公开(公告)号：US10145006B2

公开(公告)日：2018-12-04

申请号：US15112213

申请日：2015-01-08

Applicant: United Technologies Corporation

Inventor： Mladen F. Trubelja ,  David A. Litton ,  Joseph A. DePalma ,  James W. Neal ,  Michael Maloney ,  Russell A. Beers ,  Brian T. Hazel ,  Glenn A. Cotnoir

IPC: C23C14/54 ,  C23C14/08 ,  C23C14/30 ,  C23C14/50 ,  F01D15/10 ,  C23C14/24 ,  F01D9/04

Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

公开(公告)号：US20160333465A1

公开(公告)日：2016-11-17

申请号：US15112213

申请日：2015-01-08

Applicant: UNITED TECHNOLOGIES CORPORATION

Inventor： Mladen F. Trubelja ,  David A. Litton ,  Joseph A. DePalma ,  James W. Neal ,  Michael Maloney ,  Russell A. Beers ,  Brian T. Hazel ,  Glenn A. Cotnoir

IPC: C23C14/54 ,  F01D9/04 ,  C23C14/08 ,  C23C14/24 ,  C23C14/50

CPC classification number: C23C14/542 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30 ,  C23C14/505 ,  C23C14/54 ,  F01D9/041 ,  F01D15/10 ,  F05D2220/32 ,  F05D2230/313 ,  F05D2230/90 ,  F05D2300/2118

Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Abstract translation: 一种用于物理气相沉积涂覆方法的方法包括将陶瓷涂层材料从羽状物沉积到至少一个基底上以在其上形成陶瓷涂层，并且在沉积期间，以至少一个基板以相对于 陶瓷涂层材料沉积到至少一个基底上。

公开(公告)号：US20190040525A1

公开(公告)日：2019-02-07

申请号：US16157219

申请日：2018-10-11

Applicant: United Technologies Corporation

Inventor： Mladen F. Trubelja ,  David A. Litton ,  Joseph A. DePalma ,  James W. Neal ,  Michael Maloney ,  Russell A. Beers ,  Brian T. Hazel ,  Glenn A. Cotnoir

IPC: C23C14/54 ,  C23C14/24 ,  F01D9/04 ,  F01D15/10 ,  C23C14/50 ,  C23C14/30 ,  C23C14/08

Abstract: An apparatus for use in a physical vapor deposition coating process includes a chamber, a crucible configured to hold a ceramic coating material in the chamber, an energy source operable to heat the interior of the chamber, a fixture for holding at least one substrate in the chamber, an actuator operable to rotate the fixture, and a controller configured to establish a plume of the ceramic coating material in the chamber to deposit the ceramic coating material from the plume onto the at least one substrate and form a ceramic coating thereon, and during the deposition, rotate the at least one substrate at a rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.