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    Substrate processing apparatus and substrate processing method
    1.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号：US08941809B2

    公开(公告)日：2015-01-27

    申请号：US12644700

    申请日：2009-12-22

    申请人： Masashi Kanaoka

    发明人： Masashi Kanaoka

    IPC分类号： G03B27/42 ,  H01L21/67

    CPC分类号： H01L21/67288

    摘要： A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes first and second inspection units. The first inspection unit inspects the state of the substrate before exposure processing, and the second inspection unit inspects the state of the substrate after exposure processing.

    摘要翻译： 基板处理装置包括分度块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 接口块包括第一和第二检查单元。 第一检查单元在曝光处理之前检查基板的状态，并且第二检查单元在曝光处理之后检查基板的状态。

    SUBSTRATE PROCESSING APPARATUS
    4.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 有权
    基板加工设备

    公开(公告)号：US20100239986A1

    公开(公告)日：2010-09-23

    申请号：US12813251

    申请日：2010-06-10

    申请人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda

    发明人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda

    IPC分类号： G03F7/16 ,  B05D3/02

    CPC分类号： G03F7/70991 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178

    摘要： The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.

    摘要翻译： 在清洁/干燥处理组中的清洁/干燥处理单元中的基板的清洁和干燥处理到在热处理组中的曝光后烘烤（PEB）的后处理组中的曝光后烘烤处理的传送过程， 干燥处理块如下所述。 首先，在清洗/干燥处理组中对曝光处理后的基板进行清洗干燥处理后，第六中央机器人从清洗/干燥处理组中取出基板，将该基板搬送到热处理组中 - 在清洁/干燥处理块中进行曝光烘烤。

    SUBSTRATE PROCESSING APPARATUS
    7.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 有权
    基板加工设备

    公开(公告)号：US20100285225A1

    公开(公告)日：2010-11-11

    申请号：US12842485

    申请日：2010-07-23

    申请人： Koji Kaneyama ,  Kazuhito Shigemori ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Shuichi Yasuda

    发明人： Koji Kaneyama ,  Kazuhito Shigemori ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Shuichi Yasuda

    IPC分类号： B05D3/04

    CPC分类号： H01L21/67051 ,  H01L21/67225

    摘要： A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.

    摘要翻译： 基板处理装置包括接口块。 曝光装置设置在接口块附近。 界面块包括第一和第二清洁/干燥处理单元。 在第二清洗/干燥处理单元中进行曝光处理之后进行清洗和干燥处理之后，在第一清洗/干燥处理单元中对基板W进行曝光处理之前的清洗和干燥处理。

    SUBSTRATE PROCESSING APPARATUS
    9.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号：US20100136257A1

    公开(公告)日：2010-06-03

    申请号：US12698862

    申请日：2010-02-02

    申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    IPC分类号： B05D3/06

    CPC分类号： G03F7/30 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67225

    摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.

    摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括在所述曝光装置的曝光处理之前由所述第一处理单元在所述基板上形成感光膜，以及 在形成所述感光膜之后并且在所述曝光处理之前，通过在所述第二处理单元中向所述基板供应洗涤液体来向所述基板施加洗涤处理。 该方法还包括在所述第二处理单元的洗涤处理之后并且在曝光处理之前对所述第二处理单元中的基板进行干燥处理，并且在曝光处理之后，通过所述第三处理单元对基板进行显影处理。 将干燥处理应用于基板包括向供给洗涤液的基板供给惰性气体的工序。

    SUBSTRATE PROCESSING APPARATUS
    10.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 有权
    基板加工设备

    公开(公告)号：US20100075054A1

    公开(公告)日：2010-03-25

    申请号：US12628120

    申请日：2009-11-30

    申请人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

    发明人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

    IPC分类号： B05D3/00

    CPC分类号： G03F7/70925 ,  G03F7/168 ,  G03F7/7075 ,  G03F7/70916 ,  G03F7/70991 ,  G11B5/8404 ,  G11B7/261 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902

    摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

    摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及 一个接口块。 曝光装置被布置成与基板处理装置中的界面块相邻。 曝光装置通过浸渍方法使基板进行曝光处理。 在清洁/干燥处理块的边缘清洁单元中，刷子抵靠旋转基板的一端，从而清洁曝光处理之前的基板的边缘。 此时，校正基板被清洁的位置。