公开(公告)号：US10586712B2

公开(公告)日：2020-03-10

申请号：US15755396

申请日：2016-08-17

Applicant: ULVAC, INC.

Inventor： Takashi Kageyama ,  Tetsuya Shimada ,  Koji Takahashi ,  Yuu Nakamuta ,  Manabu Harada

IPC: H01L21/32 ,  H01L23/29 ,  H01L23/31 ,  H01L21/56 ,  H01L21/673 ,  H01L21/02 ,  H01L23/00

Abstract: According to a mode of the present invention, a method of manufacturing an electronic component includes: preparing a component main-body 110 including a first surface having an electrode-formed region having a plurality of bump electrodes 103, a second surface opposite to the first surface, and side peripheral surfaces connecting the first surface and the second surface; forming a mask section M1 on at least a peripheral portion of the first surface, the mask section surrounding the electrode-formed region, a height of the mask section being equal to or more than a height of the plurality of bump electrodes; bonding the mask section of the first surface to an adhesive layer 30 on a holder for holding a component; forming a protective film 105 on the component main-body, the protective film covering the second surface and the side peripheral surfaces; and removing the mask section M1 from the first surface.

公开(公告)号：US08764902B2

公开(公告)日：2014-07-01

申请号：US13738278

申请日：2013-01-10

Applicant: ULVAC, Inc.

Inventor： Yasumasa Suzuki ,  Kenji Kimura ,  Kazuya Tsukagoshi ,  Takashi Kageyama

IPC: C23C16/455 ,  C23C16/52 ,  H01L21/3205 ,  H01L21/36

CPC classification number: C23C16/45572 ,  C23C16/303 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/463 ,  H01L21/0254 ,  H01L21/0262

Abstract: A film-forming apparatus capable of discharging a feedstock gas and a reactive gas to an inner side of the vacuum chamber by more effectively cooling the gases without mixing them in comparison with the conventional art. A discharge plate having a first face exposed inside the vacuum chamber is provided with a plurality of feedstock gas introduction holes and a plurality of reactive gas introduction holes penetrating the discharge plate. A plurality of grooves having the feedstock gas introduction holes located on the bottom face are formed in the second face opposite to the first face of the discharge plate, a top plate that covers the groove is arranged over the second face, and the feedstock gas through-hole formed in the top plate and the feedstock gas introduction hole are connected to each other with the first auxiliary pipe.

Abstract translation: 一种成膜装置，与传统技术相比，能够通过更有效地冷却气体而不混合它们，从而将原料气体和反应气体排出到真空室的内侧。 具有暴露在真空室内的第一面的放电板设置有多个原料气体导入孔和贯穿放电板的多个反应气体导入孔。 在与放电板的第一面相对的第二面上形成有具有位于底面上的原料气体导入孔的多个槽，在第二面上配置有覆盖槽的顶板，原料气体通过 在顶板和原料气体导入孔中形成的孔与第一辅助管相互连接。