公开(公告)号：US08743534B2

公开(公告)日：2014-06-03

申请号：US13369465

申请日：2012-02-09

申请人： Tsuyoshi Okumura

发明人： Tsuyoshi Okumura

IPC分类号： G06F1/16

CPC分类号： H05K5/02 ,  G02F2001/133314

摘要： The present invention provides a resin chassis base that can correspond to for various components and components with various sizes by providing a plurality of sets of mounting holes thereon. The present invention provides a resin chassis base that fixes an electric substrate, and is mounted to a component provided in an electric apparatus, the resin chassis base having formed thereon the plurality of sets of mounting holes in order to be screwed to various components and/or components with various sizes. The resin chassis base is screwed by use of any one of the plurality of sets of the mounting holes formed on the resin chassis base.

摘要翻译： 本发明通过在其上设置多组安装孔来提供可以对应于各种尺寸的各种部件和部件的树脂底架。 本发明提供一种固定电气基板的树脂底座，并且安装在设置在电气设备中的部件上，树脂底座上形成有多组安装孔，以便拧入各种部件和/ 或各种尺寸的组件。 通过使用形成在树脂底座上的多组安装孔中的任何一个来旋转树脂底架。

公开(公告)号：US08254623B2

公开(公告)日：2012-08-28

申请号：US12765200

申请日：2010-04-22

申请人： Tsuyoshi Okumura

发明人： Tsuyoshi Okumura

IPC分类号： H04R1/02

CPC分类号： H04R1/025 ,  H04N5/642 ,  H04R1/345 ,  H04R2499/15

摘要： An image display device includes a housing including a front cabinet and a back cabinet. Inside the housing, arranged are a flat display panel, a speaker which emits voice forward, and a circuit board which displays an image on the flat display panel and transmits an audio signal to the speaker. Here, the flat display panel is attached to the front cabinet while the speaker and the circuit board are attached to the back cabinet. A sound emitting hole through which an acoustic wave from the speaker should pass is formed in at least a part of a region surrounding a display screen of the flat display panel on a front surface of the front cabinet, and the speaker has such a posture that a sound emitting surface thereof is inclined with respect to the display screen of the flat display panel and faces outside of the display screen.

摘要翻译： 一种图像显示装置，包括：外壳，包括前机柜和后机柜。 在壳体内部，布置有平面显示面板，向前发出声音的扬声器，以及在平面显示面板上显示图像并将音频信号发送到扬声器的电路板。 这里，平板显示面板安装在前机壳上，而扬声器和电路板安装在后机柜上。 扬声器的前表面上的平面显示面板的显示屏周围的区域的至少一部分上形成有来自扬声器的声波通过的声音发射孔，并且扬声器具有这样的姿势： 其声音发射表面相对于平面显示面板的显示屏倾斜并且面向显示屏幕的外部。

公开(公告)号：US20100190116A1

公开(公告)日：2010-07-29

申请号：US12754872

申请日：2010-04-06

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： G03F7/20 ,  B05D3/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

公开(公告)号：US20070226925A1

公开(公告)日：2007-10-04

申请号：US11694078

申请日：2007-03-30

申请人： Nobuyasu Hiraoka ,  Tsuyoshi Okumura ,  Akiyoshi Nakano

发明人： Nobuyasu Hiraoka ,  Tsuyoshi Okumura ,  Akiyoshi Nakano

IPC分类号： B08B1/04

CPC分类号： B08B1/04 ,  H01L21/02087 ,  H01L21/67046

摘要： A substrate treatment apparatus of the present invention includes a substrate holding mechanism for holding a substrate, a brush made of an elastically deformable material and having a cleaning surface intersecting a parallel direction along one surface of the substrate held by the substrate holding mechanism, a brush moving mechanism for moving the brush with respect to the substrate held by the substrate holding mechanism, a control unit for controlling the brush moving mechanism so that the cleaning surface is made to contact with the peripheral end face of the substrate held by the substrate holding mechanism, and a pushing pressure holding mechanism for holding the pushing pressure of the brush to the peripheral end face of the substrate in the parallel direction at a preset pushing pressure.

摘要翻译： 本发明的基板处理装置包括：保持基板的基板保持机构，由弹性变形材料制成的刷子，沿着平行方向与基板保持机构保持的基板的一个表面相交的清洁表面;刷子 移动机构，用于相对于由基板保持机构保持的基板移动刷子;控制单元，用于控制刷子移动机构，使得清洁表面与由基板保持机构保持的基板的周边端面接触; 以及推压保持机构，用于在预先设定的推压压力下将刷子的推压保持在平行方向上的基板周面端面。

公开(公告)号：US20060147201A1

公开(公告)日：2006-07-06

申请号：US11294877

申请日：2005-12-06

申请人： Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Koji Kaneyama ,  Tsuyoshi Okumura

发明人： Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Koji Kaneyama ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.

摘要翻译： 接口传送机构在将基板传送到曝光装置期间采用上手，并且在已经从曝光装置执行的基板的传送期间使用下手。 第五中央机器人在通过曝光装置进行曝光处理之后的基板传送期间使用下手，并且在从干燥处理组进行的干燥处理之后的基板的输送过程中采用上手。 也就是说，上面用于输送没有附着液体的基板，并且在曝光处理之后使用下手来输送附着有液体的基板。

公开(公告)号：US20060098979A1

公开(公告)日：2006-05-11

申请号：US11273465

申请日：2005-11-10

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

公开(公告)号：US06726728B2

公开(公告)日：2004-04-27

申请号：US10049151

申请日：2002-02-27

申请人： Tsuyoshi Okumura ,  Hiroyuki Miyazaki ,  Yoshitaka Nakagawa ,  Hajime Tazumi

发明人： Tsuyoshi Okumura ,  Hiroyuki Miyazaki ,  Yoshitaka Nakagawa ,  Hajime Tazumi

IPC分类号： F16C3332

CPC分类号： F16C19/06 ,  F16C33/62 ,  F16C33/64

摘要： A rolling bearing such as a rolling bearing for an alternator of an automobile, the life period of which is prevented from being shortened due to the temporal reduction of a radial internal clearance even in a high temperature environment. The rolling bearing includes a plurality of rolling elements rotatably arranged between an inner race and an outer race, and at least the inner race and the outer race are made of a steel material. An austenite residual rate of the inner race is smaller than an austenite residual rate of the outer race. The amount of dimensional expansion of the outer race due to the martensite transformation of residual austenite is larger than that of the inner race, so that the occurrence of clearance loss is suppressed even when dimensional expansion of the rolling elements occurs.

摘要翻译： 一种滚动轴承，例如用于汽车的交流发电机的滚动轴承，即使在高温环境中，由于径向内部游隙也随之减少，其寿命被缩短。 滚动轴承包括可旋转地布置在内座圈和外座圈之间的多个滚动元件，并且至少内座圈和外座圈由钢材制成。 内圈的奥氏体残留率小于外圈的奥氏体残留率。 由于残留奥氏体的马氏体相变导致的外圈的尺寸膨胀量大于内圈的尺寸膨胀量，所以即使发生滚动体的尺寸膨胀，也能够抑制间隙损失的发生。

公开(公告)号：US08496761B2

公开(公告)日：2013-07-30

申请号：US12754872

申请日：2010-04-06

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： B08B3/00 ,  H01L21/31 ,  G03F7/00 ,  G03F1/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

公开(公告)号：US08480305B2

公开(公告)日：2013-07-09

申请号：US13322693

申请日：2010-06-21

申请人： Masaki Maeda ,  Tsuyoshi Okumura ,  Hiroshi Yano

发明人： Masaki Maeda ,  Tsuyoshi Okumura ,  Hiroshi Yano

IPC分类号： F16C33/38

CPC分类号： F16C33/418 ,  F16C19/163 ,  F16C33/416 ,  F16C2240/44 ,  F16C2240/80

摘要： A cage has a ring portion, and a plurality of column portions that protrude from the ring portion, that are arranged in the circumference direction. Each column portion has a column portion radially inward section that forms a bearing-radial-direction inward side portion, and a column portion radially outward section that is connected to the radially inward section at its radially outer end position, so as to protrude on both sides in the circumferential direction from the radially inward section. A connection position at which the radially outward section is connected to the radially inward section is adjusted to a position radially outward of a pitch circle position of the plurality of the balls that are held in the respective pockets. Thus, the thickness of the radially inward section at the connection position is larger than the thickness of the radially inward section at the pitch circle position.

摘要翻译： 保持架具有环形部分，以及沿圆周方向布置的从环形部分突出的多个柱部分。 每个列部分具有形成轴承 - 径向内侧部分的柱部分径向向内部分，以及在其径向外端位置处连接到径向向内部分的柱部径向外侧部分，以便在两个 从径向向内的部分在圆周方向上。 将径向向外部分连接到径向向内部分的连接位置被调节到保持在各个口袋中的多个球的节圆位置的径向外侧的位置。 因此，连接位置处的径向向内部分的厚度大于节圆位置处的径向向内部分的厚度。

公开(公告)号：US08034190B2

公开(公告)日：2011-10-11

申请号：US12719788

申请日：2010-03-08

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kasuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kasuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： B08B3/00 ,  G03F7/00 ,  H01L21/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。