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公开(公告)号：US5379348A
公开(公告)日：1995-01-03
申请号：US40852
申请日：1993-03-31
IPC分类号： G01B11/24 , G01N21/88 , G01N21/93 , G01N21/956 , G03F1/26 , G03F1/29 , G03F1/30 , G03F1/32 , G03F1/34 , G03F1/84 , G06T7/00 , H01L21/027 , H01L21/66 , G06K9/00 , G01N21/00 , H04N7/00
CPC分类号： G06T7/001 , G01N21/956 , G06T2207/10056 , G06T2207/30148 , H01L22/12 , H01L2924/0002
摘要： A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed together. Measurement data output from a sensor circuit for generating measurement pattern data by inspecting measurement patterns corresponding to two types of patterns formed on the object by radiating light on the object, and two identifiable design data stored in a magnetic disk unit in advance, i.e., chromium pattern design data used to form a chromium pattern and phase shift pattern design data used to form a phase shift pattern, are read out by a bit pattern generator for performing development processing. The two types of bit data obtained by the bit pattern generator are synthesized according to the same coordinate definition. The synthesized design data is compared with the measurement data by a comparator. As a result, the presence/absence of pattern defects in the object can be determined.
摘要翻译： 图案缺陷检查系统检查作为要检查的对象的光掩模中是否存在图案缺陷，其中形成铬图案和相移图案。 从传感器电路输出的测量数据，用于通过在物体上照射光来检查与形成在物体上的两种图案相对应的测量图案，以及预先存储在磁盘单元中的两个可识别的设计数据来产生测量图案数据，即铬 用于形成铬图案的图案设计数据和用于形成相移图案的相移图案设计数据由用于进行显影处理的位图发生器读出。 根据相同的坐标定义来合成由位图生成器获得的两种位数据。 将合成的设计数据与比较器的测量数据进行比较。 结果，可以确定对象中的图案缺陷的存在/不存在。
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公开(公告)号：US07421109B2
公开(公告)日：2008-09-02
申请号：US10642760
申请日：2003-08-19
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
摘要翻译： 一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案 使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定 存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同 成像装置。
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公开(公告)号：US20080166054A1
公开(公告)日：2008-07-10
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/46
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。
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公开(公告)号：US5960106A
公开(公告)日：1999-09-28
申请号：US413704
申请日：1995-03-30
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , G06T1/00 , G06T7/00 , H01L21/027 , G06K9/00
CPC分类号： G06T7/0006 , G06T2207/30148
摘要： In a method of inspecting a sample on which a pattern relating to fabrication of a semiconductor device is formed, there are provided a light radiation unit, an acquiring unit, a storage unit, a template, a calculation unit, a correction unit, a defect detection unit and an output unit. Pinhole shape data to be detected of the pattern is stored in the template. The calculation unit calculates the degree of coincidence between the pinhole shape data stored in the template and the measured image data stored in the storage unit in units of a predetermined amount of data. The correction unit corrects a portion of the measured image data corresponding to a value of the degree of coincidence exceeding a second predetermined value in units of the predetermined amount of data, when the degree of coincidence obtained by the calculation unit has exceeded a first predetermined value, thereby correcting the portion of the measured image data including the detected pinhole. The defect detection unit detects a defect in the pattern on the basis of the corrected measured image data portion including the pinhole, which is obtained by the correcting unit, and the measured image data.
摘要翻译： 在形成有与半导体器件的制造有关的图案的样品的检查方法中，设置有光照单元，获取单元，存储单元，模板，计算单元，校正单元，缺陷 检测单元和输出单元。 要检测的图案的针孔形状数据存储在模板中。 计算单元以预定量的数据为单位计算存储在模板中的针孔形状数据与存储在存储单元中的测量图像数据之间的一致度。 当由计算单元获得的一致度已经超过第一预定值时，校正单元以与预定数据量为单位对应的符合度超过第二预定值的值的部分测量图像数据进行校正 从而校正包括检测到的针孔的测量图像数据的部分。 缺陷检测单元基于由校正单元获得的包括针孔的校正的测量图像数据部分和测量的图像数据来检测图案中的缺陷。
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5.发明授权Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof 失效检查形成在缺陷的样品上的图案的方法及其装置
公开(公告)号：US5744381A
公开(公告)日：1998-04-28
申请号：US614063
申请日：1996-03-12
申请人： Mitsuo Tabata , Toru Tojo , Toshiyuki Watanabe , Hideo Tsuchiya
发明人： Mitsuo Tabata , Toru Tojo , Toshiyuki Watanabe , Hideo Tsuchiya
CPC分类号： G03F1/84 , G01N21/95607 , H01L22/12
摘要： A pattern defect inspection apparatus comprises a light irradiating portion, a light receive element, a light receive element amplifier, a preparation portion for preparing multi-valued design pattern image data, an offset adjusting portion, a gain adjusting portion, and an inspecting portion. The offset adjusting portion adjusts the offset of the light receive element amplifier such that measurement data of a translucent portion of a pattern on a sample surface corresponds to design pattern image data corresponding to the translucent portion, regarding the translucent portion as a non-transparent portion. The gain adjusting portion adjusts the gain of the light receive element amplifier such that measurement data of a transparent portion of the pattern on the sample surface corresponds to design pattern image data corresponding to the transparent portion.
摘要翻译： 图案缺陷检查装置包括光照射部分，光接收元件，光接收元件放大器，用于制备多值设计图案图像数据的准备部分，偏移调整部分，增益调节部分和检查部分。 偏移调整部分调节光接收元件放大器的偏移，使得样本表面上的图案的透光部分的测量数据对应于与半透明部分对应的设计图案图像数据，关于作为不透明部分的半透明部分 。 增益调整部分调节光接收元件放大器的增益，使得样品表面上的图案的透明部分的测量数据对应于对应于透明部分的设计图案图像数据。
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公开(公告)号：US07415149B2
公开(公告)日：2008-08-19
申请号：US11674025
申请日：2007-02-12
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。
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公开(公告)号：US07551767B2
公开(公告)日：2009-06-23
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动地取出模具数据的检查区域， 对比方法。
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公开(公告)号：US20070127806A1
公开(公告)日：2007-06-07
申请号：US11674025
申请日：2007-02-12
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。
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公开(公告)号：US5404410A
公开(公告)日：1995-04-04
申请号：US180813
申请日：1994-01-10
申请人： Toru Tojo , Hideo Tsuchiya , Kyoji Yamashita , Mitsuo Tabata , Ryoichi Yoshikawa
发明人： Toru Tojo , Hideo Tsuchiya , Kyoji Yamashita , Mitsuo Tabata , Ryoichi Yoshikawa
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern defect inspection apparatus according to this invention comprises an irradiation circuit for irradiating a substrate on which a given pattern is drawn, a detector circuit for detecting said irradiated pattern on said substrate, a bit pattern generating circuit for quantizing and generating previously given design data by processing said design data based on specified figure information to obtain bit pattern data composed of a finite number of pixels, and a comparator circuit for detecting defects on said substrate by comparing the detected data from said detecting means with the data from said bit pattern generating means, wherein the bit pattern generating circuit has an additional parameter conditioner for setting the dimension of each pixel to be quantized into said bit pattern data to the desired value.
摘要翻译： 根据本发明的图案缺陷检查装置包括用于照射给定图案的基板的照射电路，用于检测所述基板上的所述照射图案的检测器电路，用于量化和生成先前给定的设计数据的位图生成电路 通过基于指定的图形信息处理所述设计数据以获得由有限数量的像素组成的位模式数据;以及比较器电路，用于通过将来自所述检测装置的检测数据与来自所述位图形生成的数据进行比较来检测所述衬底上的缺陷 装置，其中位模式产生电路具有附加参数调节器，用于将要量化的每个像素的尺寸设置为所述位模式数据为期望值。
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10.发明授权公开(公告)号：US08355044B2
公开(公告)日：2013-01-15
申请号：US12432182
申请日：2009-04-29
申请人： Hideo Tsuchiya , Toshiyuki Watanabe
发明人： Hideo Tsuchiya , Toshiyuki Watanabe
IPC分类号： H04N9/47
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： The present invention provides a reticle defect inspection method and a reticle defect inspection apparatus capable of calibrating the offset and gain of a sensor amplifier using a product reticle even though black and white regions each sufficiently wider than a TDI sensor imaging area do not exist in the product reticle. An output of each pixel of the TDI sensor is amplified by the sensor amplifier. A bottom value of the amplified amount-of-light signal of each pixel is stored by bottom value storing means of offset/gain calibrating means, and a peak value thereof is stored by peak value storing means. The offset of each pixel is calculated by offset calculating means based on the bottom value of each pixel. The gain of each pixel is calculated by gain calculating means based on the offset of each pixel and the peak value of each pixel. The calculated offset and gain of each pixel are stored in a register and thereby the offset and gain of the sensor amplifier are calibrated.
摘要翻译： 本发明提供了一种掩模版缺陷检查方法和掩模版缺陷检查装置，其能够使用产品掩模版来校准传感器放大器的偏移和增益，即使在TDI传感器成像区域中的每个都足够宽的黑色和白色区域不存在于 产品掩模版。 TDI传感器的每个像素的输出由传感器放大器放大。 每个像素的放大光量信号的底值由偏移/增益校准装置的底值存储装置存储，其峰值由峰值存储装置存储。 通过基于每个像素的底部值的偏移计算装置来计算每个像素的偏移。 基于每个像素的偏移和每个像素的峰值的增益计算装置计算每个像素的增益。 每个像素的计算偏移和增益都存储在寄存器中，从而校准传感器放大器的偏移和增益。
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