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公开(公告)号：US10113226B2
公开(公告)日：2018-10-30
申请号：US14773781
申请日：2014-03-13
Applicant: United Technologies Corporation
Inventor： Mladen F. Trubelja , Dinesh K. Gupta , Brian S. Tryon , Mark T. Ucasz , Benjamin J. Zimmerman
Abstract: A coated article has: a metallic substrate (22); a bondcoat (30); and a thermal barrier coating (TBC) (28). The bondcoat has a first layer (32) and a second layer (34), the first layer having a lower Cr content than the second layer.
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公开(公告)号：US20190211440A1
公开(公告)日：2019-07-11
申请号：US16355893
申请日：2019-03-18
Applicant: United Technologies Corporation
Inventor： Joseph A. DePalma , Mladen F. Trubelja , David A. Litton , Dmitri L. Novikov , Sergei F. Burlatsky
CPC classification number: C23C14/228 , C23C14/02 , C23C14/083 , C23C14/243 , C23C14/30
Abstract: An apparatus for use in a coating process includes a chamber, a crucible configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible.
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公开(公告)号：US09506140B2
公开(公告)日：2016-11-29
申请号：US14209761
申请日：2014-03-13
Applicant: United Technologies Corporation
Inventor： Mladen F. Trubelja , Dinesh K. Gupta , Brian S. Tryon , Mark T. Ucasz , Benjamin J. Zimmerman
CPC classification number: C23C14/08 , C23C14/16 , C23C14/24 , C23C14/325 , F01D5/288 , F05D2300/13 , F05D2300/175 , F05D2300/2118 , Y10T428/12618
Abstract: A coated article has: a metallic substrate (22); a bondcoat (30); and a thermal barrier coating (TBC) (28). The bondcoat has a first layer (32) and a second layer (34), the first layer having a lower Cr content than the second layer.
Abstract translation: 涂覆制品具有：金属基底（22）; 粘合剂涂层（30）; 和热障涂层（TBC）（28）。 键合涂层具有第一层（32）和第二层（34），第一层具有比第二层低的Cr含量。
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公开(公告)号：US20140272456A1
公开(公告)日：2014-09-18
申请号：US14209761
申请日：2014-03-13
Applicant: United Technologies Corporation
Inventor： Mladen F. Trubelja , Dinesh K. Gupta , Brian S. Tryon , Mark T. Ucasz , Benjamin J. Zimmerman
CPC classification number: C23C14/08 , C23C14/16 , C23C14/24 , C23C14/325 , F01D5/288 , F05D2300/13 , F05D2300/175 , F05D2300/2118 , Y10T428/12618
Abstract: A coated article has: a metallic substrate (22); a bondcoat (30); and a thermal barrier coating (TBC) (28). The bondcoat has a first layer (32) and a second layer (34), the first layer having a lower Cr content than the second layer.
Abstract translation: 涂覆制品具有：金属基底（22）; 粘合剂涂层（30）; 和热障涂层（TBC）（28）。 键合涂层具有第一层（32）和第二层（34），第一层具有比第二层低的Cr含量。
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公开(公告)号：US11866816B2
公开(公告)日：2024-01-09
申请号：US16355893
申请日：2019-03-18
Applicant: United Technologies Corporation
Inventor： Joseph A. DePalma , Mladen F. Trubelja , David A. Litton , Dmitri L. Novikov , Sergei F. Burlatsky
CPC classification number: C23C14/228 , C23C14/02 , C23C14/083 , C23C14/24 , C23C14/243 , C23C14/30
Abstract: An apparatus for use in a coating process includes a chamber, a crucible configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190040525A1
公开(公告)日：2019-02-07
申请号：US16157219
申请日：2018-10-11
Applicant: United Technologies Corporation
Inventor： Mladen F. Trubelja , David A. Litton , Joseph A. DePalma , James W. Neal , Michael Maloney , Russell A. Beers , Brian T. Hazel , Glenn A. Cotnoir
Abstract: An apparatus for use in a physical vapor deposition coating process includes a chamber, a crucible configured to hold a ceramic coating material in the chamber, an energy source operable to heat the interior of the chamber, a fixture for holding at least one substrate in the chamber, an actuator operable to rotate the fixture, and a controller configured to establish a plume of the ceramic coating material in the chamber to deposit the ceramic coating material from the plume onto the at least one substrate and form a ceramic coating thereon, and during the deposition, rotate the at least one substrate at a rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
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公开(公告)号：US20160326628A1
公开(公告)日：2016-11-10
申请号：US15109884
申请日：2015-01-07
Applicant: UNITED TECHNOLOGIES CORPORATION
Inventor： Joseph A. DePalma , Mladen F. Trubelja , David A. Litton , Dmitri L. Novikov , Sergei F. Burlatsky
CPC classification number: C23C14/228 , C23C14/02 , C23C14/083 , C23C14/243 , C23C14/30
Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.
Abstract translation: 用于涂布方法的方法包括在涂料存在下预热基材，并且在预加热期间屏蔽基材以防止涂料过早沉积，从而在基材和涂料之间建立气体筛网。 一种用于涂覆工艺的设备包括：腔室，构造成将涂层材料保持在腔室中的坩埚，可操作以加热腔室内部的能量源，相对于坩埚定位的涂层壳体，以及位于 位于涂层外壳附近的至少一个气体歧管。 至少一个气体歧管被配置成在涂层包封和坩埚之间提供气体筛网。 第二歧管在稍后的涂层沉积期间提供气体以压缩涂层材料的蒸气羽流并将羽流聚焦在基底上以增加沉积速率。
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公开(公告)号：US10233533B2
公开(公告)日：2019-03-19
申请号：US15109884
申请日：2015-01-07
Applicant: United Technologies Corporation
Inventor： Joseph A. DePalma , Mladen F. Trubelja , David A. Litton , Dmitri L. Novikov , Sergei F. Burlatsky
Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.
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9.发明授权公开(公告)号：US10145006B2
公开(公告)日：2018-12-04
申请号：US15112213
申请日：2015-01-08
Applicant: United Technologies Corporation
Inventor： Mladen F. Trubelja , David A. Litton , Joseph A. DePalma , James W. Neal , Michael Maloney , Russell A. Beers , Brian T. Hazel , Glenn A. Cotnoir
Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
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10.发明申请PHYSICAL VAPOR DEPOSITION USING ROTATIONAL SPEED SELECTED WITH RESPECT TO DEPOSITION RATE 审中-公开使用与沉积速率相关的旋转速度进行物理气相沉积公开(公告)号：US20160333465A1
公开(公告)日：2016-11-17
申请号：US15112213
申请日：2015-01-08
Applicant: UNITED TECHNOLOGIES CORPORATION
Inventor： Mladen F. Trubelja , David A. Litton , Joseph A. DePalma , James W. Neal , Michael Maloney , Russell A. Beers , Brian T. Hazel , Glenn A. Cotnoir
CPC classification number: C23C14/542 , C23C14/083 , C23C14/243 , C23C14/30 , C23C14/505 , C23C14/54 , F01D9/041 , F01D15/10 , F05D2220/32 , F05D2230/313 , F05D2230/90 , F05D2300/2118
Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
Abstract translation: 一种用于物理气相沉积涂覆方法的方法包括将陶瓷涂层材料从羽状物沉积到至少一个基底上以在其上形成陶瓷涂层，并且在沉积期间，以至少一个基板以相对于 陶瓷涂层材料沉积到至少一个基底上。
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