公开(公告)号：US20100080690A1

公开(公告)日：2010-04-01

申请号：US12568276

申请日：2009-09-28

申请人： Toshio Horie ,  Fumio Shimizu ,  Shintaro Igarashi ,  Hiroyuki Mori ,  Kenichi Suzuki ,  Yuji Yamamoto ,  Yoshiaki Nakano

发明人： Toshio Horie ,  Fumio Shimizu ,  Shintaro Igarashi ,  Hiroyuki Mori ,  Kenichi Suzuki ,  Yuji Yamamoto ,  Yoshiaki Nakano

IPC分类号： F03B13/00

CPC分类号： C23F13/06 ,  C23F13/16 ,  F04D13/0626 ,  F04D15/0077 ,  F04D29/026 ,  F05D2300/171 ,  F05D2300/173 ,  F05D2300/224 ,  F05D2300/228 ,  F05D2300/611

摘要： A hydraulic pump includes a housing including an inlet port, an outlet port, and a fluid chamber, a shaft fixed to the housing, a rotor including an impeller portion that rotates relative to the shaft, the impeller portion suctioning and discharging a fluid, a fixed portion provided at the housing and made of an aluminum alloy, the fixed portion securing the shaft, a short-circuit portion provided at the shaft and made of a stainless steel having a nitrided layer at a surface, the short-circuit portion being supplied with a protection current from the fixed portion by galvanically making contact with the fixed portion, and a support portion rotatably supporting the rotor and formed by extending from the short-circuit portion, an outer peripheral surface of the support portion being covered with an amorphous carbon film of which a main component is carbon and which includes silicon.

摘要翻译： 液压泵包括：壳体，其包括入口端口，出口端口和流体室;固定到壳体的轴;转子，包括相对于轴旋转的叶轮部分，叶轮部分抽吸和排出流体; 固定部，其设置在所述壳体上并且由铝合金制成，所述固定部分固定在所述轴上，短路部分设置在所述轴处，并且由表面具有氮化层的不锈钢制成，所述短路部分被供应 具有通过与固定部电流接触的来自固定部分的保护电流，以及支撑部分，其可旋转地支撑转子并且通过从短路部分延伸而形成，支撑部分的外周表面被无定形碳覆盖 其主要成分是碳并且包括硅的膜。

公开(公告)号：US20080188383A1

公开(公告)日：2008-08-07

申请号：US11720154

申请日：2005-11-24

申请人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

发明人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

IPC分类号： F16C33/20 ,  H05H1/24

CPC分类号： C23C16/26 ,  Y10T428/30

摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

摘要翻译： 当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。 当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp 2 SUB混合轨道的碳构成。 还公开了一种制备无定形碳膜的方法。

公开(公告)号：US07833626B2

公开(公告)日：2010-11-16

申请号：US11720154

申请日：2005-11-24

申请人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

发明人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

IPC分类号： B32B9/00 ,  H05H1/24

CPC分类号： C23C16/26 ,  Y10T428/30

摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

摘要翻译： 当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。 当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp2混合轨道的碳构成。 还公开了一种制备无定形碳膜的方法。

公开(公告)号：US20100200120A1

公开(公告)日：2010-08-12

申请号：US12656459

申请日：2010-01-29

申请人： Toshio Horie ,  Gaku Kitahara ,  Nobuaki Suzuki ,  Fumio Shimizu ,  Takao Kobayashi ,  Ken-ichi Suzuki ,  Shigeki Oshima

发明人： Toshio Horie ,  Gaku Kitahara ,  Nobuaki Suzuki ,  Fumio Shimizu ,  Takao Kobayashi ,  Ken-ichi Suzuki ,  Shigeki Oshima

IPC分类号： C23C8/24 ,  B32B9/00 ,  H01B1/02

CPC分类号： H01B1/02 ,  C23C18/165 ,  C23C18/1689 ,  C23C18/1696 ,  C23C18/36 ,  C23C30/00

摘要： A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg. C.

摘要翻译： 导电膜包括通过将包含Ti和/或Fe化合物的磷化物颗粒和P的原料颗粒附着到基材的表面而形成的磷化物颗粒涂布膜。 该导电膜表现出良好的耐腐蚀性导电性，并且由于包含磷化物粒子涂布膜，可以以低成本容易地形成。 耐腐蚀导电膜包括含有Ti，Fe和P作为必需碱性元素的含铁磷化钛层。 在基板表面具有这种耐腐蚀导电膜的耐腐蚀导电材料表现出良好的耐腐蚀性或导电性。 该耐腐蚀导电材料可以通过例如在Ti基材料基板的表面上形成Ni镀层的镀覆工序和对Ti系材料进行氮化处理的氮化工序 电镀步骤后的基板不大于880度。 C。

公开(公告)号：US08613807B2

公开(公告)日：2013-12-24

申请号：US12656459

申请日：2010-01-29

申请人： Toshio Horie ,  Gaku Kitahara ,  Nobuaki Suzuki ,  Fumio Shimizu ,  Takao Kobayashi ,  Ken-ichi Suzuki ,  Shigeki Oshima

发明人： Toshio Horie ,  Gaku Kitahara ,  Nobuaki Suzuki ,  Fumio Shimizu ,  Takao Kobayashi ,  Ken-ichi Suzuki ,  Shigeki Oshima

IPC分类号： C23C8/00 ,  B32B9/00 ,  H01B1/02

CPC分类号： H01B1/02 ,  C23C18/165 ,  C23C18/1689 ,  C23C18/1696 ,  C23C18/36 ,  C23C30/00

摘要： A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg. C.

摘要翻译： 导电膜包括通过将包含Ti和/或Fe化合物的磷化物颗粒和P的原料颗粒附着到基材的表面而形成的磷化物颗粒涂布膜。 该导电膜表现出良好的耐腐蚀性导电性，并且由于包含磷化物粒子涂布膜，可以以低成本容易地形成。 耐腐蚀导电膜包括含有Ti，Fe和P作为必需碱性元素的含铁磷化钛层。 在基板表面具有这种耐腐蚀导电膜的耐腐蚀导电材料表现出良好的耐腐蚀性或导电性。 该耐腐蚀导电材料可以通过例如在Ti基材料基板的表面上形成Ni镀层的镀覆工序和对Ti系材料进行氮化处理的氮化工序 电镀步骤后的基板不大于880度。 C。

公开(公告)号：US07368168B2

公开(公告)日：2008-05-06

申请号：US11115192

申请日：2005-04-27

申请人： Hiroyuki Mori ,  Fumio Shimizu ,  Hideo Tachikawa ,  Toshihide Ohmori ,  Hiroshi Moritani ,  Mamoru Tohyama ,  Yoshio Shimura ,  Shigeru Hotta ,  Takashi Iseki

发明人： Hiroyuki Mori ,  Fumio Shimizu ,  Hideo Tachikawa ,  Toshihide Ohmori ,  Hiroshi Moritani ,  Mamoru Tohyama ,  Yoshio Shimura ,  Shigeru Hotta ,  Takashi Iseki

IPC分类号： C23C16/26

CPC分类号： B32B9/00 ,  Y10T428/24479 ,  Y10T428/24628 ,  Y10T428/30

摘要： A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 μm or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.

摘要翻译： 在使用润滑剂的湿润条件下使用低摩擦滑动构件，并且包括具有表面的基板和形成在基板的表面上的非结晶硬碳膜，用于与配合构件可滑动地接触。 无定形硬碳膜包括含量为1原子％以上且20原子％以下的硅，20原子％以上至50原子％以下的氢，其余为碳和不可避免的杂质 ，当整体取为100原子％，表面粗糙度为0.8μm或更小时。 低摩擦滑动构件在其与配合构件之间表现出降低的摩擦系数，而不依赖于包含在润滑剂中的添加剂对无定形硬碳膜的吸附和反应。

公开(公告)号：US20050238877A1

公开(公告)日：2005-10-27

申请号：US11115192

申请日：2005-04-27

申请人： Hiroyuki Mori ,  Fumio Shimizu ,  Hideo Tachikawa ,  Toshihide Ohmori ,  Hiroshi Moritani ,  Mamoru Tohyama ,  Yoshio Shimura ,  Shigeru Hotta ,  Takashi Iseki

发明人： Hiroyuki Mori ,  Fumio Shimizu ,  Hideo Tachikawa ,  Toshihide Ohmori ,  Hiroshi Moritani ,  Mamoru Tohyama ,  Yoshio Shimura ,  Shigeru Hotta ,  Takashi Iseki

IPC分类号： C10M103/02 ,  B32B9/00 ,  C10M101/02 ,  C10M101/04 ,  C10N20/00 ,  C10N30/06 ,  C10N40/02 ,  C10N40/04 ,  C10N40/25

CPC分类号： B32B9/00 ,  Y10T428/24479 ,  Y10T428/24628 ,  Y10T428/30

摘要： A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 μm or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.

摘要翻译： 在使用润滑剂的湿润条件下使用低摩擦滑动构件，并且包括具有表面的基板和形成在基板的表面上的非结晶硬碳膜，用于与配合构件可滑动地接触。 无定形硬碳膜包括含量为1原子％以上且20原子％以下的硅，20原子％以上至50原子％以下的氢，其余为碳和不可避免的杂质 ，当整体取为100原子％，表面粗糙度为0.8μm或更小时。 低摩擦滑动构件在其与配合构件之间表现出降低的摩擦系数，而不依赖于包含在润滑剂中的添加剂对无定形硬碳膜的吸附和反应。

公开(公告)号：US5802716A

公开(公告)日：1998-09-08

申请号：US534611

申请日：1995-09-27

申请人： Akihisa Nishimura ,  Fumio Shimizu ,  Kenichi Suzuki

发明人： Akihisa Nishimura ,  Fumio Shimizu ,  Kenichi Suzuki

IPC分类号： B23K35/28 ,  B23K35/36 ,  F01L3/22 ,  B23P15/00

CPC分类号： B23K35/3605 ,  B23K35/282 ,  F01L3/22 ,  Y10T29/4927 ,  Y10T29/49314

摘要： A method for bonding valve seats for intake and exhaust valves to an engine cylinder head. Valve seats are brazed to an aluminum cylinder head using an Al--Zn type brazing material and a fluoride type flux. The brazing material contains 70 to 90 % by weight of Zn. The brazing is preferably carried out at a temperature of 470.degree. to 520.degree. C. To allow the brazing material and flux to be present between the cylinder head and each valve seat, the cylinder head contains U-grooves formed around the opening of each intake or exhaust port. The U-groove consists of an annular step formed along the opening of the intake or exhaust port and a bank extended along the inner circumference of the step. The valve seats are placed in the U-grooves, which are then filled with the brazing material and flux, to carry out brazing of the valve seats onto the cylinder head. After completion of the brazing, the banks are removed to complete bonding of the valve seats to the cylinder head. In another method, a valve seat is directly bonded to a cylinder head by applying a fluoride type flux on the valve seat.

摘要翻译： 一种用于将进气和排气阀的阀座结合到发动机气缸盖的方法。 使用Al-Zn型钎焊材料和氟化物型焊剂将阀座钎焊到铝制气缸盖上。 该钎料含有70〜90重量％的Zn。 钎焊优选在470℃至520℃的温度下进行。为了使钎焊材料和焊剂存在于气缸盖和每个阀座之间，气缸盖包含围绕每个进气口的开口形成的U形槽 或排气口。 U形槽由沿进气或排气口的开口形成的环形台阶和沿着台阶的内圆周延伸的堤岸组成。 阀座放置在U形槽中，然后用钎焊材料和焊剂填充，以便将阀座钎焊到气缸盖上。 在钎焊完成之后，移除堤以完成阀座与气缸盖的接合。 在另一种方法中，通过在阀座上施加氟化物型助焊剂，将阀座直接接合到气缸盖。

公开(公告)号：US5256316A

公开(公告)日：1993-10-26

申请号：US799313

申请日：1991-11-27

申请人： Kenichi Suzuki ,  Masaki Kajino ,  Kazuyoshi Ogawa ,  Takashi Asano ,  Mineo Ogino ,  Hideo Aihara ,  Fumio Shimizu ,  Masazumu Onishi ,  Yasuyuki Suzuki

发明人： Kenichi Suzuki ,  Masaki Kajino ,  Kazuyoshi Ogawa ,  Takashi Asano ,  Mineo Ogino ,  Hideo Aihara ,  Fumio Shimizu ,  Masazumu Onishi ,  Yasuyuki Suzuki

IPC分类号： C23F3/06 ,  H01L21/00

CPC分类号： C23F3/06

摘要： A brightening chemical polishing solution for a hardened steel article (e.g., a carburized and quenched gear) comprises hydrofluoric acid having a molar concentration of from 0.2 to 2 mol/l, hydrogen peroxide having a molar concentration of from 0.4 to 4 mol/l, and water, a molar ratio of the hydrofluoric acid to the hydrogen peroxide being from 1:1.5 to 1:2.8. The steel article is quench hardened and is chemically polished in the solution. A shot-peening is additionally performed, prior to the polishing.

公开(公告)号：US5171377A

公开(公告)日：1992-12-15

申请号：US620028

申请日：1990-11-30

申请人： Fumio Shimizu ,  Fusayoshi Miura ,  Kenichi Suzuki ,  Yoshihiro Kinoshita

发明人： Fumio Shimizu ,  Fusayoshi Miura ,  Kenichi Suzuki ,  Yoshihiro Kinoshita

IPC分类号： B23K35/363 ,  B23K35/36

CPC分类号： B23K35/3605 ,  B23K35/361

摘要： A brazing flux comprises cesium fluoride, aluminum fluoride, and crystalline aluminum hydroxide or aluminum oxide or both which form a crystalline compound having the following composition and containing cesium in the form of a complex salt:x.multidot.CsF-y.multidot.AlF.sub.3 -1/2.multidot.z.multidot.[Al.sub.2 O.sub.3 .multidot.nH.sub.2 O and/or Al.sub.2 O.sub.3 ]where x+y+z=100, x/y.ltoreq.3, 42.ltoreq.x.ltoreq.66, and z.gtoreq.2in terms of mol %. The crystalline compound has a melting point of 440.degree. to 580.degree. C.The brazing flux is non-corrosive and safe to use, and well suited for a brazing aluminum materials with a high magnesium content and also for torch brazing.

摘要翻译： 钎焊助熔剂包括氟化铯，氟化铝和结晶氢氧化铝或氧化铝或两者，其形成具有以下组成的结晶化合物，并且含有复合盐形式的铯：xxCsF-yxAlF3-1 / 2xzx [Al2O3·xH2O和/ 或Al 2 O 3]，其中x + y + z = 100，x / y = 3，42 / = 2。 结晶化合物的熔点为440〜580℃。钎焊焊剂无腐蚀性，使用安全，非常适用于镁含量高的钎焊铝材料，也适用于焊炬钎焊。