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公开(公告)号:US10211511B2
公开(公告)日:2019-02-19
申请号:US15537064
申请日:2015-01-23
Inventor: Kyung Rok Kim , Min Woo Ryu , Kwan Sung Kim
IPC: H01L29/788 , H01Q1/22 , G01R33/00 , G01J5/20 , H01L27/14 , H01L29/417 , H01L29/423 , H01L29/78 , G01R33/06 , H01L29/06
Abstract: The purpose of the present invention is to provide a terahertz detector using a field-effect transistor capable of implementing high sensitivity by exhibiting an asymmetric characteristic only with a form of a source/drain and a gate. To this end, the present invention relates to the terahertz detector using a field-effect transistor comprising: a source formed by being doped on a portion of a silicon base; a channel formed so as to encompass the source on a plane; a drain formed outside the channel; a dielectric layer formed on an upper end of the source, the channel and the drain; and a gate located at an upper end of the dielectric layer, wherein when terahertz electromagnetic waves are applied through the gate, the intensity of the electromagnetic waves is detected using a current/voltage outputted from the source and the drain.
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公开(公告)号:US20220416074A1
公开(公告)日:2022-12-29
申请号:US17675628
申请日:2022-02-18
Inventor: Kyung Rok Kim , Min Woo Ryu , E San Jang , Ramesh Patel , Sang Hyo Ahn
Abstract: A field-effect transistor for terahertz wave detection using a gate as an antenna includes a silicon substrate including a source and a drain formed outside a channel region surrounding the source, and a gate formed to be spaced apart from the silicon substrate and correspond to the channel region, on a dielectric layer formed on a surface of the silicon substrate, in which the drain has a width determined based on a first performance parameter associated with a terahertz wave reception rate of the field-effect transistor and the channel region has a width determined based on a second performance parameter associated with detection of a terahertz wave to be received by the field-effect transistor.
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公开(公告)号:US11784249B2
公开(公告)日:2023-10-10
申请号:US17636666
申请日:2021-09-07
Inventor: Kyung Rok Kim , E San Jang , Min Woo Ryu , Sang Hyo Ahn
CPC classification number: H01L29/7831 , H01L23/66 , H01L29/0607 , H01L29/0847
Abstract: An antenna device according to an example embodiment includes a silicon substrate of first type doping, at least two first doped regions formed by second type doping different from the first type doping, a second doped region formed by the second type doping outside a channel region surrounding the at least two first doped regions, and at least two gates disposed on a dielectric layer. In the antenna device, a resonant frequency is adjusted according to an external voltage individually applied to the at least two gates, and polarization information of a terahertz (THz) light source is obtained based on a pattern and an amount of an electric field measured at the at least two gates.
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公开(公告)号:US20220271160A1
公开(公告)日:2022-08-25
申请号:US17636666
申请日:2021-09-07
Inventor: Kyung Rok Kim , E San Jang , Min Woo Ryu , Sang Hyo Ahn
Abstract: An antenna device according to an example embodiment includes a silicon substrate of first type doping, at least two first doped regions formed by second type doping different from the first type doping, a second doped region formed by the second type doping outside a channel region surrounding the at least two first doped regions, and at least two gates disposed on a dielectric layer. In the antenna device, a resonant frequency is adjusted according to an external voltage individually applied to the at least two gates, and polarization information of a terahertz (THz) light source is obtained based on a pattern and an amount of an electric field measured at the at least two gates.
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公开(公告)号:US10020370B2
公开(公告)日:2018-07-10
申请号:US15561940
申请日:2015-12-31
Inventor: Kyung Rok Kim , Min Woo Ryu , Sang Hyo Ahn
IPC: H01L31/112 , H01L29/417 , H01L29/423 , H01L29/10 , H01L29/78 , H01L29/08
CPC classification number: H01L29/41758 , H01L29/0847 , H01L29/1033 , H01L29/42376 , H01L29/4238 , H01L29/78 , H01L31/1126 , H01Q1/2283
Abstract: A ring-type FET may include a silicon base, a source formed on a portion of the silicon base through doping, a channel formed to encompass the source on a plane, a drain formed outside the channel, a dielectric layer formed on the source, the channel and the drain, and a gate provided on the dielectric layer, wherein a center of the source is spaced apart from a center of the channel, and the gate is formed of a metal material, disposed above the channel and configured to cover an upper face of the channel and overlap a portion of the source and a portion of the drain.
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