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    Movable evaporation source
    2.
    发明授权
    Movable evaporation source 有权

    公开(公告)号：US09970098B2

    公开(公告)日：2018-05-15

    申请号：US14559033

    申请日：2014-12-03

    Applicant: United Technologies Corporation

    Inventor： Russell A. Beers ,  Joseph A. DePalma

    IPC: C23C14/32 ,  C23C14/22

    CPC classification number: C23C14/325 ,  C23C14/225

    Abstract: A moveable evaporation source system may have an insulator disposed above a cathode support member, and a cathode support member disposed beneath the insulator and exerting an upward force on the insulator so that the upward force exerted by the cathode support member urges the insulator toward a down force source. A cathode may be placed between the insulator and the down force source and translated so that material liberated from the cathode may strike different portions of a workpiece as the cathode is translated.

    COATING PROCESS USING GAS SCREEN
    5.
    发明申请
    COATING PROCESS USING GAS SCREEN 审中-公开
    使用气体筛选的涂料工艺

    公开(公告)号：US20160326628A1

    公开(公告)日：2016-11-10

    申请号：US15109884

    申请日：2015-01-07

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： Joseph A. DePalma ,  Mladen F. Trubelja ,  David A. Litton ,  Dmitri L. Novikov ,  Sergei F. Burlatsky

    IPC: C23C14/22 ,  C23C14/02 ,  C23C14/24 ,  C23C14/30

    CPC classification number: C23C14/228 ,  C23C14/02 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30

    Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.

    Abstract translation: 用于涂布方法的方法包括在涂料存在下预热基材，并且在预加热期间屏蔽基材以防止涂料过早沉积，从而在基材和涂料之间建立气体筛网。 一种用于涂覆工艺的设备包括：腔室，构造成将涂层材料保持在腔室中的坩埚，可操作以加热腔室内部的能量源，相对于坩埚定位的涂层壳体，​​以及位于 位于涂层外壳附近的至少一个气体歧管。 至少一个气体歧管被配置成在涂层包封和坩埚之间提供气体筛网。 第二歧管在稍后的涂层沉积期间提供气体以压缩涂层材料的蒸气羽流并将羽流聚焦在基底上以增加沉积速率。

    Coating process using gas screen
    6.
    发明授权
    Coating process using gas screen 有权

    公开(公告)号：US10233533B2

    公开(公告)日：2019-03-19

    申请号：US15109884

    申请日：2015-01-07

    Applicant: United Technologies Corporation

    Inventor： Joseph A. DePalma ,  Mladen F. Trubelja ,  David A. Litton ,  Dmitri L. Novikov ,  Sergei F. Burlatsky

    IPC: C23C14/02 ,  C23C14/22 ,  C23C14/08 ,  C23C14/30 ,  C23C14/24

    Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.

    MOVABLE EVAPORATION SOURCE
    10.
    发明申请
    MOVABLE EVAPORATION SOURCE 有权
    可移动蒸发源

    公开(公告)号：US20150167149A1

    公开(公告)日：2015-06-18

    申请号：US14559033

    申请日：2014-12-03

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： Russell A. Beers ,  Joseph A. DePalma

    IPC: C23C14/22 ,  C23C14/50

    CPC classification number: C23C14/325 ,  C23C14/225

    Abstract: A moveable evaporation source system may have an insulator disposed above a cathode support member, and a cathode support member disposed beneath the insulator and exerting an upward force on the insulator so that the upward force exerted by the cathode support member urges the insulator toward a down force source. A cathode may be placed between the insulator and the down force source and translated so that material liberated from the cathode may strike different portions of a workpiece as the cathode is translated.

    Abstract translation: 可移动蒸发源系统可以具有设置在阴极支撑构件上方的绝缘体和设置在绝缘体下方并在绝缘体上施加向上的力的阴极支撑构件，使得由阴极支撑构件施加的向上的力促使绝缘体向下 力源。 阴极可以放置在绝缘体和向下的力源之间并且平移，使得从阴极释放的材料可以在阴极平移时撞击工件的不同部分。

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