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公开(公告)号：US20230154641A1
公开(公告)日：2023-05-18
申请号：US18098804
申请日：2023-01-19
CPC分类号： H01B1/08 , G02B1/118 , H01B3/10 , H01B13/003 , H01M4/04 , H01M6/40 , H01M8/124 , H10K71/211 , B82Y30/00
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11282616B2
公开(公告)日：2022-03-22
申请号：US16578524
申请日：2019-09-23
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.
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公开(公告)号：US20220013247A1
公开(公告)日：2022-01-13
申请号：US17485281
申请日：2021-09-24
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy, Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US20220230773A1
公开(公告)日：2022-07-21
申请号：US17715411
申请日：2022-04-07
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US20230352206A1
公开(公告)日：2023-11-02
申请号：US18347034
申请日：2023-07-05
CPC分类号： H01B1/08 , H01B3/10 , H01B13/003 , H01M8/124 , H01M4/04 , H01M6/40 , G02B1/118 , H10K71/211 , B82Y30/00
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11587696B2
公开(公告)日：2023-02-21
申请号：US17715411
申请日：2022-04-07
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , G02B1/118 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US20200020461A1
公开(公告)日：2020-01-16
申请号：US16578524
申请日：2019-09-23
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.
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公开(公告)号：US09853269B2
公开(公告)日：2017-12-26
申请号：US14556449
申请日：2014-12-01
发明人： Yuying Tang , James Watkins , Kenichi Shinmei , Rasika Dasanayake Aluthge , Susumu Koizumi , Masashi Kanoh
IPC分类号： H01M2/16 , H01M10/0525 , H01M10/0568 , H01M10/0569 , H01M2/14
CPC分类号： H01M2/1646 , H01M2/145 , H01M2/1653 , H01M2/166 , H01M2/1673 , H01M10/0525 , H01M10/0568 , H01M10/0569 , H01M2300/0028 , Y02T10/7011
摘要： An electrical insulation layer including microparticles and having a mesoporous structure; and a battery device including a cathode, an anode, an electrical insulation layer including microparticles and having a mesoporous structure, the electrical insulation layer being arranged between the anode and the cathode, and an ion conductive composition.
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公开(公告)号：US11328833B2
公开(公告)日：2022-05-10
申请号：US17485281
申请日：2021-09-24
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , G02B1/118 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy, Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11961628B2
公开(公告)日：2024-04-16
申请号：US18098804
申请日：2023-01-19
IPC分类号： B32B3/10 , G02B1/118 , H01B1/08 , H01B3/10 , H01B13/00 , H01M4/04 , H01M6/40 , H01M8/124 , H10K71/20 , B82Y30/00 , H01M8/1286 , H10K30/82 , H10K50/813 , H10K102/00
CPC分类号： H01B1/08 , G02B1/118 , H01B3/10 , H01B13/003 , H01M4/04 , H01M6/40 , H01M8/124 , H10K71/211 , B82Y30/00 , H01M4/0433 , H01M8/1286 , H10K30/82 , H10K50/813 , H10K2102/331 , Y02P70/50 , Y10T428/24893
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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