  Kenichi Cyahara

IPC分类号： G02F11343

CPC分类号： G02F1/136286 ,  G02F1/134363 ,  G02F1/136227

摘要： A liquid crystal display device comprising a wiring line of a laminated structure over an insulating substrate. The laminated structure includes a first layer made of a first metal layer, and a second layer formed over the first layer and made of a second metal layer having the same principal component as that of the first metal layer but a different added element and/or a different composition. The first layer has a side end face of a right-tapered shape, whereas the second layer has a side end face set at a right angle or counter-tapered with respect to the substrate face.

摘要翻译： 一种液晶显示装置，包括绝缘基板上的叠层结构的布线。 层叠结构包括由第一金属层制成的第一层和形成在第一层上并由具有与第一金属层相同的主要成分的第二金属层制成的第二层，但第二层具有不同的添加元素和/或 不同的组成。 第一层具有右锥形的侧端面，而第二层的侧端面相对于基板面设置成直角或相对锥度。

公开(公告)号：US20070159568A1

公开(公告)日：2007-07-12

申请号：US11522466

申请日：2006-09-18

申请人： Kikuo Ono ,  Yoshiaki Nakayoshi ,  Ryutaro Oke ,  Toshiki Kaneko

发明人： Kikuo Ono ,  Yoshiaki Nakayoshi ,  Ryutaro Oke ,  Toshiki Kaneko

IPC分类号： G02F1/136

CPC分类号： G02F1/13458 ,  G02F1/134363 ,  G02F1/136213 ,  G02F1/136227 ,  G02F2001/136236 ,  G02F2001/13629 ,  H01L27/1248 ,  H01L27/1255 ,  H01L27/1288

摘要： The present invention provides a novel photolithography processes using photoresist pattern having at least two areas which has different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithography processes required for whole of the fabrication process of the liquid crystal display device, and improve brightness of the liquid crystal display device.

摘要翻译： 本发明提供了一种使用具有至少两个区域的光致抗蚀剂图案的新型光刻工艺，所述至少两个区域具有彼此不同的厚度，用于具有反向交错和沟道蚀刻型薄膜晶体管的液晶显示装置的制造方法，减少了许多光刻 液晶显示装置整体制造工序所需的工序，提高液晶显示装置的亮度。